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11.
公开(公告)号:US11955472B2
公开(公告)日:2024-04-09
申请号:US17554222
申请日:2021-12-17
Applicant: GlobalFoundries U.S. Inc.
Inventor: Meng Miao , Alain Loiseau , Souvick Mitra , Wei Liang , Robert J. Gauthier, Jr. , Anindya Nath
CPC classification number: H01L27/0248 , H01L27/1207 , H01L29/7436
Abstract: Disclosed are embodiments of a semiconductor structure that includes a semiconductor-controlled rectifier (e.g., for electrostatic discharge (ESD) protection). The SCR can be readily integrated into advanced semiconductor-on-insulator processing technology platforms (e.g., a fully depleted silicon-on-insulator (FDSOI) processing technology platform) that employ hybrid semiconductor substrates (i.e., semiconductor substrates with both bulk semiconductor and semiconductor-on-insulator regions) and is configured with an on-Pwell semiconductor-on-insulator gate structure that is tied to an anode terminal to effectively lower the SCR trigger voltage. To further lower the trigger voltage of the SCR, the Pwell on which the gate structure sits may be made narrower than the gate structure and/or the doping profile of the Pwell on which the gate structure sits may be graded (e.g., P to P− closer to insulator layer). Additionally, to minimize parasitic capacitance, the gate structure may be shorter in length than contact regions parallel and adjacent thereto.
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公开(公告)号:US20230420448A1
公开(公告)日:2023-12-28
申请号:US17808364
申请日:2022-06-23
Applicant: GlobalFoundries U.S. Inc.
Inventor: Souvick Mitra , Alain F. Loiseau , Robert J. Gauthier, JR. , Meng Miao , Anindya Nath , Wei Liang
CPC classification number: H01L27/0262 , H01L29/7436
Abstract: A structure includes trigger control circuitry for an SCR including: a first transistor having two P-type semiconductor terminals connected to an Nwell and a Pwell of the SCR; a second transistor having two N-type semiconductor terminals connected to the Pwell and ground; and, optionally, an additional transistor having two P-type semiconductor terminals connected to the Nwell and ground. Control terminals of the transistors receive the same control signal (e.g., RST from a power-on-reset). When a circuit connected to the SCR for ESD protection is powered on, ESD risk is limited so RST switches to high. Thus, the first transistor and optional additional transistor turn off and the second transistor turns on, reducing leakage. When the circuit is powered down, the ESD risk increases so RST switches to low. Thus, the first transistor and optional additional transistor turn on and the second transistor turns off, lowering the trigger voltage and current.
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公开(公告)号:US11804481B2
公开(公告)日:2023-10-31
申请号:US17185243
申请日:2021-02-25
Applicant: GLOBALFOUNDRIES U.S. Inc.
Inventor: Robert J. Gauthier, Jr. , Meng Miao , Alain F. Loiseau , Souvick Mitra , You Li , Wei Liang
IPC: H01L27/02 , H01L21/84 , H01L21/8222 , H01L27/12
CPC classification number: H01L27/0259 , H01L21/8222 , H01L21/84 , H01L27/0288 , H01L27/1207
Abstract: The present disclosure relates to semiconductor structures and, more particularly, to electrostatic discharge (ESD) devices and methods of manufacture. The structure (ESD device) includes: a bipolar transistor comprising a collector region, an emitter region and a base region; and a lateral ballasting resistance comprising semiconductor material adjacent to the collector region.
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14.
公开(公告)号:US20220320073A1
公开(公告)日:2022-10-06
申请号:US17808647
申请日:2022-06-24
Applicant: GlobalFoundries U.S. Inc.
Inventor: Robert J. Gauthier, JR. , Alain F. Loiseau , Souvick Mitra , Tsung-Che Tsai , Meng Miao , You Li
IPC: H01L27/02
Abstract: Embodiments of the disclosure provide an integrated circuit (IC) structure, including a triple well structure within a semiconductor substrate. A base region is within a doped well of the triple well structure, a collector terminal is within the doped well and laterally separated from the base region by a first insulator and a first avalanche junction is defined between a first pair of oppositely-doped semiconductor regions within the collector terminal. An emitter terminal is within the third doped well of the triple well structure and laterally separated from the collector terminal by a second insulator. A second avalanche junction is defined between a second pair of oppositely-doped semiconductor regions of the emitter terminal.
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公开(公告)号:US11289471B2
公开(公告)日:2022-03-29
申请号:US17001009
申请日:2020-08-24
Applicant: GLOBALFOUNDRIES U.S. INC.
Inventor: You Li , Alain F. Loiseau , Souvick Mitra , Tsung-Che Tsai , Robert J. Gauthier, Jr. , Meng Miao
IPC: H01L29/74 , H01L27/02 , H01L29/73 , H01L27/06 , H01L27/092 , H01L27/088 , H01L29/78 , H01L29/06
Abstract: The present disclosure relates to semiconductor structures and, more particularly, to an electrostatic discharge (ESD) device and methods of manufacture. The structure (ESD device) includes: a trigger collector region having fin structures of a first dopant type, a collector region having fin structures in a well of a second dopant type and further including a lateral ballasting resistance; an emitter region having a well of the second dopant type and fin structures of the first dopant type; and a base region having a well and fin structures of the second dopant type.
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