ELECTRODE FOR PLASMA PROCESSES AND METHOD FOR MANUFACTURE AND USE THEREOF
    1.
    发明申请
    ELECTRODE FOR PLASMA PROCESSES AND METHOD FOR MANUFACTURE AND USE THEREOF 审中-公开
    用于等离子体处理的电极及其制造方法和用途

    公开(公告)号:WO0000998A3

    公开(公告)日:2000-08-10

    申请号:PCT/US9915053

    申请日:1999-06-30

    Applicant: LAM RES CORP

    CPC classification number: H01J37/32009 H01J37/3244 H01J37/32532

    Abstract: An electrode assembly for a plasma reaction chamber wherein processing of a semiconductor substrate such as a single wafer can be carried out, a method of manufacture of the electrode assembly and a method of processing a semiconductor substrate with the assembly. The electrode assembly includes a support member such as a graphite ring, an electrode such as a silicon showerhead electrode in the form of a circular disk of uniform thickness and an elastomeric joint between the support member and the electrode. The elastomeric joint allows movement between the support member and the electrode to compensate for thermal expansion as a result of temperature cycling of the electrode assembly. The elastomeric joint can include an electrically and/or thermally conductive filler and the elastomer can be a catalyst-cured polymer which is stable at high temperatures.

    Abstract translation: 可以执行用于等离子体反应室的电极组件,其中可以执行诸如单个晶片的半导体衬底的处理,制造电极组件的方法以及使用该组件处理半导体衬底的方法。 电极组件包括诸如石墨环之类的支撑构件,诸如呈均匀厚度的圆盘形式的硅喷头电极的电极以及在支撑构件与电极之间的弹性体接头。 由于电极组件的温度循环,弹性接头允许支撑构件和电极之间的移动以补偿热膨胀。 弹性体接头可以包括导电和/或导热填料,弹性体可以是在高温下稳定的催化剂固化的聚合物。

    ELASTOMER BONDED PARTS FOR PLASMA PROCESSES AND METHOD FOR MANUFACTURE AND USE THEREOF
    2.
    发明申请
    ELASTOMER BONDED PARTS FOR PLASMA PROCESSES AND METHOD FOR MANUFACTURE AND USE THEREOF 审中-公开
    用于等离子体处理的弹性体粘合部件及其制造和使用方法

    公开(公告)号:WO0000999A9

    公开(公告)日:2000-10-12

    申请号:PCT/US9914790

    申请日:1999-06-30

    CPC classification number: H01J37/32009 H01J37/3244 H01J37/32532

    Abstract: An elastomeric joint assembly for a plasma reaction chamber wherein processing of a semiconductor substrate such as a single wafer can be carried out, a method of manufacture of the assembly and a method of processing a semiconductor substrate with the assembly. The elastomeric joint assembly can comprise a part such as an electrode, a window, a liner or other part bonded to a support member by an elastomeric material. In an electrode assembly, the support member can comprise a graphite ring bonded to an electrode such as a silicon showerhead electrode by an elastomeric joint. The elastomeric joint allows movement between the support member and the electrode to compensate for thermal expansion as a result of temperature cycling of the electrode assembly. The elastomeric joint can include an electrically and/or thermally conductive filler and the elastomer can be a catalyst-cured polymer which is stable at high temperatures.

    Abstract translation: 可以执行用于等离子体反应室的弹性体接头组件,其中可以执行诸如单个晶片的半导体衬底的处理,该组件的制造方法以及使用该组件处理半导体衬底的方法。 弹性接头组件可以包括诸如电极,窗口,衬垫或其他部分的部件,该部件通过弹性体材料结合到支撑构件。 在电极组件中,支撑构件可以包括通过弹性体接头结合到诸如硅喷头电极的电极的石墨环。 由于电极组件的温度循环,弹性接头允许支撑构件和电极之间的移动以补偿热膨胀。 弹性体接头可以包括导电和/或导热填料,弹性体可以是在高温下稳定的催化剂固化的聚合物。

    ELASTOMER BONDED PARTS FOR PLASMA PROCESSES AND METHOD FOR MANUFACTURE AND USE THEREOF
    3.
    发明公开
    ELASTOMER BONDED PARTS FOR PLASMA PROCESSES AND METHOD FOR MANUFACTURE AND USE THEREOF 有权
    ELASTOMER-GEBUNDENE TEILE FUR PLASMAVERFAHREN,DEREN HERSTELLUNG UND VERWENDUNG

