System for the control of a carbon dioxide cleaning apparatus

    公开(公告)号:AU7594100A

    公开(公告)日:2001-04-30

    申请号:AU7594100

    申请日:2000-09-20

    Abstract: Cleaning apparatus having multiple wash tanks for washing articles in a carbon dioxide dry cleaning system employing a liquid carbon dioxide cleaning solution are provided. Cleaning apparatus having multiple wash tanks of the present invention may provide improved thermodynamic efficiency by allowing carbon dioxide vapor to be transferred between wash tanks rather than condensed. Cleaning apparatus having multiple wash tanks of the present invention may have a lower capital cost than multiple cleaning systems having single wash tanks. Cleaning apparatus having multiple wash tanks of the present invention include a first wash tank for contacting a first article with liquid carbon dioxide cleaning solution, and a second wash tank for contacting a second article with liquid carbon dioxide cleaning solution. The second wash tank is in fluid communication with the first wash tank. Methods of utilizing such cleaning apparatus are also provided. Coating apparatus having multiple coating tanks and methods of utilizing such coating apparatus are also provided.

    Method of coating microelectronic substrates

    公开(公告)号:AU2003294557A8

    公开(公告)日:2004-08-30

    申请号:AU2003294557

    申请日:2003-12-02

    Abstract: A method of coating a substrate comprises the steps of: (a) providing a substrate in an enclosed vessel, the substrate having a surface portion; (b) at least partially filling the enclosed vessel with a first supercritical fluid so that said first supercritical fluid contacts the surface portion, with the first supercritical fluid carrying or containing a coating component; then (c) adding a separate compressed gas atmosphere to the reaction vessel so that a boundary is formed between the first supercritical fluid and the separate compressed gas atmosphere, said separate compressed gas atmosphere having a density less than said first supercritical fluid; and then (d) displacing said first supercritical fluid from said vessel by continuing adding said separate compressed gas atmosphere to said vessel so that said boundary moves across said surface portion and a thin film of coating component is deposited on said microelectronic substrate.

    Divided pressure vessel apparatus for carbon dioxide based systems and methods of using same

    公开(公告)号:AU1154602A

    公开(公告)日:2002-04-22

    申请号:AU1154602

    申请日:2001-10-10

    Abstract: A method of utilizing a divided pressure vessel in a processing system employing a carbon dioxide based solvent includes transferring a first carbon dioxide based treating solution from a first liquid chamber in a divided pressure vessel having a plurality of liquid chambers to a processing vessel, returning the first treating solution from the processing vessel to the divided pressure vessel, transferring a second carbon dioxide based treating solution having a composition different from the first treating solution from a second liquid chamber in the divided pressure vessel to a processing vessel, and returning the second treating solution from the processing vessel to the divided pressure vessel. A divided pressure vessel may allow multiple solvent baths each having a different chemical composition to be stored and/or processed in a single pressure vessel while maintaining the different chemical compositions of the multiple solvent baths. Thus, such divided pressure vessels may provide the improved operational efficiency of a carbon dioxide based system having multiple solvent baths while decreasing the capital costs that may be associated with such systems.

    METHODS AND APPARATUS FOR CONSERVING VAPOR AND COLLECTING LIQUID CARBON DIOXIDE FOR CARBON DIOXIDE DRY CLEANING

    公开(公告)号:CA2385673A1

    公开(公告)日:2001-04-05

    申请号:CA2385673

    申请日:2000-09-20

    Abstract: A method for conserving carbon dioxide vapor in a carbon dioxide dry cleanin g system employing a liquid carbon dioxide cleaning solution to clean articles , where the method includes removing carbon dioxide vapor from a wash tank to a vapor tank, storing the carbon dioxide vapor in the vapor tank; and charging the wash tank with carbon dioxide vapor from the vapor tank. The method may be performed as part of a wash cycle that includes filling the wash tank with cleaning solution, washing articles to be cleaned in the wash tank, and emptying the cleaning solution out of the wash tank. An apparatus may also b e employed for conserving carbon dioxide vapor in a carbon dioxide dry cleanin g system employing a liquid carbon dioxide cleaning solution to clean articles , where the apparatus includes a wash tank for contacting the articles to be cleaned with the liquid carbon dioxide cleaning solution, a working tank for storing liquid carbon dioxide cleaning solution, a vapor tank for storing carbon dioxide vapor, a first piping system providing fluid communication between the wash tank and the vapor tank, where the first piping system includes a first line and a first valve residing in the first line, and a second piping system providing fluid communication between the working tank and the wash tank. Methods and apparatus for collecting liquid carbon dioxid e in a collecting tank are also provided.

