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    Radiometric scatter monitor
    11.
    发明授权
    Radiometric scatter monitor 失效
    辐射散射监视器

    公开(公告)号：US06490031B1

    公开(公告)日：2002-12-03

    申请号：US09675535

    申请日：2000-09-29

    Applicant: Michael Goldstein ,  Keith Andresen

    Inventor： Michael Goldstein ,  Keith Andresen

    IPC: G01J100

    CPC classification number: G01J1/42 ,  G01J1/0271 ,  G01J1/04

    Abstract: Scattered light is detected radiometrically in a photolithography system. A photodetector makes direct measurements of scatter at points in the line or plane of illumination, and a generalized scatter function is derived from these measured data.

    Abstract translation: 在光刻系统中通过放射学检测散射光。 光电检测器直接测量照明线或平面中的点处的散射，并且从这些测量数据导出广义散射函数。

    Automatic inspection of printing plates or cylinders
    12.
    发明授权
    Automatic inspection of printing plates or cylinders 失效
    自动检查印版或滚筒

    公开(公告)号：US5652804A

    公开(公告)日：1997-07-29

    申请号：US275902

    申请日：1994-07-15

    Applicant: Rafail Bronstein ,  Omer Karp ,  Michael Goldstein

    Inventor： Rafail Bronstein ,  Omer Karp ,  Michael Goldstein

    IPC: B41F33/00 ,  G06K9/00

    CPC classification number: B41F33/0036 ,  B41F33/0027 ,  B41N3/003

    Abstract: A method for inspecting a surface of a printing medium, the method comprising the steps of acquiring an image of the surface or a portion thereof, digitizing the acquired image whereby a digitized real representation of the surface or portion is obtained. The method also include the step of for each of said digitized real representation performing either or both of the steps of comparing said digitized real representation with a digital reference representation, said reference representation being a virtual digital fault-free representation of said surface or portion thereof and determining whether said real digitized representation is in compliance with stipulations of a set of rules which define the characteristics of a fault-free digital representation of said surface or portion, and providing either a correct indication output signal where there is a match between said real digitized representation with said reference digital representation in the case of the step of comparing or compliance with said rules in the case of said step of determining, or fault indication output signal where there is a mismatch in the case of the step of comparing or incompliance in the case of the case of determining.

    Abstract translation: 一种用于检查打印介质的表面的方法，所述方法包括以下步骤：获取所述表面或其一部分的图像，数字化所获取的图像，由此获得所述表面或部分的数字化的实际表示。 该方法还包括对于每个所述数字化的实际表示的步骤，执行将所述数字化实际表示与数字参考表示进行比较的步骤之一或两者，所述参考表示是所述表面或其部分的虚拟数字无故障表示 以及确定所述真实数字化表示是否符合限定所述表面或部分的无故障数字表示的特性的一组规则的规定，以及提供正确的指示输出信号，其中在所述真实数字化表示之间存在匹配 在所述确定步骤的情况下比较或符合所述规则的步骤的情况下具有所述参考数字表示的数字化表示，或者在步骤比较或不符合的情况下存在不匹配的故障指示输出信号 情况确定的情况。

    Composite metal films and carbon nanotube fabrication
    14.
    发明授权
    Composite metal films and carbon nanotube fabrication 有权
    复合金属薄膜和碳纳米管制作

    公开(公告)号：US07635503B2

    公开(公告)日：2009-12-22

    申请号：US11359165

    申请日：2006-02-21

    Applicant: Juan E. Dominguez ,  Valery M. Dubin ,  Florian Gstrein ,  Michael Goldstein

    Inventor： Juan E. Dominguez ,  Valery M. Dubin ,  Florian Gstrein ,  Michael Goldstein

    IPC: C23C16/00

    CPC classification number: B82Y40/00 ,  B82Y30/00 ,  C01B32/162 ,  Y10S977/742

    Abstract: Embodiments of the present invention provide methods for the fabrication of carbon nanotubes using composite metal films. A composite metal film is fabricated to provide uniform catalytic sites to facilitate the uniform growth of carbon nanotubes. Further embodiments provide embedded nanoparticles for carbon nanotube fabrication. Embodiments of the invention are capable of maintaining the integrity of the catalytic sites at temperatures used in carbon nanotube fabrication processes, 600 to 1100° C.

    Abstract translation: 本发明的实施例提供了使用复合金属膜制造碳纳米管的方法。 制造复合金属膜以提供均匀的催化位点以促进碳纳米管的均匀生长。 另外的实施方案提供用于碳纳米管制造的嵌入式纳米颗粒。 本发明的实施方案能够在碳纳米管制造工艺中使用的温度下维持催化部位的完整性，其温度为600至1100℃

    Method of and apparatus for modifying polarity of light
    16.
    发明申请
    Method of and apparatus for modifying polarity of light 失效
    修改光的极性的方法和装置

    公开(公告)号：US20060250694A1

    公开(公告)日：2006-11-09

    申请号：US11123562

    申请日：2005-05-05

    Applicant: David Williams ,  Michael Goldstein ,  James Kardach

    Inventor： David Williams ,  Michael Goldstein ,  James Kardach

    IPC: G02B27/28

    CPC classification number: G02B27/286

    Abstract: A method of modifying polarity of light is provided. The light propagates through a first transverse plane and has known polarization states in respective cells of the first transverse plane. A first retardation compensator having respective waveplates matching the cells then changes the polarity of the light so that light propagating through a second transverse plane is circularly polarized across the entire second transverse plane. A second retardation compensator includes a plurality of quarter waveplates that change the polarization of the circularly polarized light, so that light passing through a third transverse plane is linearly polarized. The crystal alignment of the quarter waveplates and their shape and configuration are selected so that the direction of the polarization is normal to a radius from a single point.

