-
公开(公告)号:ZA7607521B
公开(公告)日:1977-11-30
申请号:ZA7607521
申请日:1976-12-17
Applicant: HOECHST AG
Inventor: LINKIES A , KUEHLEIN K , REUSCHLING D , TEUFEL H , SCHOELKENS B
IPC: C07D207/27 , A61K31/40 , A61K31/4015 , A61P43/00 , C07D207/26 , C07D , A61K
CPC classification number: C07D207/26
-
公开(公告)号:ZA7607520B
公开(公告)日:1977-11-30
申请号:ZA7607520
申请日:1976-12-17
Applicant: HOECHST AG
Inventor: REUSCHLING D , KUEHLEIN K , LINKIES A , BECK G , MUSIL J
IPC: C07D207/27 , A61K31/40 , A61K31/4015 , A61P43/00 , C07D207/26 , C07D , A61K
CPC classification number: C07D207/26 , Y10S514/929
-
公开(公告)号:ZA756949B
公开(公告)日:1977-06-29
申请号:ZA756949
申请日:1975-11-05
Applicant: HOECHST AG
Inventor: KUEHLEIN K , BARTMANN W , BECK G , REUSCHLING D , BABEJ M
IPC: C07D20060101 , C07D
-
公开(公告)号:ZA7603741B
公开(公告)日:1977-05-25
申请号:ZA7603741
申请日:1976-06-23
Applicant: HOECHST AG
Inventor: REUSCHLING D , KUEHLEIN K , TEIFEL H , BECK G , LERCH U , BARTMANN W , SCHOELKENS B , KUNSTMANN R
IPC: C07D207/26 , C07D207/27 , C07D
CPC classification number: C07D207/27
-
公开(公告)号:NZ220020A
公开(公告)日:1989-09-27
申请号:NZ22002087
申请日:1987-04-16
Applicant: HOECHST AG
Inventor: LOHAUS G , DITTMAR W , HANEL H , RAETHER W , REUSCHLING D , GROBEL B-T
IPC: A61K31/44 , C07D213/89 , C07D309/38
Abstract: New 1-hydroxy-2-pyridones of the general formula I I in which R1, R2 and R3, which are identical or different, denote hydrogen or lower alkyl having 1-4 carbon atoms, R1 and R3 preferably being hydrogen, and R2 preferably being methyl, X denotes S or, preferably, O, Y denotes hydrogen or up to 2 halogen atoms, namely chlorine and/or bromine, Z denotes a single bond or the bivalent radicals O, S, -CR2- (R=H or C1-C4-alkyl) or other 2-valent radicals with 2-10 carbon and, optionally, oxygen and/or sulfur atoms linked to form a chain, it being obligatory when the radicals contain 2 or more oxygen and/or sulfur atoms for the latter to be separated by at least 2 carbon atoms, and it being possible for 2 adjacent carbon atoms also to be linked together by a double bond, and the free valencies of the carbon atoms being saturated by H and/or C1-C4-alkyl groups, Ar denotes an aromatic ring system which has up to two rings and can be substituted by up to three radicals from the group comprising fluorine, chlorine, bromine, methoxy, C1-C4-alkyl, trifluoromethyl and trifluoromethoxy, are prepared by a variety of process variants. The compounds and their physiologically tolerated salts with inorganic or organic bases mainly have antimycotic, anti-bacterial and antiviral activity. The compounds of the formula V V in which R1, R2, R3, X, Y, Z and Ar have the same meaning as in formula I, which occur in the preparation of the compounds of the formula I, are also new.
-
公开(公告)号:ZA78818B
公开(公告)日:1979-01-31
申请号:ZA78818
申请日:1978-02-10
Applicant: HOECHST AG
Inventor: SEEGER K , REUSCHLING D , SCHOELKENS B
IPC: C07C69/736 , A61K31/19 , A61K31/215 , A61K31/22 , A61P43/00 , C07C51/00 , C07C59/62 , C07C67/00 , C07D307/93 , C07C69/73 , A61K31/20
-
公开(公告)号:ZA772864B
公开(公告)日:1978-04-26
申请号:ZA772864
申请日:1977-05-13
Applicant: HOECHST AG
Inventor: KUEHLEIN K , REUSCHLING D , SCHOELKENS B , LINKIES A
IPC: C07D207/27 , A61K31/40 , A61K31/4015 , A61P43/00 , C07D207/26 , C07D , A61K
-
-
-
-
-
-