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公开(公告)号:JP2003247893A
公开(公告)日:2003-09-05
申请号:JP2002048502
申请日:2002-02-25
Applicant: SUMITOMO ELECTRIC INDUSTRIES
Inventor: NUMAZAWA TOSHIYUKI
Abstract: PROBLEM TO BE SOLVED: To provide an optical measuring device which is small and is easily carried. SOLUTION: An optical measuring device 1 comprises a lamp 4 which generates excitation light, fluorescent substances 7A-7C which receive the excitation light guided by an optical fiber 6 and generate fluorescence according to the temperature of fluid, an optical detection part 8 which detects the fluorescence guided by the optical fiber 6, and an optical switch 10 which switches optical path between the optical fiber 6 and the fluorescent substances 7A-7C. The optical switch 10 comprises a base member 11 which holds the optical fiber 6 and a switch member 12 mounted on the base member 11. The tips of cantilever beams 31A-31C are fitted with movable mirrors 32A-32C which reflect the excitation light toward the fluorescent substances 7A-7C and reflect the fluorescence toward the optical fiber 6. COPYRIGHT: (C)2003,JPO
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公开(公告)号:JP2003121463A
公开(公告)日:2003-04-23
申请号:JP2001357763
申请日:2001-11-22
Applicant: SUMITOMO ELECTRIC INDUSTRIES
Inventor: NAKAMAE KAZUO , HIRATA YOSHIHIRO , HAGA TAKESHI , NUMAZAWA TOSHIYUKI , YODA JUN , OKADA KAZUNORI
Abstract: PROBLEM TO BE SOLVED: To provide a simply-structured contact probe and an inspection device capable of breaking an insulating film on an inspected circuit surface even by a low contact pressure for securing proper electric contact. SOLUTION: This contact probe is constructed of a tip part 11, which is provided with a contact end touching the inspected circuit in on end and formed into a cylinder as a whole, and a base part 12 arranged at an interval to the tip part opposedly to the other end on the opposite side to the contact end of the tip part. When the tip part 11 is pressed to the inspected circuit, an end face 14 in the tip part and an end part face 15 in the base part are brought into contact with each other, and the tip part 11 is shifted to be moved in the direction parallel to the surface of the inspected circuit because the contact faces are tilted to the pressing direction. In this way, the insulating film on the tested circuit surface can be scraped out. This inspection device is constructed by using this contact probe.
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公开(公告)号:JP2001048655A
公开(公告)日:2001-02-20
申请号:JP22727399
申请日:1999-08-11
Applicant: SUMITOMO ELECTRIC INDUSTRIES
Inventor: NAKAMAE KAZUO , NUMAZAWA TOSHIYUKI
IPC: H04R17/00 , B28B3/02 , B28B7/34 , B28B13/06 , C04B35/00 , C04B35/495 , C04B35/622 , H01L41/333 , H01L41/39 , H01L41/45 , H01L41/24 , H01L41/26
Abstract: PROBLEM TO BE SOLVED: To obtain a fine structure having a high aspect ratio by controlling the composition of a ceramic slurry, then filling the slurry into a resin mold having a fine pillar-shaped hole and removing the resin mold and firing after drying and solidifying. SOLUTION: The diameter of the pillar of the ceramic pillar-shaped structure is not more than 50 μm and the aspect ratio(height/diameter of the ceramic pillar) is not less than 4. The ratio of the volume of the ceramic powder in the composition of the ceramic slurry is preferably not less than 35 vol.%. It is made possible to fill the ceramic slurry up to the tip end of the hole of a resin mold having a deep hole by adding a plasticizer to the ceramic slurry. It is preferable to use, as a binder, a polyvinyl alcohol having a polymerization degree of 1,500 to 3,500 in the ceramic in a concentration of 5 to 20 vol.% in order to maintain the fine ceramic pillar-shaped structure.
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公开(公告)号:JPH07312332A
公开(公告)日:1995-11-28
申请号:JP10295894
申请日:1994-05-17
Applicant: SUMITOMO ELECTRIC INDUSTRIES
Inventor: NUMAZAWA TOSHIYUKI
IPC: G03F7/20 , B81B1/00 , B81C1/00 , H01L21/027
Abstract: PURPOSE:To provide a method of forming a minute structure, in which the minute structure having a high aspect ratio can be formed with high accuracy, easily and simply. CONSTITUTION:In the formation method of a minute structure 4, the minute structure 4 is formed on the basis of a process in which a resist layer 2 is formed on a substrate 1, of an exposure process in which the resist layer 2 is irradiated with synchrotron radiation beam (SR beam) so as to expose a desired pattern 2p in the resist layer 2, of a developing process which develops the resist pattern 2, in which the desired pattern 2p has been exposed, and which forms a resist pattern 3 and of the resist pattern. In the exposure process for the formation method, the resist layer 2 is exposed via a filter 50 whose absorption spectrum is substantially identical to that of the resist layer 2.
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公开(公告)号:JPH06181170A
公开(公告)日:1994-06-28
申请号:JP6667693
申请日:1993-03-25
Applicant: SUMITOMO ELECTRIC INDUSTRIES
Inventor: OGINO SEIJI , NUMAZAWA TOSHIYUKI
IPC: B81C1/00 , G03F1/22 , G03F7/039 , H01L21/027 , G03F1/16
Abstract: PURPOSE:To form a micromiature structure having high aspect ratio by employing a resist mainly composed of a copolymer of a unit shown by a specific formula and a unit shown by another specific formula in a resist layer thereby forming a resist pattern deep in vertical direction in a short exposing time. CONSTITUTION:When a resist layer is formed on the surface of a substrate or a solid body, a monomer shown by formula I (where, R1 represents an 1-4C alkyl group (hydrogen atom in alkyl group may be substituted by halogen atom)) and a monomer shown by formula II (where, X represents halogen atom or hydroxyl group and R2 represents hydrogen atom or methyl group) are previously polymerized to prepare a copolymer syrup thereof. The copolymer syrup is applied onto a substrate or the surface of a solid body. A copolymer syrup layer thus formed on the substrate or the surface of solid body is then polymerized completely through polymerization completing process.
