公开(公告)号：JPH052998A

公开(公告)日：1993-01-08

申请号：JP30962591

申请日：1991-11-26

Applicant: TOSHIBA CORP

Inventor： KANBARA EIJI ,  SUGAWARA SHIGERU ,  SHIMOKAWABE JIRO

IPC: H01J29/48 ,  H01J29/50

Abstract: PURPOSE:To fix 1st and 2nd electrodes strongly and to improve accuracy of large diameter electron lenz. CONSTITUTION:A 2nd electrode group forming main electric lenz which focuses an electron beam emitted through a 1st electrode group, on a phosphor screen, is constituted of as a 1st electrode 45 which has a compressed cylindrical part 49 formed in one body therewith on a cathode K side, with the fluorescent screen side being formed a large diameter cylindrical part 48 of the 1st electrode; and a 2nd electrode 46 having a large diameter cylindrical part 50 surrounding the large diameter cylindrical part 48 of the 1st electrode. A 1st supporting piece 53 is provided on the longer sides of the compressed cylindrical part, and a pair of supporting boards covering the maximum diameter of the compressed cylindrical part of the 1st electrode is attached on the large diameter cylindrical part of the 2nd electrode 46. A pair of 2nd supporting pieces 54 are provided on the paired supporting boards, and the paired 2nd supporting pieces 54 are placed with a distance in the direction perpendicular to the advancing direction of electron beam. Through the 2nd supporting pieces 54, the width of a part of an insulated supporting member 52 to fix the 2nd electrode 46 is made wider than that of the part to fix several electrodes of the 1st electrode group.

公开(公告)号：JPH0461588A

公开(公告)日：1992-02-27

申请号：JP17222590

申请日：1990-06-29

Applicant: TOSHIBA CORP

Inventor： SHIMOMA TAKETOSHI ,  SONE TOSHIHISA ,  URATA HIROSHI ,  NAKANE KAZUNORI ,  SATO KAZUNORI ,  KANBARA EIJI ,  SUGAWARA SHIGERU ,  SHIMOKAWABE JIRO

IPC: H01J29/54 ,  H04N9/20

Abstract: PURPOSE:To reduce mis-convergence deteriorating the performance of a color picture tube and to realize the color picture tube suitable for high precision by correcting an effect subjected to an electron beam locus with a force exerting among plural electron beams. CONSTITUTION:A 1st magnetic field correction means 30 is arranged to a position of an electron gun and a magnetic field H is generated as if N, S four pole lens magnets 32 were equivalently formed to four diagonal corners. Thus, electromagnetic coils 30 comprising a couple of loop coils 33, 34 are opposite to each other with a tube axis inbetween and the coil axis is arranged with a tilt by 45 deg. from an inline face. The magnetic field H by the coil 30 is formed reversely at a boundary near a center beam BG and when the electron beam quantity is much, the two electron beams BR, BB at both sides are deflected in a direction parted from the center beam BG to act like magnifying the interval of the three electronic beams in the deflection center face.

公开(公告)号：JPH044545A

公开(公告)日：1992-01-09

申请号：JP10366990

申请日：1990-04-19

Applicant: TOSHIBA CORP

Inventor： HIROTA KOJI ,  SONE TOSHIHISA ,  SUGAWARA SHIGERU ,  KOSHIGOE SHINPEI

IPC: H01J29/48 ,  H01J29/50

Abstract: PURPOSE:To form a small beam spot with no distortion as desired, by locating No.3 electrode through position alignment of at least two tooling holes, or through detaining of at least two tooling holes with at least two tooling bosses. CONSTITUTION:At least two tooling holes 34, 25 for position alignment of No.3 electrode 30 relative to No.1 electrode G5 are formed in each of the No.1 and No.3 electrodes G5, 30; otherwise, at least two tooling holes 35 for locating the No.3 electrode relative to the No.1 electrode G5 are formed in either of the No.1 and No.3 electrodes G5, 30 wile at least two tooling bosses 41 to detain with these tooling holes are formed int the other. The No.3 electrode 30 is located through position alignment of these at least two holes 34, 35, or detention of at least two holes 35 with at least two tooling bosses 41. Thereby a small beam spot can be formed equipped with no distortion as desired.

公开(公告)号：JPH03110739A

公开(公告)日：1991-05-10

申请号：JP24736689

申请日：1989-09-22

Applicant: TOSHIBA CORP

Inventor： SHIMOMA TAKETOSHI ,  KANBARA EIJI ,  SUGAWARA SHIGERU ,  SHIMOKAWABE JIRO

IPC: H01J29/48 ,  H01J29/56

Abstract: PURPOSE:To reduce deflection abberation so as to better picture image performance of a color picture tube by constituting a main lens portion of at least three electron lenses consisting of a first lens for intensifying focusing strength in the vertical direction as the amount of deflection of an electron beam is increased, and a second lens for dispersing the electron beam in the vertical direction. CONSTITUTION:The main lens portion of an electron gun 22 comprises at least three electron lenses having a first lens G3 to G5 for intensifying focusing strength in the vertical direction as the amount of deflection of an electron beam is increased and a second lens G5 to G7 for dispersing the electron beam in the vertical direction as the amount of deflection is increased, and a third lens G7, G8. An electron beam is thereby correctly focused on a phosphor screen 6 regardless of deflection of the electron beam, and also when the electron beam passes through a deflected magnetic field the radius of the electron beam in its vertical direction is decreased as the amount of deflection is increased. Thus deflection abberation is decreased and the shape of a beam spot in the periphery of the screen is bettered.

