公开(公告)号：EP1368136A4

公开(公告)日：2005-10-12

申请号：EP02724947

申请日：2002-02-14

Applicant: MICELL TECHNOLOGIES INC

Inventor： DEYOUNG JAMES P ,  GROSS STEPHEN M ,  MCCLAIN JAMES B ,  COLE MICHAEL E ,  BRAINARD DAVID E ,  DESIMONE JOSEPH M

IPC: G03F7/32 ,  B08B7/00 ,  H01L21/027 ,  H01L21/304 ,  H01L21/306 ,  B08B3/00 ,  F26B3/00 ,  G03F7/42 ,  H01L21/00

CPC classification number: B08B7/0021 ,  H01L21/02063

Abstract: A method of cleaning and removing water, entrained solutes and particulate matter during a manufacturing process from a microelectronic device comprises the steps of: (a) providing a partially fabricated integrated circuit, MEM's device, or optoelectronic device having water and entrained solutes on the substrate; (b) providing a densified carbon dioxide cleaning composition, the cleaning composition comprising carbon dioxide and, optionally but preferably, a cleaning adjunct; (c) immersing the surface portion in the densified carbon dioxide drying composition; and then (d) removing the cleaning composition from the surface portion.