Semiconductor-controlled rectifier with low trigger voltage for electrostatic discharge protection

    公开(公告)号:US11955472B2

    公开(公告)日:2024-04-09

    申请号:US17554222

    申请日:2021-12-17

    CPC classification number: H01L27/0248 H01L27/1207 H01L29/7436

    Abstract: Disclosed are embodiments of a semiconductor structure that includes a semiconductor-controlled rectifier (e.g., for electrostatic discharge (ESD) protection). The SCR can be readily integrated into advanced semiconductor-on-insulator processing technology platforms (e.g., a fully depleted silicon-on-insulator (FDSOI) processing technology platform) that employ hybrid semiconductor substrates (i.e., semiconductor substrates with both bulk semiconductor and semiconductor-on-insulator regions) and is configured with an on-Pwell semiconductor-on-insulator gate structure that is tied to an anode terminal to effectively lower the SCR trigger voltage. To further lower the trigger voltage of the SCR, the Pwell on which the gate structure sits may be made narrower than the gate structure and/or the doping profile of the Pwell on which the gate structure sits may be graded (e.g., P to P− closer to insulator layer). Additionally, to minimize parasitic capacitance, the gate structure may be shorter in length than contact regions parallel and adjacent thereto.

    OPERATING VOLTAGE-TRIGGERED SEMICONDUCTOR CONTROLLED RECTIFIER

    公开(公告)号:US20230420448A1

    公开(公告)日:2023-12-28

    申请号:US17808364

    申请日:2022-06-23

    CPC classification number: H01L27/0262 H01L29/7436

    Abstract: A structure includes trigger control circuitry for an SCR including: a first transistor having two P-type semiconductor terminals connected to an Nwell and a Pwell of the SCR; a second transistor having two N-type semiconductor terminals connected to the Pwell and ground; and, optionally, an additional transistor having two P-type semiconductor terminals connected to the Nwell and ground. Control terminals of the transistors receive the same control signal (e.g., RST from a power-on-reset). When a circuit connected to the SCR for ESD protection is powered on, ESD risk is limited so RST switches to high. Thus, the first transistor and optional additional transistor turn off and the second transistor turns on, reducing leakage. When the circuit is powered down, the ESD risk increases so RST switches to low. Thus, the first transistor and optional additional transistor turn on and the second transistor turns off, lowering the trigger voltage and current.

    INTEGRATED CIRCUIT STRUCTURE WITH AVALANCHE JUNCTION TO DOPED SEMICONDUCTOR OVER SEMICONDUCTOR WELL

    公开(公告)号:US20220320073A1

    公开(公告)日:2022-10-06

    申请号:US17808647

    申请日:2022-06-24

    Abstract: Embodiments of the disclosure provide an integrated circuit (IC) structure, including a triple well structure within a semiconductor substrate. A base region is within a doped well of the triple well structure, a collector terminal is within the doped well and laterally separated from the base region by a first insulator and a first avalanche junction is defined between a first pair of oppositely-doped semiconductor regions within the collector terminal. An emitter terminal is within the third doped well of the triple well structure and laterally separated from the collector terminal by a second insulator. A second avalanche junction is defined between a second pair of oppositely-doped semiconductor regions of the emitter terminal.

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