公开(公告)号：JPH04104157A

公开(公告)日：1992-04-06

申请号：JP22301990

申请日：1990-08-23

Applicant: KAO CORP

Inventor： MINAMI TAKAHIDE ,  II ATSUHIKO ,  NAKAMURA KOICHI

IPC: G03F7/027 ,  C08F2/46 ,  C08F2/48 ,  G03F7/029 ,  G03F7/038

Abstract: PURPOSE:To obtain the polymer image by applying not only ultraviolet rays but also the visible light and heat by incorporating a cation polymerization initator, a pyrolytic type hardening promotor, and a cation-polymerizable and/or a cross-linking polymerizable photosensitive compound each in a specified amount. CONSTITUTION:As the cation polymerization initiator, diphenyl-p-methyl(or methoxy)-phenacylsulfonium hexafluoroantimonate or the like in an amount of 1 - 50, preferably, 5 - 30pts.wt. of the polymerizable compound; as the pyrolytic type hardening promotor, a disulfide compound, an ester compound, a thioester compound, alone or a combination, in an amount of 5 - 50, preferably, 10 - 30pts.wt. of said compound; and as the cation-polymerizable compound, an epoxy compound, an epithio compound, an oxetane compound, a vinyl ether compound, and an aziridine compound, and the like can be enumerated as useful examples, thus permitting a polymer image to be obtained by the visible light or heat.

公开(公告)号：JPH0493843A

公开(公告)日：1992-03-26

申请号：JP20712690

申请日：1990-08-03

Applicant: KAO CORP

Inventor： MINAMI TAKAHIDE ,  II ATSUHIKO ,  NAKAMURA KOICHI

IPC: G03F7/028 ,  C08F2/46 ,  C08F2/48 ,  G03F7/029 ,  G03F7/032 ,  H01L21/027

Abstract: PURPOSE:To obtain a polymer image with high sensitivity by incorporating a radical polymerization initiator, a pyrolytic hardening promoter precursor, and a photosensitive compound in a specified proportion. CONSTITUTION:This thermophotopolymerizable composition contains 1 - 50 pts. wt. of the radial polymerization initiator, such as organic peroxides, organic halogenated compounds, or azo compounds, 5 - 50 pts. wt. of the pyrolytic hardening promoter precursor, such as compound to be allowed to produce a hardening promoter, such as a thiol compound, a hydroxyl compound, and a carboxylic acid, and 100 pts. wt. of the photosensitive compound polymerizable by the radial polymerization and/or cross-linking reaction, such as additionally polymerizable unsaturated compounds, alpha, beta-unsaturated ketone compounds and azido compounds, thus permitting a polymer image to be formed with high sensitivity by using not only ultraviolet rays, but also visible light, or heat.

公开(公告)号：JPH0474172A

公开(公告)日：1992-03-09

申请号：JP18616590

申请日：1990-07-13

Applicant: KAO CORP

Inventor： MINAMI TAKAHIDE ,  II ATSUHIKO ,  NAKAMURA KOICHI

IPC: G03F7/028 ,  C07D295/10 ,  C07D307/81 ,  C07D333/64 ,  C07D335/06 ,  C08F2/50

Abstract: NEW MATERIAL:An aryl ketone derivative of formula I [R ,R ,R are H, alkyl, alkoxy, nitro, OH; X is (CH2)l, O(CH2)m, etc.; l is 1-3; m is 0-2; p is 3-6). EXAMPLE:2-(4'-Piperidinobenxylidene)-1,3-indanedione. USE:A sensitizer. The compound of formula I has an excellent sensitizing action and is useful as a sensitizer for various photopolymerizable composition. PREPARATION:An active methylene compound of formula II is reacted with an aromatic aldehyde compound of formula III in the presence of a base (e.g. NaOH) in a solvent such as methanol at 70-110 deg.C to obtain the compound of formula I.