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公开(公告)号:JP2002071717A
公开(公告)日:2002-03-12
申请号:JP2001175522
申请日:2001-06-11
Applicant: SUMITOMO ELECTRIC INDUSTRIES
Inventor: NUMAZAWA TOSHIYUKI , HIRATA YOSHIHIRO , HAGA TAKESHI , NAKAMAE KAZUO , YODA JUN , OKADA KAZUNORI
IPC: G01R31/26 , G01R1/073 , G02F1/13 , G02F1/1345 , H01L21/66
Abstract: PROBLEM TO BE SOLVED: To provide a probe head which keeps a contact load thereof little affected from variations in the height of an electrode to be inspected. SOLUTION: A probe head 10 comprises a flexible printed-wiring board 11 and a piston operated actuator 21. Bumps (protrusion parts) 12a and 12b are so arranged on the printed board 11 as to contact each of the plurality of electrodes 31a and 31b as objects 30 to be inspected. The actuator 21 comprises a plurality of pistons 22a and 22b and a cylinder body 23. The pistons 22a and 22b press the printed board 11 separately right on the bumps 12a and 12b.
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公开(公告)号:JP2000353835A
公开(公告)日:2000-12-19
申请号:JP16376099
申请日:1999-06-10
Applicant: SUMITOMO ELECTRIC INDUSTRIES
Inventor: NUMAZAWA TOSHIYUKI
IPC: H01L41/39 , B28B1/14 , H01B19/00 , H01L41/187 , H01L41/333 , H01L41/24
Abstract: PROBLEM TO BE SOLVED: To prevent a fine ceramic structural body from collapsing and warping and control a permittivity by controlling relative permittivity of a fine ceramic structural body by removing a resin mold by using plasma etching. SOLUTION: A resin mold 6 is removed by plasma etching and at the same time, a relative permittivity of a prepared ceramic structural body is controlled. A relative permittivity can be controlled freely by changing at least either etching time or plasma power of plasma etching conditions. A composite piezoelectric material is obtained by making a fine ceramic structural body obtained in this way and resin composite. Furthermore, even when a fine ceramic structural body is prepared by processing such as cutting, grinding or laser abrasion instead of use of the resin mold 6, relative permittivity of a fine ceramic structural body can be controlled at an arbitrary value by performing plasma etching after processing.
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公开(公告)号:JPH10339824A
公开(公告)日:1998-12-22
申请号:JP14937497
申请日:1997-06-06
Applicant: SUMITOMO ELECTRIC INDUSTRIES
Inventor: HIRATA YOSHIHIRO , MINE YASUO , YONEYAMA SHUNICHI , NUMAZAWA TOSHIYUKI
Abstract: PROBLEM TO BE SOLVED: To provide a highly accurate and small-sized platform for an optical module at a low production cost. SOLUTION: This platform for the optical module is provided with a silicon substrate 1, a V groove 1V formed on the silicon substrate by anisotropic etching so as to position and fix an optical fiber and a metallic stopper 5 formed on the silicon substrate by plating so as to position and fix another optical component to be optically connected with the optical fiber.
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公开(公告)号:JPH10116582A
公开(公告)日:1998-05-06
申请号:JP26847996
申请日:1996-10-09
Applicant: SUMITOMO ELECTRIC INDUSTRIES
Inventor: NUMAZAWA TOSHIYUKI , KAWARABAYASHI JUN , TAKADA EIJI , NAKAZAWA MASAHARU
Abstract: PROBLEM TO BE SOLVED: To provide a micro photomultiplier array having an improved resolution. SOLUTION: This micro photomultipliter array is formed out of a plurality of metallic plates 100 stacked on top of each other, and each of the metallic plates 100 is formed to have a plurality of small channel holes 11 of square cross section with the prescribed angle of slope along the same direction. In this case, the metallic plates 100 are stacked so that the slopes of the small channel holes 11 are alternated with each other, and the positions of the small channel holes 11 agree to each other at the prescribed dislocation between 0% and 50% relative to the length of one side of each hole 11.
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公开(公告)号:JPH08325096A
公开(公告)日:1996-12-10
申请号:JP13386195
申请日:1995-05-31
Applicant: SUMITOMO ELECTRIC INDUSTRIES
Inventor: NUMAZAWA TOSHIYUKI
IPC: C30B29/04 , C23C16/27 , C23C16/48 , H01L21/205
Abstract: PURPOSE: To provide a CVD device capable of suppressing an unwanted competing reaction and capable of growing a thin film having a desired composition from various materials. CONSTITUTION: This device is provided with a chamber 12 housing a substrate 14 and into which a chemical species necessary to chemical vapor deposition is introduced, a light source 20 to introduce a light emitted from a synchrotron into the chamber 12, a filter 19 for selecting a light of specified wavelength from a continuous spectral light emitted from the light source 20 and introducing the light into the chamber and a magnetism generating means 21 to impress a magnetic field in a specified direction on the chemical species in the chamber 12.
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