公开(公告)号：JP2000040247A

公开(公告)日：2000-02-08

申请号：JP20382998

申请日：1998-07-17

Applicant: SONY CORP

Inventor： UEDA HIROYUKI ,  SAITO SHINJI ,  KAWAKITA SATOSHI ,  SAKAKIBARA HIROYUKI

IPC: G02B1/04 ,  B29C35/08 ,  B29C43/18 ,  B29D11/00 ,  C03B11/08 ,  C03B11/14 ,  G02B5/18 ,  G02B27/00 ,  G11B7/135

Abstract: PROBLEM TO BE SOLVED: To provide a lens which can be formed accurately in shape and which can be manufactured efficiently at a low cost, as well as its production method and an optical pickup. SOLUTION: The device is provided with a geometrical optical part 20 for converging the light made incident from an incident plane 20a, and a diffraction optical part 21 which is formed on the incident plane 20a and the exiting plane of the geometrical optical part 20 and which is for further converging the light from the geometrical optical part 20; the diffraction optical part 21 is constituted of a lens 14 which is formed by joining resin to the incident plane 20a and the exiting plane 20b of the geometrical optical part 20.

公开(公告)号：JP2007293955A

公开(公告)日：2007-11-08

申请号：JP2006118368

申请日：2006-04-21

Applicant: Sony Corp ,  ソニー株式会社

Inventor： YAMADA TAKATOSHI ,  KAWAKITA SATOSHI ,  SATO HITOSHI ,  SUGANO TAKASHI ,  AIBA MOTOO

IPC: G11B7/135 ,  G02B5/18

Abstract: PROBLEM TO BE SOLVED: To provide a diffraction element 20 capable of showing satisfactory characteristics. SOLUTION: A cover layer 20D of the diffraction element 20 is constituted of a cover lower layer 20Du made of a second UV cured resin 100B and joined to a diffraction pattern PTc for a CD and a cover upper layer 20Do made of a third UV cured resin 100C and joined to the cover lower layer 20Du. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供能够显示令人满意的特性的衍射元件20。 解决方案：衍射元件20的覆盖层20D由第二UV固化树脂100B制成的盖下层20Du构成，并连接到用于CD的衍射图案PTc和由第三层制成的盖上层20Do UV固化树脂100C，并与盖下层20Du接合。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007293954A

公开(公告)日：2007-11-08

申请号：JP2006118367

申请日：2006-04-21

Applicant: Sony Corp ,  ソニー株式会社

Inventor： AIBA MOTOO ,  YAMADA TAKATOSHI ,  KAWAKITA SATOSHI ,  SATO HITOSHI ,  SUGANO TAKASHI

IPC: G11B7/135 ,  G02B5/18

Abstract: PROBLEM TO BE SOLVED: To obtain a diffraction element which has excellent characteristics. SOLUTION: The diffraction element 20 is built by forming the surface of the cover layer 20D to cancel the wavefront aberrations generated at the first air boundary IFa. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：获得具有优异特性的衍射元件。 解决方案：通过形成覆盖层20D的表面来构建衍射元件20，以消除在第一空气边界IFa处产生的波前像差。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2001013691A

公开(公告)日：2001-01-19

申请号：JP18738799

申请日：1999-07-01

Applicant: SONY CORP

Inventor： YAMADA TAKATOSHI ,  KAWAKITA SATOSHI

IPC: H01L21/027 ,  G03F7/20 ,  G03H1/04

Abstract: PROBLEM TO BE SOLVED: To provide a method for patterning optical parts which is capable subjecting the optical parts to patterning with high accuracy even if a relatively inexpensive EB exposure device is used. SOLUTION: The drawing of a test pattern is carried out (ST1) and the shape of this test pattern is measured in this method for correcting a drawing shape distortion (ST2). The correction function to the drawing shape distortion arising in the test pattern is derived (ST4) in accordance with the result of the measurement and a drawing correction value is calculated in accordance with the correction function. The drawing data to which the drawing correction value is given are then formed (ST6). The required drawing shape accuracy can be obtained by the method even if the inexpensive EB exposure device is used.