    公开(公告)号:EP1105917A4

    公开(公告)日:2003-05-21

    申请号:EP99933616

    申请日:1999-06-30

    Applicant: LAM RES CORP

    CPC classification number: H01J37/32009 H01J37/3244 H01J37/32532

    Abstract: An elastomeric joint assembly for a plasma reaction chamber wherein processing of a semiconductor substrate such as a single wafer can be carried out, a method of manufacture of the assembly and a method of processing a semiconductor substrate with the assembly. The elastomeric joint assembly can comprise a part such as an electrode, a window, a liner or other part bonded to a support member by an elastomeric material. In an electrode assembly, the support member can comprise a graphite ring bonded to an electrode such as a silicon showerhead electrode by an elastomeric joint. The elastomeric joint allows movement between the support member and the electrode to compensate for thermal expansion as a result of temperature cycling of the electrode assembly. The elastomeric joint can include an electrically and/or thermally conductive filler and the elastomer can be a catalyst-cured polymer which is stable at high temperatures.

    Abstract translation: 一种用于等离子体反应室的电极组件,其中可以执行诸如单个晶片的半导体衬底的处理,电极组件的制造方法和使用该组件处理半导体衬底的方法。 电极组件包括诸如石墨环的支撑构件,具有均匀厚度的圆盘形式的诸如硅喷头电极的电极和在支撑构件和电极之间的弹性体接头。 弹性接头允许支撑构件和电极之间的移动,以补偿由于电极组件的温度循环导致的热膨胀。 弹性体接头可以包括导电导热填料,弹性体可以是在高温下稳定的催化剂固化的聚合物。

    ELASTOMERIC BONDING MATERIAL FOR PLASMA TREATMENT AND METHOD OF MANUFACTURE AND USE THEREOF

    公开(公告)号:JP2003133296A

    公开(公告)日:2003-05-09

    申请号:JP2002207379

    申请日:2002-07-16

    Applicant: LAM RES CORP

    Abstract: PROBLEM TO BE SOLVED: To provide a plasma reaction chamber having an elastomeric joint, a method for manufacturing the plasma reaction chamber, and a method for treating substrates. SOLUTION: An elastomeric joint assembly can comprise parts such as an electrode, a window, a liner or the like, and/or other parts bonded to a support member by an elastomeric material. In an electrode assembly, the support member can comprise a graphite ring 42 coupled with the electrode of a silicon shower head electrode 42 or the like by the elastomeric joint. The elastomeric joint allows movement between the support member and the electrode to compensate for thermal expansion as a result of temperature cycling of the electrode assembly. The elastomeric joint can include an electrically and/or thermally conductive filler and the elastomer can be a catalyst-cured polymer which is stable at high temperatures.

    5.
    发明专利
    未知

    公开(公告)号:DE69931168T2

    公开(公告)日:2007-03-08

    申请号:DE69931168

    申请日:1999-06-30

    Applicant: LAM RES CORP

    Abstract: An electrode assembly for a plasma reaction chamber wherein processing of a semiconductor substrate such as a single wafer can be carried out, a method of manufacture of the electrode assembly and a method of processing a semiconductor substrate with the assembly. The electrode assembly includes a support member such as a graphite ring, an electrode such as a silicon showerhead electrode in the form of a circular disk of uniform thickness and an elastomeric joint between the support member and the electrode. The elastomeric joint allows movement between the support member and the electrode to compensate for thermal expansion as a result of temperature cycling of the electrode assembly. The elastomeric joint can include an electrically andor thermally conductive filler and the elastomer can be a catalyst-cured polymer which is stable at high temperatures.

    Elastomer bonded parts for plasma processes and method for manufacture and use thereof

    公开(公告)号:AU4963699A

    公开(公告)日:2000-01-17

    申请号:AU4963699

    申请日:1999-06-30

    Applicant: LAM RES CORP

    Abstract: An electrode assembly for a plasma reaction chamber wherein processing of a semiconductor substrate such as a single wafer can be carried out, a method of manufacture of the electrode assembly and a method of processing a semiconductor substrate with the assembly. The electrode assembly includes a support member such as a graphite ring, an electrode such as a silicon showerhead electrode in the form of a circular disk of uniform thickness and an elastomeric joint between the support member and the electrode. The elastomeric joint allows movement between the support member and the electrode to compensate for thermal expansion as a result of temperature cycling of the electrode assembly. The elastomeric joint can include an electrically andor thermally conductive filler and the elastomer can be a catalyst-cured polymer which is stable at high temperatures.

