Abstract:
An integrated heat sink array is introduced in SOI power devices having multiple unit cells, which can be used to reduce the temperature rise in obtaining more uniform temperature peaks for all the unit cells across the device area, so that the hot spot which is prone to breakdown can be avoided, thus the safe operating area of the device can be improved. Also the array sacrifice less area of the device, therefore results in low Rdson.
Abstract:
Disclosed is a transistor (100, 200, 300) having a first region (120, 320) of a first conductivity type for injecting charge carriers into the transistor and a laterally extended second region (140, 340) of the first conductivity type having a portion (142, 342) including a contact terminal (145, 345) for draining said charge carriers from the transistor, wherein the first region is separated from the second region by an intermediate region (130, 330) of a second conductivity type defining a first p-n junction with the first region and a second p-n junction with the second region, wherein the laterally extended region separates the portion from the second p-n junction, and wherein the transistor further comprises a substrate (110) having a doped region (112) of the second conductivity type, said doped region being in contact with and extending along the laterally extended second region and a further contact terminal (115) connected to the doped region for draining minority charge carriers from the laterally extended second region. An amplifier circuit and IC including such transistors are also disclosed.
Abstract:
An integrated heat sink array is introduced in SOI power devices having multiple unit cells, which can be used to reduce the temperature rise in obtaining more uniform temperature peaks for all the unit cells across the device area, so that the hot spot which is prone to breakdown can be avoided, thus the safe operating area of the device can be improved. Also the array sacrifice less area of the device, therefore results in low Rdson.
Abstract:
A semiconductor magnetic field sensor includes a semiconductor well (PW) on top of a semiconductor layer (Pepi). An insulation layer (ISO2) is located between the semiconductor layer (Pepi) and the substrate (SUB). The semiconductor well (PW) contains a lateral NPN bipolar magnetotransistor having two base contact regions (5) and (10) contacting the semiconductor well (PW). The semiconductor well (PW) further comprises two heavily n-type doped regions acting as collector regions (20) and (25) for the lateral NPN bipolar magnetotransistor. The semiconductor well (PW) further comprises a heavily doped n-type region acting as an emitter region (15) for the lateral NPN bipolar magnetotransistor and placed in between the two collector regions (20) and (25). A first MOS structure, having a first gate terminal (G 1 ), is located between the first collector region (20) and the emitter region (15). A second MOS structure, having a second gate terminal (G 2 ), is located between the emitter region (15) and the second collector region (25). By having the emitter region (15) placed between the first and the second collector regions (20) and (25), and by having properly biased MOS structures between the emitter region (15) and the collector regions (20) and (25), a first and a second collector current flowing in the semiconductor well (PW) generated during operation of the semiconductor magnetic field sensor are deflected down in a perpendicular direction from a plane defined by a surface (S) of the semiconductor magnetic field sensor and parallel to a direction of the magnetic field (B x ). The increase of the effective vertical deflection (L eff ) of the collector currents enhances the response of the semiconductor magnetic field sensor to an applied magnetic field (B x ) for a given emitter input bias current thus sensing with better accuracy also small values of the applied magnetic field (B x ). Furthermore the use of MOS structures ensures clean interfaces between the emitter region (15), the collector regions (20) and (25) and the MOS structures, avoiding the formation of material imperfections, defects, or interface states that cause an imbalance in the first and the second collector currents even in absence of a magnetic field (B x ).
Abstract:
An ESD protection circuit comprises a series connection of at least two protection components between a signal line to be protected and a return line (e.g. ground), comprising a first protection component connected to the signal line and a second protection component connected to the ground line. They are connected with opposite polarity so that when one conducts in forward direction the other conducts in reverse breakdown mode. A bias voltage source connects to the junction between the two protection components through a bias impedance. The use of the bias voltage enables the signal distortions resulting from the ESD protection circuit to be reduced.
Abstract:
Embodiments of a semiconductor device, a circuit including a semiconductor device and a driver circuit, and a method for operating a semiconductor device are described. In one embodiment, a semiconductor device includes a substrate, a source region, a drain region, and a drain extension region formed in the substrate, and an insulation layer adjacent to the drain extension region. A gate layer and a field plate are formed one of within and on the insulation layer. The field plate is located adjacent to the drain extension region and is electrically insulated from the gate layer and the source region such that a voltage can be applied to the field plate independent from voltages applied to the gate layer and the source region. Other embodiments are also described.
Abstract:
A field-effect magnetic sensor facilitates highly-sensitive magnetic field detection. In accordance with one or more example embodiments, current flow respectively between first and second source/drain terminals and a third source/drain terminal is controlled using inversion layers in separate channel regions for each of the first and second terminals. In response to a magnetic field, a greater amount of current is passed between the third source/drain terminal and one of the first and second source/drain terminals, relative to an amount of current passed between the third source/drain terminal and the other one of the first and second source/drain terminals.