公开(公告)号：DK1516076T3

公开(公告)日：2008-06-23

申请号：DK02754753

申请日：2002-06-25

Applicant: INTEGRAN TECHNOLOGIES INC

Inventor： PALUMBO GINO ,  BROOKS IAIN ,  MCCREA JONATHAN ,  HIBBARD GLENN D ,  GONZALEZ FRANCISCO ,  TOMANTSCHGER KLAUS ,  ERB UWE

IPC: C25D1/04 ,  C25D5/02 ,  C25D5/06 ,  C25D5/18 ,  C25D5/20 ,  C25D7/04 ,  C25D15/02 ,  C25D17/00 ,  C25D21/12

Abstract: The invention relates to a process for forming coatings or free-standing deposits of nanocrystalline metals, metal alloys or metal matrix composites. The process employs drum plating or selective plating processes involving pulse electrodeposition and a non-stationary anode or cathode. Novel nanocrystalline metal matrix composites and micro components are disclosed as well. Also described is a process for forming micro components with grain sizes below 1,000nm.

公开(公告)号：DE60225352T2

公开(公告)日：2008-06-12

申请号：DE60225352

申请日：2002-06-25

Applicant: INTEGRAN TECHNOLOGIES INC

Inventor： PALUMBO GINO ,  BROOKS IAIN ,  MCCREA JONATHAN ,  HIBBARD GLENN D ,  GONZALEZ FRANCISCO ,  TOMANTSCHGER KLAUS ,  ERB UWE

IPC: C25D1/04 ,  C25D5/02 ,  C25D5/06 ,  C25D5/18 ,  C25D5/20 ,  C25D7/04 ,  C25D15/02 ,  C25D17/00 ,  C25D21/12

Abstract: The invention relates to a process for forming coatings or free-standing deposits of nanocrystalline metals, metal alloys or metal matrix composites. The process employs drum plating or selective plating processes involving pulse electrodeposition and a non-stationary anode or cathode. Novel nanocrystalline metal matrix composites and micro components are disclosed as well. Also described is a process for forming micro components with grain sizes below 1,000nm.

公开(公告)号：ZA200410368B

公开(公告)日：2006-07-26

申请号：ZA200410368

申请日：2004-12-23

Applicant: INTEGRAN TECHNOLOGIES INC

Inventor： PALUMBO GINO ,  BROOKS IAIN ,  CRREA JONATHAN ,  HIBBARD GLENN D ,  GONZALES FRANCISCO ,  TOMANTSCHGER KLAUS ,  ERB UWE

IPC: C25D1/04 ,  C25D20060101 ,  C25D5/02 ,  C25D5/06 ,  C25D5/18 ,  C25D5/20 ,  C25D7/04 ,  C25D15/02 ,  C25D17/00 ,  C25D21/12

Abstract: The invention relates to a process for forming coatings or free-standing deposits of nanocrystalline metals, metal alloys or metal matrix composites. The process employs drum plating or selective plating processes involving pulse electrodeposition and a non-stationary anode or cathode. Novel nanocrystalline metal matrix composites and micro components are disclosed as well. Also described is a process for forming micro components with grain sizes below 1,000nm.

公开(公告)号：AU2002321112B2

公开(公告)日：2008-07-03

申请号：AU2002321112

申请日：2002-06-25

Applicant: INTEGRAN TECHNOLOGIES INC

Inventor： ERB UWE ,  HIBBARD GLENN D ,  GONZALEZ FRANCISCO ,  TOMANTSCHGER KLAUS ,  BROOKS IAIN ,  PALUMBO GINO ,  MCCREA JONATHAN

IPC: C25D1/04 ,  C25D5/02 ,  C25D5/06 ,  C25D5/18 ,  C25D5/20 ,  C25D7/04 ,  C25D15/02 ,  C25D17/00 ,  C25D21/12

Abstract: The invention relates to a process for forming coatings or free-standing deposits of nanocrystalline metals, metal alloys or metal matrix composites. The process employs drum plating or selective plating processes involving pulse electrodeposition and a non-stationary anode or cathode. Novel nanocrystalline metal matrix composites and micro components are disclosed as well. Also described is a process for forming micro components with grain sizes below 1,000nm.

公开(公告)号：PT1516076E

公开(公告)日：2008-03-11

申请号：PT02754753

申请日：2002-06-25

Applicant: INTEGRAN TECHNOLOGIES INC

Inventor： TOMANTSCHGER KLAUS ,  PALUMBO GINO ,  BROOKS IAIN ,  MCCREA JONATHAN ,  HIBBARD GLENN D ,  GONZALEZ FRANCISCO ,  ERB UWE

IPC: C25D1/04 ,  C25D5/02 ,  C25D5/06 ,  C25D5/18 ,  C25D5/20 ,  C25D7/04 ,  C25D15/02 ,  C25D17/00 ,  C25D21/12

公开(公告)号：CA2490464C

公开(公告)日：2008-09-02

申请号：CA2490464

申请日：2002-06-25

Applicant: INTEGRAN TECHNOLOGIES INC

Inventor： BROOKS IAIN ,  ERB UWE ,  MCCREA JONATHAN ,  GONZALEZ FRANCISCO ,  TOMANTSCHGER KLAUS ,  HIBBARD GLENN D ,  PALUMBO GINO

IPC: C25D1/04 ,  C25D5/18 ,  C25D5/02 ,  C25D5/06 ,  C25D5/20 ,  C25D7/04 ,  C25D15/02 ,  C25D17/00 ,  C25D21/12

Abstract: The invention relates to a process for forming coatings or free-standing deposits of nano-crystalline metals, metal alloys or metal matrix composites. The process employs drum plating or selective plating processes involving pulse electrode-position and a non-stationary anode or cathode. Novel nano- crystalline metal matrix composites and micro components are disclosed as well. Also described is a process for forming micro-components with grain sizes below 1,000nm.

