Abstract:
Superconducting field effect device comprises: (a) an oxide crystal substrate (10); (b) 1st high temp. superconducting thin films (20), electrically sepd. from each other, where each film acts as a source/drain; (c) a patterning layer (30) formed on one of the films (20) and one part of the exposed surface of the substrate; (d) a 2nd high temp. superconducting thin film (40) having a 1st part (40 a) orientated vertically in the C axis, in which the patterning layer does not exist, a 2nd part (40 b) orientated horizontally in the C-axis, in which the patterning layer does exist, and a grain boundary (40c) formed between the two parts; (e) a gate insulating layer (60) formed on the 2nd thin film; (f) a gate electrode (70 c) formed on the gate insulating layer and; (g) source and drain electrodes (70 a, 70 b) formed on the exposed surfaces of the 2nd high temp. superconducting thin film over both 1st thin films. Prodn. of the device is also claimed.