公开(公告)号：JPH10306163A

公开(公告)日：1998-11-17

申请号：JP4939798

申请日：1998-03-02

Applicant: KAO CORP

Inventor： TAKIGUCHI HITOSHI ,  RINDO KATSUHIKO ,  ODA TAKU ,  FERDINAND PESCH ,  II ATSUHIKO ,  CHRISTINE KAJAN ,  DIRK WEICAUSS

IPC: A61K8/72 ,  A61K8/34 ,  A61K8/89 ,  A61Q5/00 ,  A61Q5/02 ,  C08G73/02 ,  C08G77/452 ,  C08L83/08 ,  A61K7/00

Abstract: PROBLEM TO BE SOLVED: To provide an organopolysiloxane which is soluble or dispersible in solvents, esp. in water, forms a film with a good feel to the touch, and is suitable as an additive for perfumes and cosmetics, esp. for hairdressings, and to provide a hairdressing contg. the same. SOLUTION: This organopolysiloxane has a wt. average mol.wt. of 10,000-500,000 and comprises an organopolysiloxane segment (A) and at least one poly(N-acylalkyleneimine) segment (B) which comprises repeating units represented by the formula (wherein R is H or 1-3C alkyl; and n is 2 or 3) and is bonded to at least one silicone atom of segment A through a heteroatom- contg. alkylene group in a wt. ratio of segment A/segment B of (5:95)-(40:60). The hairdressing contains the organopolysiloxane and may further contain an ionic polymer and water or a mixture of water and 1 wt.% 1-6C lower alcohol.

公开(公告)号：JPH05112605A

公开(公告)日：1993-05-07

申请号：JP27552791

申请日：1991-10-23

Applicant: KAO CORP

Inventor： II ATSUHIKO ,  SAWADA MICHITAKA ,  NAKAMURA KOICHI

IPC: C08F2/24 ,  C08F12/00 ,  C08F18/14 ,  C08F20/10 ,  C08F26/00 ,  C08F120/04 ,  C08F212/06 ,  C08F212/36 ,  C08F218/02 ,  C08F218/08 ,  C08F218/14 ,  C08F220/06 ,  C08F220/20 ,  C08F226/06 ,  C08F236/00 ,  C08J5/18 ,  C08L29/00 ,  C08L29/04

Abstract: PURPOSE:To obtain an emulsion polymer, useful as coatings, etc., and capable of providing films excellent in strength by carrying out emulsion copolymerization of an ethylenically unsaturated monomer with a polyfunctional ethylenically unsaturated monomer using a specific emulsion dispersion stabilizer. CONSTITUTION:A radical polymerizable ethylenically unsaturated monomer (e.g. ethylene or styrene) or a diene-based monomer (e.g. butadiene or isoprene) and a polyfunctional ethylenically unsaturated monomer (e.g. divinylbenzene or tetraallyloxyethane) are subjected to emulsion copolymerization using a PVA-based polymer having mercapto groups at the terminals as an emulsion dispersion stabilizer. The PVA-based polymer having the mercapto groups at the terminals is preferably obtained by polymerizing a vinyl monomer consisting essentially of monomers of vinyl esters in the presence of a thiolic acid and then saponifying the produced PVA-based polymer. Thiolacetic acid is preferred as the thiolic acid and vinyl acetate is preferred as the vinyl ester monomers.

公开(公告)号：JPH0478857A

公开(公告)日：1992-03-12

申请号：JP19223390

申请日：1990-07-20

Applicant: KAO CORP

Inventor： MINAMI TAKAHIDE ,  II ATSUHIKO ,  NAKAMURA KOICHI

IPC: G03F7/027 ,  G03F7/028 ,  G03F7/38

Abstract: PURPOSE:To obtain the photosensitive resin composition high in sensitivity and not causing fogging by using a specified ketal or thioketal type compound. CONSTITUTION:This composition comprises a compound having an ethylenically unsaturated bond polymerizable by free radicals, a compound (A) to be allowed to release an acid by active radiation, such as diphenyliodonium iodide, a visible light sensitizer (B), such as Phthalocyanine Blue, and the ketal or thioketal type compound (C) represented by formula I in which X is O or S; at least one of R and R is aryl and the other is alkyl; and n is 2 or 3, and this compound can be embodied by 2,2-diphenyl-1,3-dioxacycloheptane and the like.