公开(公告)号：JP2001009349A

公开(公告)日：2001-01-16

申请号：JP18396699

申请日：1999-06-29

Applicant: SONY CORP

Inventor： KAWAKITA SATOSHI

IPC: B05C5/00 ,  B05C13/02 ,  G02B3/00 ,  G03F7/16

Abstract: PROBLEM TO BE SOLVED: To provide an apparatus for film formation of a patterned resist film and capable of forming a thin film pattern with a size from milli-meter order to a sub-milli-meter order at a necessary and sufficient precision, to provide a method for formation of a thin film pattern, and to provide an optical component by employing the apparatus and the method. SOLUTION: By employing a resist film lithography apparatus 1 comprising a rotating and holding mechanism 11 capable of chucking and rotating an axial center of a holder 13 for holding disk-like glass 12 with about 1 μm concentricity around a rotation axis 19 with about 1 μm concentricity and a lithography mechanism 21 capable of moving a pen provided with a pen lead 22p of 0.1 mm diameter in the x-axis direction, the y-axis direction, and the z-axis direction within 1 μm precision, a patterned resist film is drawn with ±5 μm precision directly on the disk-like glass 12 and then an aluminum thin film is formed on the entire surface and after that the resist film is removed together with the thin film thereon to leave an aluminum thin film with a reverse pattern to that of the resist film.

公开(公告)号：JP2000035501A

公开(公告)日：2000-02-02

申请号：JP20382298

申请日：1998-07-17

Applicant: SONY CORP

Inventor： KAWAKITA SATOSHI

IPC: G02B1/11 ,  G02B1/113

Abstract: PROBLEM TO BE SOLVED: To provide an optical element formed with an antireflection film having high durability. SOLUTION: The antireflection film 3 of the optical element 1 formed with the antireflection film 3 of a single layer for preventing the reflection of light on the front surface of a substrate 2 consisting of glass is formed so as to attain nd=(2m+1)λ/4 (m is a natural number) when the film thickness of the antireflection film 3 is defined as (d), the refractive index of the antireflection film 3 as (n) and the wavelength of the incident light on the antireflection film 3 as λ. The optical element 1 having the high durability may be provided by setting the film thickness of the antireflection film 3 at nd=(2m+1)4/λ and placing the antireflection film 3 under conditions of a constant humidity and high temp.

公开(公告)号：JPH10162409A

公开(公告)日：1998-06-19

申请号：JP32046196

申请日：1996-11-29

Applicant: SONY CORP

Inventor： FUKAZAWA YOSHIO ,  KAWAKITA SATOSHI ,  KUBO MINORU ,  UEDA HIROYUKI

IPC: G11B7/135

Abstract: PROBLEM TO BE SOLVED: To make the recording and reproducing of an information signal satisfactory with respect to plural kinds of optical recording mediums whose thicknesses of transparent substrates are different by changing the numerical aperture of an objective lens as to the luminous flux of one wavelength and the luminous flux of other wavelength with a wavelength selective film. SOLUTION: The aperture for the luminous flux B1 of a first wavelength is the whole surface of a surface part and the luminous flux B1 is converged on the signal recording surface of a first optical disk 101a. The aperture for the luminous flux B2 of a second wavelength is an area where an antireflection film 2 is formed and where is in the surface part and the luminous flux B2 is converged on the signal recording surface of a second optical disk 101b. Since the numerical aperture is changed according to the difference of wavelengths by changing wavelengths of incident luminous fluxes in an objective lens 1, an optimum condition for recording and reproducing the information signal is realized with respect to the plural kinds of optical recording mediums whose thicknesses of transparent substrates are different.

