公开(公告)号：SG10201912818WA

公开(公告)日：2020-02-27

申请号：SG10201912818W

申请日：2016-05-19

Applicant: KLA TENCOR CORP

Inventor： LEVINSKI VLADIMIR ,  PASKOVER YURI ,  MANASSEN AMNON ,  SHALIBO YONI

Abstract: Metrology tools and methods are provided, which estimate the effect of topographic phases corresponding to different diffraction orders, which result from light scattering on periodic targets, and adjust the measurement conditions to improve measurement accuracy. In imaging, overlay error magnification may be reduced by choosing appropriate measurement conditions based on analysis of contrast function behavior, changing illumination conditions (reducing spectrum width and illumination NA), using polarizing targets and/or optical systems, using multiple defocusing positions etc. On-the-fly calibration of measurement results may be carried out in imaging or scatterometry using additional measurements or additional target cells.

公开(公告)号：SG10201912822UA

公开(公告)日：2020-02-27

申请号：SG10201912822U

申请日：2016-05-19

Applicant: KLA TENCOR CORP

Inventor： LEVINSKI VLADIMIR ,  PASKOVER YURI ,  MANASSEN AMNON ,  SHALIBO YONI

Abstract: Metrology tools and methods are provided, which estimate the effect of topographic phases corresponding to different diffraction orders, which result from light scattering on periodic targets, and adjust the measurement conditions to improve measurement accuracy. In imaging, overlay error magnification may be reduced by choosing appropriate measurement conditions based on analysis of contrast function behavior, changing illumination conditions (reducing spectrum width and illumination NA), using polarizing targets and/or optical systems, using multiple defocusing positions etc. On-the-fly calibration of measurement results may be carried out in imaging or scatterometry using additional measurements or additional target cells.

公开(公告)号：SG10201912816UA

公开(公告)日：2020-02-27

申请号：SG10201912816U

申请日：2016-05-19

Applicant: KLA TENCOR CORP

Inventor： LEVINSKI VLADIMIR ,  PASKOVER YURI ,  MANASSEN AMNON ,  SHALIBO YONI

Abstract: Metrology tools and methods are provided, which estimate the effect of topographic phases corresponding to different diffraction orders, which result from light scattering on periodic targets, and adjust the measurement conditions to improve measurement accuracy. In imaging, overlay error magnification may be reduced by choosing appropriate measurement conditions based on analysis of contrast function behavior, changing illumination conditions (reducing spectrum width and illumination NA), using polarizing targets and/or optical systems, using multiple defocusing positions etc. On-the-fly calibration of measurement results may be carried out in imaging or scatterometry using additional measurements or additional target cells.