    PIEZAS UNIDAS POR ELASTOMERO PARA PROCESOS POR PLASMA Y PROCEDIMIENTO DE FABRICACION Y USO DE LAS MISMAS.

    公开(公告)号:ES2264263T3

    公开(公告)日:2006-12-16

    申请号:ES99933616

    申请日:1999-06-30

    Applicant: LAM RES CORP

    Abstract: Un conjunto de junta elastomérica de una cámara de reacción de plasma usada en el proceso de un sustrato semiconductor, que comprende: una primera pieza (42) que tiene una superficie de unión, una segunda pieza (44) que tiene una superficie de unión en contacto con la superficie de unión de la primera pieza (42); y una junta (46) elastomérica entre la primera pieza (42) y la segunda pieza (44), fijando de forma resiliente la junta (46) elastomérica la primera pieza (42) con la segunda pieza (44) para permitir el movimiento entre la primera pieza (42) y la segunda pieza (44) durante el ciclo de temperaturas de las mismas; en el que dicha junta elastomérica está localizada en un rebajo (48) en la primera pieza (42) definido por una pared (50) que protege la junta elastomérica (46) del ataque por el medio de plasma en una cámara de reactor de plasma.

    Electrode for plasma processes and method for manufacture and use thereof

    公开(公告)号:AU4856299A

    公开(公告)日:2000-01-17

    申请号:AU4856299

    申请日:1999-06-30

    Applicant: LAM RES CORP

    Abstract: An electrode assembly for a plasma reaction chamber wherein processing of a semiconductor substrate such as a single wafer can be carried out, a method of manufacture of the electrode assembly and a method of processing a semiconductor substrate with the assembly. The electrode assembly includes a support member such as a graphite ring, an electrode such as a silicon showerhead electrode in the form of a circular disk of uniform thickness and an elastomeric joint between the support member and the electrode. The elastomeric joint allows movement between the support member and the electrode to compensate for thermal expansion as a result of temperature cycling of the electrode assembly. The elastomeric joint can include an electrically andor thermally conductive filler and the elastomer can be a catalyst-cured polymer which is stable at high temperatures.

    9.
    发明专利
    未知

    公开(公告)号:DE69939606D1

    公开(公告)日:2008-10-30

    申请号:DE69939606

    申请日:1999-06-30

    Applicant: LAM RES CORP

    Abstract: An electrode assembly for a plasma reaction chamber wherein processing of a semiconductor substrate such as a single wafer can be carried out, a method of manufacture of the electrode assembly and a method of processing a semiconductor substrate with the assembly. The electrode assembly includes a support member such as a graphite ring, an electrode such as a silicon showerhead electrode in the form of a circular disk of uniform thickness and an elastomeric joint between the support member and the electrode. The elastomeric joint allows movement between the support member and the electrode to compensate for thermal expansion as a result of temperature cycling of the electrode assembly. The elastomeric joint can include an electrically andor thermally conductive filler and the elastomer can be a catalyst-cured polymer which is stable at high temperatures.

    10.
    发明专利
    未知

    公开(公告)号:DE69931168D1

    公开(公告)日:2006-06-08

    申请号:DE69931168

    申请日:1999-06-30

    Applicant: LAM RES CORP

    Abstract: An electrode assembly for a plasma reaction chamber wherein processing of a semiconductor substrate such as a single wafer can be carried out, a method of manufacture of the electrode assembly and a method of processing a semiconductor substrate with the assembly. The electrode assembly includes a support member such as a graphite ring, an electrode such as a silicon showerhead electrode in the form of a circular disk of uniform thickness and an elastomeric joint between the support member and the electrode. The elastomeric joint allows movement between the support member and the electrode to compensate for thermal expansion as a result of temperature cycling of the electrode assembly. The elastomeric joint can include an electrically andor thermally conductive filler and the elastomer can be a catalyst-cured polymer which is stable at high temperatures.

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