    Abstract translation: 提供了改变光的极性的方法。 光通过第一横向平面传播并且在第一横向平面的相应单元中具有已知的偏振状态。 具有与单元匹配的各个波片的第一延迟补偿器然后改变光的极性，使得通过第二横向平面传播的光在整个第二横向平面上被圆偏振。 第二延迟补偿器包括改变圆偏振光的偏振的多个四分之一波片，使得穿过第三横向平面的光线性偏振。 选择四分之一波片的晶体对准及其形状和结构，使得偏振方向垂直于单个点的半径。

    Wavefront engineering with off-focus mask features
    17.
    发明申请
    Wavefront engineering with off-focus mask features 审中-公开
    Wavefront工程与离焦掩模功能

    公开(公告)号：US20060216615A1

    公开(公告)日：2006-09-28

    申请号：US11093001

    申请日：2005-03-28

    Applicant: Michael Goldstein ,  John Urata

    Inventor： Michael Goldstein ,  John Urata

    IPC: G03C5/00 ,  G03B27/42 ,  G03F1/00

    CPC classification number: G03F1/36

    Abstract: An imaging part such as a mask or reticle includes a patterned layer in an on-axis plane of the imaging part. The imaging part further includes another layer including sub-resolution features, where the another layer is positioned in an off-axis plane of the imaging part.

    Abstract translation: 诸如掩模或掩模版的成像部件包括成像部件的轴上平面中的图案化层。 成像部分还包括另一层，包括子分辨率特征，其中另一层位于成像部分的离轴平面内。

    High reflector tunable stress coating, such as for a MEMS mirror
    18.
    发明申请
    High reflector tunable stress coating, such as for a MEMS mirror 失效

    公开(公告)号：US20060182404A1

    公开(公告)日：2006-08-17

    申请号：US11400301

    申请日：2006-04-07

    Applicant: Michael Goldstein

    Inventor： Michael Goldstein

    IPC: G02B6/10

    CPC classification number: B81C1/00666 ,  B81B2201/042 ,  B81C2201/0167 ,  G02B5/0833 ,  G02B26/0833 ,  Y10S438/954

    Abstract: An optical device having a high reflector tunable stress coating includes a micro-electromechanical system (MEMS) platform, a mirror disposed on the MEMS platform, and a multiple layer coating disposed on the mirror. The multiple layer coating includes a layer of silver (Ag), a layer of silicon dioxide (SiO2) deposited on the layer of Ag, a layer of intrinsic silicon (Si) deposited on the layer of SiO2, and a layer of silicon oxynitride (SiOxNy) deposited on the layer of Si. The concentration of nitrogen is increased and/or decreased to tune the stress (e.g., tensile, none, compressive).

    Sublimating process for cleaning and protecting lithography masks
    20.
    发明申请
    Sublimating process for cleaning and protecting lithography masks 失效
    清洗和保护光刻掩模的升华过程

    公开(公告)号：US20050058836A1

    公开(公告)日：2005-03-17

    申请号：US10665313

    申请日：2003-09-11

    Applicant: Michael Goldstein

    Inventor： Michael Goldstein

    IPC: B05B17/04 ,  B05D1/02 ,  B08B7/00 ,  B24C1/00 ,  B24C3/32 ,  B32B9/00 ,  G03F1/00 ,  G03F7/20

    CPC classification number: G03F1/82 ,  B08B7/0092 ,  B24C1/003 ,  B24C3/322 ,  G03F7/70866 ,  G03F7/70925 ,  Y10T428/31504

    Abstract: Spraying a surface of a reticle with carbon dioxide snow cleans the surface and removes particles. Further spraying the surface of the reticle with carbon dioxide snow at a temperature below a carbon dioxide sublimation temperature forms a solid carbon dioxide layer on the surface. The solid carbon dioxide layer prevents particles from contacting the surface of the reticle. The solid carbon dioxide layer may be removed, and the reticle may be used in a extreme ultraviolet lithography tool.

    Abstract translation: 用二氧化碳雪喷涂掩模版的表面清洁表面并除去颗粒。 在低于二氧化碳升华温度的温度下用二氧化碳雪进一步喷涂掩模版的表面，在表面上形成固体二氧化碳层。 固体二氧化碳层防止颗粒接触掩模版的表面。 可以去除固体二氧化碳层，并且掩模版可以用于极紫外光刻工具。

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