公开(公告)号：EP0691419A1

公开(公告)日：1996-01-10

申请号：EP95303594.6

申请日：1995-05-26

Applicant: GENERAL ELECTRIC COMPANY

Inventor： Sproul, William D. ,  Parham, Thomas Gene ,  Maxwell, Randolph E. ,  Graham, Michael Evans ,  Bergman, Rolf Sverre

IPC: C23C14/35 ,  C23C14/06 ,  C23C14/08

CPC classification number: H01J9/20 ,  C23C14/0021 ,  C23C14/352

Abstract: A process for forming multi-layer optical quality films by sputtering at least a first and second material with at least two unbalanced DC magnetron sputtering devices. During sputtering, an effective negative radio frequency or alternating current bias is applied to the substrate and an arc suppression device is operated to reduce arcing on the sputtering devices. In addition, a controlled partial pressure of a reactive gas is maintained in the sputtering chamber to provide a sufficient amount of reactive gas to form the desired compound on the substrate without substantially poisoning the target.

Abstract translation: 通过用至少两个不平衡DC磁控溅射装置至少溅射第一和第二材料来形成多层光学质量膜的方法。 在溅射期间，将有效的负射频或交流偏压施加到衬底，并且操作消弧装置以减少溅射装置上的电弧。 此外，在溅射室中保持反应气体的受控分压，以提供足够量的反应气体，以在基板上形成所需化合物，而基本上不会中毒靶。 $$