-
公开(公告)号:CA807060A
公开(公告)日:1969-02-25
申请号:CA807060D
Applicant: PHOTOCIRCUITS CORP
Inventor: SCHNEBLE FREDERICK W JR , MCCORMACK JOHN F , ZEBLISKY RUDLOPH J
-
公开(公告)号:CA903382A
公开(公告)日:1972-06-20
申请号:CA903382D
Applicant: PHOTOCIRCUITS CORP
-
公开(公告)号:CA807061A
公开(公告)日:1969-02-25
申请号:CA807061D
Applicant: PHOTOCIRCUITS CORP
Inventor: ZEBLISKY RUDOLPH J , MCCORMACK JOHN F , SCHNEBLE FREDERICK W JR
-
公开(公告)号:CA807059A
公开(公告)日:1969-02-25
申请号:CA807059D
Applicant: PHOTOCIRCUITS CORP
Inventor: MCCORMACK JOHN F , SCHNEBLE FREDERICK W JR , ZEBLISKY RUDOLPH J
-
公开(公告)号:GB1121282A
公开(公告)日:1968-07-24
申请号:GB2627465
申请日:1965-06-22
Applicant: PHOTOCIRCUITS CORP
Inventor: SCHNEBLE FREDERICK W , ZEBLISKY RUDOLPH J , MCCORMACK JOHN F , WILLIAMSON JOHN DUFF
Abstract: In the electroless deposition of e.g. Cu, Ni, Co, Cd, and Sn, a cyanide compound is added in an amount less than 500 milligrams/1. The substrate may be paper, glass, ceramic, synthetic resins or a metal, e.g. Ni, Co, Fe, steel, Pd, Pt, Au, Cu, brass, Mn, Cr, W, Ti, Sn, Ag or Mo. An oxidizing agent, e.g. borohydrides, amine boranes, hydrazines, hypophosphites, hydrosulphites, hydroxyl amines, and formaldehyde may be added. A sequestering agent e.g. ethylene diamine, diethylene triamine, triethylene tetramine, E.D.T.A., citric and tartaric acid, ammonia, Rochelle salts, nitrilo triacetic acid, gluconic acid and gluconates, and triethanolamine, and a surfactant e.g. organic phosphate esters or oxyethylated sodium salts may also be added. Noncatalytic surfaces may be sensitized with stannous chloride and a precious metal salt.
-
公开(公告)号:CA747804A
公开(公告)日:1966-12-06
申请号:CA747804D
Applicant: PHOTOCIRCUITS CORP
Inventor: SCHNEBLE FREDERICK W JR , ZEBLISKY RUDOLPH J , WILLIAMSON JOHN D , MCCORMACK JOHN F
-
公开(公告)号:CA797118A
公开(公告)日:1968-10-22
申请号:CA797118D
Applicant: PHOTOCIRCUITS CORP
Inventor: ZEBLISKY RUDOLPH J , SCHNEBLE FREDERICK W JR , MCCORMACK JOHN F
-
公开(公告)号:CA785447A
公开(公告)日:1968-05-14
申请号:CA785447D
Applicant: PHOTOCIRCUITS CORP
Inventor: WILLIAMSON JOHN D , MCCORMACK JOHN F , ZEBLISKY RUDOLPH J , SCHNEBLE FREDERICK W JR
-
公开(公告)号:GB1058915A
公开(公告)日:1967-02-15
申请号:GB2627365
申请日:1965-06-22
Applicant: PHOTOCIRCUITS CORP
Inventor: MCCORMACK JOHN F
Abstract: A group 1B metal, e.g. copper is electrolessly deposited from a solution pH 10 to 14 comprising (moles 1 litre) 0.002 to 0.6 water soluble metal salt, 0.002 to 2.5 alkali metal borohydride or amine borane, and a complexing agent in an amount between 0.7 and 10 times the moles of the water soluble salt. In an example a solution comprises copper sulphate 0.05 moles/1., E.D.T.A.0.12 moles 1 litre, sodium cyanide 0.008 moles/1., and sodium borohydride 80 mg/1. The substrate may be Ni, Co, Fe or steel, Pd, Pt, Cu or brass, Mn, Cr, Mo, W, Ti, Sn, Ag paper, glass, ceramic or plastics. A surfactant, e.g. organic phosphate esters or oxyethylated sodium salts may be present up to 5 g.11.
-
公开(公告)号:CA747803A
公开(公告)日:1966-12-06
申请号:CA747803D
Applicant: PHOTOCIRCUITS CORP
Inventor: MCCORMACK JOHN F , WILLIAMSON JOHN D , SCHNEBLE FREDERICK W JR , ZEBLISKY RUDOLPH J
-
-
-
-
-
-
-
-
-