公开(公告)号：SG10201912816UA

公开(公告)日：2020-02-27

申请号：SG10201912816U

申请日：2016-05-19

Applicant: KLA TENCOR CORP

Inventor： LEVINSKI VLADIMIR ,  PASKOVER YURI ,  MANASSEN AMNON ,  SHALIBO YONI

Abstract: Metrology tools and methods are provided, which estimate the effect of topographic phases corresponding to different diffraction orders, which result from light scattering on periodic targets, and adjust the measurement conditions to improve measurement accuracy. In imaging, overlay error magnification may be reduced by choosing appropriate measurement conditions based on analysis of contrast function behavior, changing illumination conditions (reducing spectrum width and illumination NA), using polarizing targets and/or optical systems, using multiple defocusing positions etc. On-the-fly calibration of measurement results may be carried out in imaging or scatterometry using additional measurements or additional target cells.

公开(公告)号：SG10201912512UA

公开(公告)日：2020-02-27

申请号：SG10201912512U

申请日：2017-07-28

Applicant: KLA TENCOR CORP

Inventor： HILL ANDY (ANDREW) ,  MANASSEN AMNON ,  PASKOVER YURI ,  LUBASHEVSKY YUVAL

Abstract: Metrology methods and systems are provided, in which the detected image is split at a field plane of the collection path of the metrology system's optical system into at least two pupil plane images. Optical elements such as prisms may be used to split the field plane images, and multiple targets or target cells may be measured simultaneously by spatially splitting the field plane and/or the illumination sources and/or by using two polarization types. The simultaneous capturing of multiple targets or target cells increases the throughput of the disclosed metrology systems.