Abstract:
To provide a substrate material made of an aluminum/silicon carbide composite alloy which has a thermal conductivity of 100 W/mxK or higher and a thermal expansion coefficient of 20x10 / DEG C or lower and is lightweight and compositionally homogeneous. A substrate material made of an aluminum/silicon carbide composite ally which comprises Al-SiC alloy composition parts and non alloy composition part and dispersed therein from 10 to 70% by weight silicon carbide particles, and in which the fluctuations of silicon carbide concentration in the Al-SiC alloy composition parts therein are within 1% by weight. The substrate material is produced by sintering a compact of an aluminum/silicon carbide starting powder at a temperature not lower than 600 DEG C in a non-oxidizing atmosphere.
Abstract:
A method and resulting structure for constructing an IC package utilizing thin film technology. The package has a bottom conductive plate that has a layer of ceramic vapor deposited onto the plate in a predetermined pattern. Adjacent to the insulative layer of ceramic is a layer of conductive metal vapor deposited onto the ceramic. The layer of metal can be laid down onto the ceramic in a predetermined pattern to create a power plane, a plurality of signal lines, or a combination of power planes and signal lines. On top of the layer of conductive material is a lead frame separated by a layer of insulative polyimide material. The polyimide material has a plurality of holes filled with a conductive material, which electrically couple the layer of conductive material with the leads of the lead frame. The power and ground pads of the integrated circuit are connected to the layer of vapor deposited conductive material and conductive plate, which are also coupled to the corresponding leads of the lead frame, thereby connecting the IC to the leads of the lead frame. The signal pads of the IC are connected to the lead frame and/or signal lines formed within the layer of vapor deposited conductive material. The IC and attached circuit package can then be encapsulated in a plastic shell.
Abstract:
A plastic package type semiconductor device is composed of a rolled metal substrate (1) made of copper or copper alloy and an insulating film (2) formed on the surface of the substrate. The film may be a single-layer film made of silicon oxynitride or a composite film formed by laminating a silicon oxide layer and a silicon oxynitride layer (or a silicon nitride layer). A semiconductor element (8) is mounted on the film or on the exposed surface of the substrate. Other passive elements (3) are provided on the film. After connecting these elements with bonding wires, the entire device is sealed in a resin molding (13). This device is thus free of cracks due to difference in thermal expansion between the film and the substrate, or peeling due to moisture absorption.
Abstract:
TO PROVIDE A SUBSTRATE MATERIAL MADE OF AN ALUMINUM/SILICON CARBIDE COMPOSITE ALLOY WHICH HAS A THERMAL CONDUCTIVITY OF 100 W/MXK OR HIGHER AND A THERMAL EXPANSION COEFFICIENT OF 20X10-SIGMA/°C OR LOWER AND IS LIGHTWEIGHT AND COMPOSITIONALLY HOMOGENEOUS. A SUBSTRATE MATERIAL MADE OF AN ALUMINUM/SILICON CARBIDE COMPOSITE ALLY WHICH COMPRISES AL-SIC ALLOY COMPOSITION PARTS AND NON ALLOY COMPOSITIONPART AND DISPERSED THEREIN FROM 10 TO 70 BY WEIGHT SILICON CARBIDE PARTICLES, AND IN WHICH THE FLUCTUATIONS OF SILICON CARBIDE CONCENTRATION IN THE AL-SIC ALLOY COMPOSITION PARTS THEREIN ARE WITHIN 1BY WEIGHT. THE SUBSTRATE MATERIAL IS PRODUCED BY SINTERING A COMPACT OF AN ALUMINUM/SILICON CARBIDE STARTING POWDER AT A TEMPERATURE NOT LOWER THAN 600°C IN A NON-OXIDIZING ATMOSPHERE.
Abstract:
A plastic package type semiconductor device is composed of a rolled metal substrate (1) made of copper or copper alloy and an insulating film (2) formed on the surface of the substrate. The film may be a single-layer film made of silicon oxynitride or a composite film formed by laminating a silicon oxide layer and a silicon oxynitride layer (or a silicon nitride layer). A semiconductor element (8) is mounted on the film or on the exposed surface of the substrate. Other passive elements (3) are provided on the film. After connecting these elements with bonding wires, the entire device is sealed in a resin molding (13). This device is thus free of cracks due to difference in thermal expansion between the film and the substrate, or peeling due to moisture absorption.
Abstract:
A semiconductor device which can reduce noise, which can be used for a variety of different purposes in a flexible manner, and which is suitable for automatic assembly. It has a metal board carrying a semiconductor device chip on the central part thereof. An insulating layer, a ceramic laminated wiring board, an organic film, and a lead frame are laminated one on another on the metal board so as to surround the semiconductor device chip. The lead frame is connected to the semiconductor device chip through the ceramic laminated wiring board. The assembly thus formed is sealed with a synthetic resin.
Abstract:
To provide a substrate material made of an aluminum/silicon carbide composite alloy which has a thermal conductivity of 100 W/mxK or higher and a thermal expansion coefficient of 20x10 / DEG C or lower and is lightweight and compositionally homogeneous. A substrate material made of an aluminum/silicon carbide composite ally which comprises Al-SiC alloy composition parts and non alloy composition part and dispersed therein from 10 to 70% by weight silicon carbide particles, and in which the fluctuations of silicon carbide concentration in the Al-SiC alloy composition parts therein are within 1% by weight. The substrate material is produced by sintering a compact of an aluminum/silicon carbide starting powder at a temperature not lower than 600 DEG C in a non-oxidizing atmosphere.
Abstract:
A heat-resistant, creep-resistant aluminum alloy according to the present invention contains at least 10 mass % and not more than 30 mass % of silicon, at least 3 mass % and not more than 10 mass % of at least either iron or nickel in total, at least 1 mass % and not more than 6 mass % of at least one rare earth element in total and at least 1 mass % and not more than 3 mass % of zirconium with the rest substantially consisting of aluminum, while the mean crystal grain size of silicon is not more than 2 mu m, the mean grain size of compounds other than silicon is not more than 1 mu m, and the mean crystal grain size of an aluminum matrix is at least 0.2 mu m and not more than 2 mu m. Thus, an aluminum alloy excellent in heat resistance and creep resistance is obtained.