11.
    发明专利
    未知

    公开(公告)号:DE69920453D1

    公开(公告)日:2004-10-28

    申请号:DE69920453

    申请日:1999-06-30

    Applicant: LAM RES CORP

    Abstract: An electrode assembly for a plasma reaction chamber wherein processing of a semiconductor substrate such as a single wafer can be carried out, a method of manufacture of the electrode assembly and a method of processing a semiconductor substrate with the assembly. The electrode assembly includes a support member such as a graphite ring, an electrode such as a silicon showerhead electrode in the form of a circular disk of uniform thickness and an elastomeric joint between the support member and the electrode. The elastomeric joint allows movement between the support member and the electrode to compensate for thermal expansion as a result of temperature cycling of the electrode assembly. The elastomeric joint can include an electrically andor thermally conductive filler and the elastomer can be a catalyst-cured polymer which is stable at high temperatures.

    12.
    发明专利
    未知

    公开(公告)号:DE69920453T2

    公开(公告)日:2005-11-24

    申请号:DE69920453

    申请日:1999-06-30

    Applicant: LAM RES CORP

    Abstract: An electrode assembly for a plasma reaction chamber wherein processing of a semiconductor substrate such as a single wafer can be carried out, a method of manufacture of the electrode assembly and a method of processing a semiconductor substrate with the assembly. The electrode assembly includes a support member such as a graphite ring, an electrode such as a silicon showerhead electrode in the form of a circular disk of uniform thickness and an elastomeric joint between the support member and the electrode. The elastomeric joint allows movement between the support member and the electrode to compensate for thermal expansion as a result of temperature cycling of the electrode assembly. The elastomeric joint can include an electrically andor thermally conductive filler and the elastomer can be a catalyst-cured polymer which is stable at high temperatures.

    ELECTRODO PARA PROCESOS CON PLASMA Y PROCEDIMIENTO DE FABRICACION Y USO DEL MISMO.

    公开(公告)号:ES2229731T3

    公开(公告)日:2005-04-16

    申请号:ES99932201

    申请日:1999-06-30

    Applicant: LAM RES CORP

    Abstract: Un conjunto de electrodo útil para una cámara de reacción de plasma utilizada en el proceso de substratos semiconductores, el cual comprende: un elemento soporte; un electrodo (42) activado por radiofrecuencia que tiene en uno de sus lados una superficie energizada con radiofrecuencia; caracterizado porque: el elemento soporte tiene una superficie de unión, dicho electrodo accionado por radiofrecuencia tiene una superficie de unión, en un borde exterior y en un lado opuesto a la superficie energizada por radiofrecuencia, que se pone en contacto con la superficie de unión del elemento soporte, una junta elastomérica (46) entre el borde exterior del electrodo (42) y el elemento soporte, caracterizada porque la junta elastomérica (46) es un material de unión o adhesivo elastomérico polimerizable que sujeta elásticamente el electrodo (42) al elemento soporte de manera que permita un movimiento entre el electrodo (42) y el elemento soporte durante las variaciones cíclicas de temperatura de los mismos.

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