公开(公告)号：JP2008159140A

公开(公告)日：2008-07-10

申请号：JP2006345863

申请日：2006-12-22

Applicant: Sony Corp ,  ソニー株式会社

Inventor： KAWAKITA SATOSHI ,  YAMADA TAKATOSHI ,  SATO HITOSHI ,  SUGANO TAKASHI ,  AIBA MOTOO

IPC: G11B7/135 ,  G02B5/18 ,  G11B7/22

Abstract: PROBLEM TO BE SOLVED: To prepare a diffraction element having a fine and accurate diffraction pattern. SOLUTION: When a diffraction pattern layer 20D wherein the diffraction pattern PTc in a step shape of a plurality of steps is formed is provided by pressurizing a metal mold to a photosetting resin 100A applied on one surface of a base member 20C and irradiating the photosetting resin with UV to cure the resin, each diffraction pattern layer 20D is formed into a plurality of layers for every step of a part of the diffraction patterns. Thereby, the depth of the shape of the metal mold is reduced to enhance accuracy thereof and the diffraction element 20 having satisfactory shape accuracy and high diffraction efficiency is obtained. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：制备具有精细且准确的衍射图案的衍射元件。 解决方案：当通过将金属模加压到施加在基底构件20C的一个表面上的光固化树脂100A上并且照射到多个台阶形状的步进形状的衍射图案PTc的衍射图案层20D 具有UV固化树脂的光固化树脂，每个衍射图案层20D对于衍射图案的一部分的每个步骤形成多层。 由此，金属模具的形状的深度减小以提高其精度，并且获得具有令人满意的形状精度和高的衍射效率的衍射元件20。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007293956A

公开(公告)日：2007-11-08

申请号：JP2006118370

申请日：2006-04-21

Applicant: Sony Corp ,  ソニー株式会社

Inventor： KAWAKITA SATOSHI ,  AIBA MOTOO ,  SUGANO TAKASHI ,  SATO HITOSHI ,  YAMADA TAKATOSHI

IPC: G11B7/135 ,  G11B7/22

CPC classification number: G11B7/1275 ,  G11B7/1353 ,  G11B7/13922 ,  G11B2007/0006

Abstract: PROBLEM TO BE SOLVED: To achieve an optical pickup and optical disk drive which can exhibit successful property to a plurality of kinds of optical disks. SOLUTION: An abberation generated by oblique incidence to an objective lens unit 9 is compensated by shifting and arranging a first diffraction pattern PTd from an optical axis by having positioned the first diffraction pattern PTd which makes an optical beam Ld of a first wavelength which carries out oblique incidence to the objective lens unit 9 to an optical axis of the object lens unit 9, so that the abberation of the optical beam Ld of the first wavelength which is diffracted by the first diffraction pattern PTd and condensed with an objective lens 21 becomes minimum. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：为了实现可以对多种光盘呈现成功性能的光学拾取器和光盘驱动器。 解决方案：通过将形成第一波长的光束Ld的第一衍射图案PTd定位，通过从光轴移动和布置第一衍射图案PTd来补偿通过倾斜入射到物镜单元9产生的像差 其对物镜单元9的光轴进行倾斜入射，从而使由第一衍射图案PTd衍射的第一波长的光束Ld与物镜会聚， 21变得最小。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007293952A

公开(公告)日：2007-11-08

申请号：JP2006118364

申请日：2006-04-21

Applicant: Sony Corp ,  ソニー株式会社

Inventor： KAWAKITA SATOSHI ,  AIBA MOTOO ,  SUGANO TAKASHI ,  SATO HITOSHI ,  YAMADA TAKATOSHI

IPC: G11B7/135

Abstract: PROBLEM TO BE SOLVED: To achieve an optical pickup and an optical disk drive which can present successful property to a plurality of kinds of optical disks. SOLUTION: A stray light reflected with the diffraction element 20 is diverted from the optical axis CL by providing a diffraction component 20 with a net angle θ to an optical axis CL and an adverse effect by the stray light are prevented, and an abberation in optical beams of first and second wavelengths generated by the inclined diffraction element 20 are compensated by shifting and arranging the first diffraction pattern PTc and the second diffraction pattern PTd from the optical axis CL. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：实现可以向多种光盘呈现成功性的光学拾取器和光盘驱动器。 解决方案：通过提供具有与光轴CL的净角度θ的衍射分量20并且防止杂散光的不利影响，由衍射元件20反射的杂散光从光轴CL转向，并且 通过从光轴CL移位和布置第一衍射图案PTc和第二衍射图案PTd来补偿由倾斜衍射元件20产生的第一和第二波长的光束的偏移。 版权所有（C）2008，JPO＆INPIT