Abstract:
Fused quartz containing both titanium dioxide and cerium oxide as UV absorbing dopants has been found to be particularly effective for lamp envelopes for high temperature lamps such as halogen-incandescent lamps and metal halide arc discharge lamps which emit both UV and visible light radiation. The codoped quartz transmits visible radiation and absorbs a substantial portion of the emitted UV radiation. The UV absorption is far superior at temperatures above 500°C and the codoped quartz does not react with the fill within.
Abstract:
A reflector, e.g. an all glass reflector (10) having a front reflecting surface and terminating in the rear in a cavity (14) into which a lamp is cemented transmits substantially less light out of the rear when at least the inside or the outside of the cavity and the reflecting surface are coated with an optical interference coating (24). The coating is preferably applied by a low pressure chemical vapor deposition process.
Abstract:
An electric lamp, such as an incandescent linear quartz heat lamp, is provided having a vitreous light transmissive envelope having an exterior surface and a light source capable of generating light within said envelope. Disposed on a portion of the exterior surface of the envelope is a diffuse reflective coating, such as a boron nitride coating, for reflecting at least a portion of the light emitted by the source. A protective silica coating encapsulates the reflective coating to protect the reflective coating from things such as abrasion, moisture, and cleaning solvents.
Abstract:
A light-scattering coating comprising light-scattering particles, such as alumina, dispersed in a silica matrix is formed by applying to the filter a silicone solution in which is dispersed colloidal silica and the light-scattering particles to a suitable substrate and then pyrolyzing the dispersion at high temperature to drive off the organic components and form the silica matrix. This coating is hard and abrasion resistant and is useful for reflectors, lamps and lenses.
Abstract:
A process for forming multi-layer optical quality films by sputtering at least a first and second material with at least two unbalanced DC magnetron sputtering devices. During sputtering, an effective negative radio frequency or alternating current bias is applied to the substrate and an arc suppression device is operated to reduce arcing on the sputtering devices. In addition, a controlled partial pressure of a reactive gas is maintained in the sputtering chamber to provide a sufficient amount of reactive gas to form the desired compound on the substrate without substantially poisoning the target.