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公开(公告)号：CA2763985A1
公开(公告)日：2010-12-09
申请号：CA2763985
申请日：2010-05-31
Applicant: INTEGRAN TECHNOLOGIES INC
Inventor： FACCHINI DIANA , GONZALEZ FRANCISCO , MCCREA JONATHAN , UETZ MIKE , PALUMBO GINO , TOMANTSCHGER KLAUS , NAGARAJAN NANDAKUMAR , VICTOR JARED J , ERB UWE
Abstract: Free standing articles or articles at least partially coated with substantially porosity free, fine-grained and/or amorphous Co-bearing metallic materials optionally containing solid particulates dispersed therein, are disclosed. The electrodeposited metallic layers and/or patches comprising Co provide, enhance or restore strength, wear and/or lubricity of substrates without reducing the fatigue performance compared to either uncoated or equivalent thickness Cr coated substrate. The fine-grained and/or amorphous metallic coatings comprising Co are particularly suited for articles exposed to thermal cycling, fatigue and other stresses and/or in applications requiring anti-microbial and hydrophobic properties.
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公开(公告)号：CA2763983A1
公开(公告)日：2010-12-09
申请号：CA2763983
申请日：2010-05-31
Applicant: INTEGRAN TECHNOLOGIES INC
Inventor： TOMANTSCHGER KLAUS , MCCREA JONATHAN , NAGARAJAN NANDAKUMAR , GONZALEZ FRANCISCO , PALUMBO GINO , PANAGIOTOPOULOS KONSTANTINOS , KATUGAHA HERATH , VICTOR JARED J , ERB UWE
Abstract: Metal-clad polymer articles containing structural fine-grained and/or amorphous metallic coatings/layers optionally containing solid particulates dispersed therein, are disclosed. The fine-grained and/or amorphous metallic coatings are particularly suited for strong and lightweight articles, precision molds, sporting goods, automotive parts and components exposed to thermal cycling although the coefficient of linear thermal expansion (CLTE) of the metallic layer and the substrate are mismatched. The interface between the metallic layer and the polymer is suitably pretreated to withstand thermal cycling without failure.
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公开(公告)号：DK1516076T3
公开(公告)日：2008-06-23
申请号：DK02754753
申请日：2002-06-25
Applicant: INTEGRAN TECHNOLOGIES INC
Inventor： PALUMBO GINO , BROOKS IAIN , MCCREA JONATHAN , HIBBARD GLENN D , GONZALEZ FRANCISCO , TOMANTSCHGER KLAUS , ERB UWE
IPC: C25D1/04 , C25D5/02 , C25D5/06 , C25D5/18 , C25D5/20 , C25D7/04 , C25D15/02 , C25D17/00 , C25D21/12
Abstract: The invention relates to a process for forming coatings or free-standing deposits of nanocrystalline metals, metal alloys or metal matrix composites. The process employs drum plating or selective plating processes involving pulse electrodeposition and a non-stationary anode or cathode. Novel nanocrystalline metal matrix composites and micro components are disclosed as well. Also described is a process for forming micro components with grain sizes below 1,000nm.
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公开(公告)号：DE60225352T2
公开(公告)日：2008-06-12
申请号：DE60225352
申请日：2002-06-25
Applicant: INTEGRAN TECHNOLOGIES INC
Inventor： PALUMBO GINO , BROOKS IAIN , MCCREA JONATHAN , HIBBARD GLENN D , GONZALEZ FRANCISCO , TOMANTSCHGER KLAUS , ERB UWE
IPC: C25D1/04 , C25D5/02 , C25D5/06 , C25D5/18 , C25D5/20 , C25D7/04 , C25D15/02 , C25D17/00 , C25D21/12
Abstract: The invention relates to a process for forming coatings or free-standing deposits of nanocrystalline metals, metal alloys or metal matrix composites. The process employs drum plating or selective plating processes involving pulse electrodeposition and a non-stationary anode or cathode. Novel nanocrystalline metal matrix composites and micro components are disclosed as well. Also described is a process for forming micro components with grain sizes below 1,000nm.
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公开(公告)号：CA2410603A1
公开(公告)日：2001-12-06
申请号：CA2410603
申请日：2001-05-24
Applicant: INTEGRAN TECHNOLOGIES INC
Inventor： LIN PETER K , TOMANTSCHGER KLAUS , PALUMBO GINO , LIMOGES DAVID L
Abstract: A process for enhancing chemical stability and corrosion resistance is described for perforated current collectors made by continuous production processes for use in electrochemical cells, including storage batteries such as lead-acid batteries. The process relies on utilizing a strip processing method, selected from the group of reciprocating expansion, rotary expansion and punching, to perforate the solid metal strip to form a grid or mesh, as a deformation treatment. The perforation- deformation treatment is followed in rapid succession by a heat-treatment to obtain a recrystallized microstructu re in the current collector and optionally by quenching to rapidly reduce the temperature to below approximately 80 ~C. The process yields an improved microstructure consisting of a high frequency of special low .SIGMA. CSL gra in boundaries (> 50 %), exhibiting significantly improved resistance to intergranular corrosion and cracking. Perforated current collectors produced with this process from a solid lead-alloy strip exhibit superior growth and corrosion properties when employed as positive grids in a lead-acid battery.