    METHOD OF COATING MICROELECTRONIC SUBSTRATES

    公开(公告)号:AU2003294557A1

    公开(公告)日:2004-08-30

    申请号:AU2003294557

    申请日:2003-12-02

    Abstract: A method of coating a substrate comprises the steps of: (a) providing a substrate in an enclosed vessel, the substrate having a surface portion; (b) at least partially filling the enclosed vessel with a first supercritical fluid so that said first supercritical fluid contacts the surface portion, with the first supercritical fluid carrying or containing a coating component; then (c) adding a separate compressed gas atmosphere to the reaction vessel so that a boundary is formed between the first supercritical fluid and the separate compressed gas atmosphere, said separate compressed gas atmosphere having a density less than said first supercritical fluid; and then (d) displacing said first supercritical fluid from said vessel by continuing adding said separate compressed gas atmosphere to said vessel so that said boundary moves across said surface portion and a thin film of coating component is deposited on said microelectronic substrate.

    Methods and apparatus for conserving vapor and collecting liquid carbon dioxide for carbon dioxide dry cleaning

    公开(公告)号:AU7705800A

    公开(公告)日:2001-04-30

    申请号:AU7705800

    申请日:2000-09-20

    Abstract: A method for conserving carbon dioxide vapor in a carbon dioxide dry cleaning system employing a liquid carbon dioxide cleaning solution to clean articles, where the method includes removing carbon dioxide vapor from a wash tank to a vapor tank, storing the carbon dioxide vapor in the vapor tank; and charging the wash tank with carbon dioxide vapor from the vapor tank. The method may be performed as part of a wash cycle that includes filling the wash tank with cleaning solution, washing articles to be cleaned in the wash tank, and emptying the cleaning solution out of the wash tank. An apparatus may also be employed for conserving carbon dioxide vapor in a carbon dioxide dry cleaning system employing a liquid carbon dioxide cleaning solution to clean articles, where the apparatus includes a wash tank for contacting the articles to be cleaned with the liquid carbon dioxide cleaning solution, a working tank for storing liquid carbon dioxide cleaning solution, a vapor tank for storing carbon dioxide vapor, a first piping system providing fluid communication between the wash tank and the vapor tank, where the first piping system includes a first line and a first valve residing in the first line, and a second piping system providing fluid communication between the working tank and the wash tank. Methods and apparatus for collecting liquid carbon dioxide in a collecting tank are also provided.

    METHOD OF COATING MICROELECTRONIC SUBSTRATES
    9.
    发明申请
    METHOD OF COATING MICROELECTRONIC SUBSTRATES 审中-公开
    涂覆微电子基片的方法

    公开(公告)号:WO2004070071A3

    公开(公告)日:2004-11-11

    申请号:PCT/US0338324

    申请日:2003-12-02

    Abstract: A method of coating a substrate comprises the steps of: (a) providing a substrate in an enclosed vessel, the substrate having a surface portion; (b) at least partially filling the enclosed vessel with a first supercritical fluid so that said first supercritical fluid contacts the surface portion, with the first supercritical fluid carrying or containing a coating component; then (c) adding a separate compressed gas atmosphere to the reaction vessel so that a boundary is formed between the first supercritical fluid and the separate compressed gas atmosphere, said separate compressed gas atmosphere having a density less than said first supercritical fluid; and then (d) displacing said first supercritical fluid from said vessel by continuing adding said separate compressed gas atmosphere to said vessel so that said boundary moves across said surface portion and a thin film of coating component is deposited on said microelectronic substrate.

    Abstract translation: 一种涂布基材的方法包括以下步骤:(a)在封闭容器中提供基材,基材具有表面部分; (b)用第一超临界流体至少部分地填充封闭容器,使得所述第一超临界流体接触表面部分,第一超临界流体携带或含有涂层组分; 然后(c)将单独的压缩气体气氛添加到反应容器中,使得在第一超临界流体和单独的压缩气体气氛之间形成边界,所述单独的压缩气体气氛的密度小于所述第一超临界流体的密度; 然后(d)通过继续将所述分开的压缩气体气氛加入所述容器,使所述边界移过所述表面部分,并将涂层组分的薄膜沉积在所述微电子基底上,从所述容器中置换所述第一超临界流体。

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