公开(公告)号：DE10228323B4

公开(公告)日：2005-06-09

申请号：DE10228323

申请日：2002-06-25

Applicant: INTEGRAN TECHNOLOGIES INC

Inventor： PALUMBO GINO ,  ERB UWE ,  MCCREA JONATHAN ,  HIBBARD GLENN D ,  BROOKS IAIN ,  GONZALEZ FRANCISCO ,  TOMANTSCHGER KLAUS

IPC: C25D5/02 ,  C25D5/06 ,  C25D5/18 ,  C25D7/04 ,  C25D15/02

Abstract: A reinforcing metallic patch is electroplated to cover the degraded portion without covering the non-degraded portion of metallic workpiece, where the electrodeposited metal of metallic patch has an average grain size of 1000 nm or less. An independent claim is also included for process for in-situ electroforming structural reinforcing layer.

公开(公告)号：AU2002321112A1

公开(公告)日：2004-01-06

申请号：AU2002321112

申请日：2002-06-25

Applicant: INTEGRAN TECHNOLOGIES INC

Inventor： HIBBARD GLENN D ,  GONZALEZ FRANCISCO ,  TOMANTSCHGER KLAUS ,  ERB UWE ,  PALUMBO GINO ,  BROOKS IAIN ,  MCCREA JONATHAN

IPC: C25D1/04 ,  C25D5/02 ,  C25D5/06 ,  C25D5/18 ,  C25D5/20 ,  C25D7/04 ,  C25D15/02 ,  C25D17/00 ,  C25D21/12

Abstract: The invention relates to a process for forming coatings or free-standing deposits of nanocrystalline metals, metal alloys or metal matrix composites. The process employs drum plating or selective plating processes involving pulse electrodeposition and a non-stationary anode or cathode. Novel nanocrystalline metal matrix composites and micro components are disclosed as well. Also described is a process for forming micro components with grain sizes below 1,000nm.

公开(公告)号：CA2490464A1

公开(公告)日：2003-12-31

申请号：CA2490464

申请日：2002-06-25

Applicant: INTEGRAN TECHNOLOGIES INC

Inventor： PALUMBO GINO ,  BROOKS IAIN ,  ERB UWE ,  MCCREA JONATHAN ,  GONZALEZ FRANCISCO ,  TOMANTSCHGER KLAUS ,  HIBBARD GLENN D

IPC: C25D1/04 ,  C25D5/02 ,  C25D5/06 ,  C25D5/18 ,  C25D5/20 ,  C25D7/04 ,  C25D15/02 ,  C25D17/00 ,  C25D21/12

Abstract: The invention relates to a process for forming coatings or free-standing deposits of nano-crystalline metals, metal alloys or metal matrix composites . The process employs drum plating or selective plating processes involving pulse electrode-position and a non-stationary anode or cathode. Novel nano- crystalline metal matrix composites and micro components are disclosed as well. Also described is a process for forming micro-components with grain sizes below 1,000nm.

公开(公告)号：ES2301666T3

公开(公告)日：2008-07-01

申请号：ES02754753

申请日：2002-06-25

Applicant: INTEGRAN TECHNOLOGIES INC

Inventor： PALUMBO GINO ,  BROOKS IAIN ,  MCCREA JONATHAN ,  HIBBARD GLENN D ,  GONZALEZ FRANCISCO ,  TOMANTSCHGER KLAUS

IPC: C25D1/04 ,  C25D5/02 ,  C25D5/06 ,  C25D5/18 ,  C25D5/20 ,  C25D7/04 ,  C25D15/02 ,  C25D17/00 ,  C25D21/12

Abstract: Un proceso para electrodepositar catódicamente un material metálico seleccionado sobre un sustrato permanente o temporal en forma nanocristalina con un tamaño de grano promedio de menos de 100 nm usando electrodeposición por impulsos a una velocidad de deposición de al menos 0,05 mm/h, que comprende: proporcionar un electrolito acuoso que contiene iones del material metálico, mantener el electrolito a una temperatura en el intervalo de entre 0 a 85° C, proporcionar un ánodo y un cátodo en contacto con dicho electrolito, hacer pasar uno sólo o múltiples impulsos de corriente catódica C.D. entre el ánodo y el cátodo a una frecuencia de impulso de corriente catódica en el intervalo de aproximadamente 0 y 1000 Hz, a intervalos de impulso durante los cuales la corriente pasa durante un periodo de tiempo tcontacto en el intervalo de aproximadamente 0,1 a 50 mseg y no pasa durante un periodo de tiempo treposo en el intervalo de aproximadamente 0 a 500 mseg, y hacer pasar uno solo o mútliples impulsos de corriente anódica C.D. entre el cátodo y el ánodo a intervalos durante los cuales la corriente pasa durante un periodo de tiempo tanódico en el intervalo de 0 a 50 mseg, estando un ciclo de trabajo en un intervalo del 5 al 100% y una carga catódica (Qcatódica) por intervalo siendo siempre mayor que una carga anódica (Qanódica).