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Patent Agency Ranking
公开(公告)号：AU6198101A
公开(公告)日：2001-12-03
申请号：AU6198101
申请日：2001-05-24
Applicant: INTEGRAN TECHNOLOGIES INC
Inventor： LIMOGES DAVID L , PALUMBO GINO , LIN PETER K , TOMANTSCHGER KLAUS
IPC: B24C1/10 , B23P13/00 , C25C7/02 , H01M20060101 , H01M4/00 , H01M4/04 , H01M4/08 , H01M4/14 , H01M4/16 , H01M4/20 , H01M4/64 , H01M4/68 , H01M4/73 , H01M4/82 , H01M4/88 , H01M6/00 , H01M50/541
Abstract: A process for enhancing chemical stability, corrosion resistance and for improved adhesion characteristics is described for use on metal or metal-alloy non-consumable electrodes, current collectors or other metallic articles used in electrochemical cells. The process includes peening of the article, optionally followed by an annealing treatment.
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公开(公告)号：AU6198001A
公开(公告)日：2001-12-03
申请号：AU6198001
申请日：2001-05-24
Applicant: INTEGRAN TECHNOLOGIES INC
Inventor： LIMOGES DAVID L , PALUMBO GINO , LIN PETER K
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公开(公告)号：AT515389T
公开(公告)日：2011-07-15
申请号：AT05821047
申请日：2005-12-16
Applicant: INTEGRAN TECHNOLOGIES INC
Inventor： PALUMBO GINO , MCCREA JONATHAN , TOMANTSCHGER KLAUS , BROOKS IAIN , JEONG DAEHYUN , LIMOGES DAVE , PANAGIOTOPOULOS KONSTANTINOS , ERB UWE , WANG ANDREW
Abstract: Lightweight articles comprising a polymeric material at least partially coated with a fine-grained metallic material are disclosed. The fine-grained metallic material has an average grain size of 2nm to 5,000nm, a thickness between 25 micron and 5cm, and a hardness between 200VHN and 3,000 VHN. The lightweight articles are strong and ductile and exhibit high coefficients of restitution and a high stiffness and are particularly suitable for a variety of applications including aerospace and automotive parts, sporting goods, and the like.
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公开(公告)号：CA2562042C
公开(公告)日：2009-07-07
申请号：CA2562042
申请日：2005-12-16
Applicant: INTEGRAN TECHNOLOGIES INC
Inventor： TOMANTSCHGER KLAUS , LIMOGES DAVE , UWE ERB , BROOKS IAIN , JEONG DAEHYUN , PANAGIOTOPOULOS KONSTANTINOS , PALUMBO GINO , MCCREA JONATHAN , WANG ANDREW
Abstract: Lightweight articles comprising a polymeric material at least partially coat ed with a fine-grained metallic material are disclosed. The fine-grained metall ic material has an average grain size of 2nm to 5,000nm, a thickness between 25 micron and 5cm, and a hardness between 200VHN and 3,000 VHN. The lightweight articles are strong and ductile and exhibit high coefficients of restitution and a high stiffness and are particularly suitable for a variety of applications including aerospace and automotive parts, sporting goods, and t he like.
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20.发明专利
公开(公告)号：ZA200410368B
公开(公告)日：2006-07-26
申请号：ZA200410368
申请日：2004-12-23
Applicant: INTEGRAN TECHNOLOGIES INC
Inventor： PALUMBO GINO , BROOKS IAIN , CRREA JONATHAN , HIBBARD GLENN D , GONZALES FRANCISCO , TOMANTSCHGER KLAUS , ERB UWE
IPC: C25D1/04 , C25D20060101 , C25D5/02 , C25D5/06 , C25D5/18 , C25D5/20 , C25D7/04 , C25D15/02 , C25D17/00 , C25D21/12
Abstract: The invention relates to a process for forming coatings or free-standing deposits of nanocrystalline metals, metal alloys or metal matrix composites. The process employs drum plating or selective plating processes involving pulse electrodeposition and a non-stationary anode or cathode. Novel nanocrystalline metal matrix composites and micro components are disclosed as well. Also described is a process for forming micro components with grain sizes below 1,000nm.
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