公开(公告)号：JPH0320937A

公开(公告)日：1991-01-29

申请号：JP25709189

申请日：1989-10-03

Applicant: TOSHIBA CORP

Inventor： SHIMOMA TAKETOSHI ,  KANBARA EIJI ,  SUGAWARA SHIGERU ,  SHIMOKAWABE JIRO

IPC: H01J29/48 ,  H01J29/50

Abstract: PURPOSE:To easily improve the distortion of a beam spot due to deflection aberration by providing the first and second electron lenses on three in-line electron guns arranged in parallel, and performing preset operations. CONSTITUTION:An electron gun 100 has a cathode K and grids G1-G9 respectively, the first lens VLI is formed by grids G5-G56-G6, and the second lens LEL is formed by grids G9 and G8. The first lens VLI strongly focuses the beam from the cathode K mainly in the vertical direction, and the beam crosses the beam axis only in the vertical direction between the first and second lenses to form the second crossover CO2. The potential of the grid G56 is increased for dynamic focusing, thereby the second crossover CO2 is moved to the second lens LEL side and transferred to the position CO2(D), and the over-focusing by a deflection yoke is corrected.

公开(公告)号：JPH02265151A

公开(公告)日：1990-10-29

申请号：JP8465289

申请日：1989-04-05

Applicant: TOSHIBA CORP

Inventor： SHIMOMA TAKETOSHI ,  KANBARA EIJI ,  SUGAWARA SHIGERU ,  SHIMOKAWABE JIRO

IPC: H01J29/48 ,  H01J29/50

Abstract: PURPOSE:To obtain high image resolution at the whole of the screen by correcting strain of beam spots due to a deflecting magnetic field by altering strength and weakness of a second electron lens in a first deflecting region where deflection degree is small and altering strength and weakness of a first electron lens in a second deflecting region where deflection degree is large. CONSTITUTION:A second parallel and plane lens L2 is weakened in a region where deflection degree of horizontal deflection angle is comparatively small and divergent angle of a beam entering into a large diameter lens L3 is extended and changed to under focusing direction as compared to that without deflection. A first parallel plane lens L1 is strengthened in a region where deflection degree of horizontal deflection angle is comparatively large and a second cross-over is formed between the first parallel plane lens L1 and the large diameter lens L3, rediverges, and enters in the large diameter lens L3 and therefore the beam is changed to under focusing direction largely as compared to that without deflection. Consequently, an electron beam is changed to over-focus direction and just-focused on a screen. By this method excellent beam spots at the whole screen are achieved.

公开(公告)号：JPH0246634A

公开(公告)日：1990-02-16

申请号：JP19608788

申请日：1988-08-08

Applicant: TOSHIBA CORP

Inventor： SHIMOMA TAKETOSHI ,  KANBARA EIJI ,  SUGAWARA SHIGERU ,  SHIMOKAWABE JIRO

IPC: H01J29/48 ,  H01J29/50

Abstract: PURPOSE:To make it possible to focus the electron beams on a screen surface on condition of an optimum focusing respectively and an optimum concentration by providing an asymmetric quadruple lens to make the both side electron beams emit stronger in the vertical direction than in the horizontal direction, and to make the both side electron beams act separating from the central electron beam. CONSTITUTION:At the former stage of the main electron lens ML1 of an electron gun 100, an asymmetric quadruple lens which makes three electron beams emit in the vertical direction stronger than in the horizontal direction respectively, and makes the three axes of the three electron beams operate the axes of the both side beams separating from the center axis. On the other hand, at the main electron lens ML1, a large diameter of asymmetric electron lens acting commonly to three electron beams is provided, which is designed to have the focusing force in the longitudinal direction weaker than that in the vertical direction. As a result, the three parallel electron beams can be focused on the screen on condition of an optimum focusing respectively and an optimum concentration.

公开(公告)号：JPH0246632A

公开(公告)日：1990-02-16

申请号：JP19608588

申请日：1988-08-08

Applicant: TOSHIBA CORP

Inventor： SHIMOMA TAKETOSHI ,  KANBARA EIJI ,  SUGAWARA SHIGERU ,  SHIMOKAWABE JIRO

IPC: H01J29/50

Abstract: PURPOSE:To make it possible to obtain an optimum focus condition of three electron beams at a time by providing a beam formation devices designed to make the individual electron beams emit in the vertical direction stronger than in the horizontal direction, and to make the central electron beam focused in the horizontal direction stronger than the both side electron beams. CONSTITUTION:Since a beam passage port 63 slender in the longitudinal direction is in the cylindrical electrode of the sixth grid G6, a high voltage electric field permeating from the seventh grid is distorted by the beam passage port 63, and a weak focusing force acts in the horizontal direction while a strong focusing force acts in the vertical direction. On the other hand, since a beam passage port 73 slender in the vertical direction is in the cylindrical electrode of the seventh grid G7, a low voltage electric field permeating from the sixth grid is distorted by the beam passage 73, and a strong expansion force acts in the horizontal direction while a weak expansion force acts in the vertical direction. And as the whole body of a large diameter electron lens LEL, a weak focusing force acts in the horizontal direction while a strong focusing force acts in the vertical direction. An optimum focusing condition can be obtained at a time consequently.

公开(公告)号：JPH01302640A

公开(公告)日：1989-12-06

申请号：JP13037788

申请日：1988-05-30

Applicant: TOSHIBA CORP

Inventor： SHIMOMA TAKETOSHI ,  KANBARA EIJI ,  SUGAWARA SHIGERU

IPC: H01J29/48 ,  H01J29/50

Abstract: PURPOSE:To improve resolution by providing an symmetric electron lens with different focal points and a large-diameter electron lens section with a common opening focusing and converging three electron beams and changing the focusing force of the asymmetric electron lens and the deflection quantity by an electrostatic deflecting section in response to the deflection quantity by an electromagnetic deflecting section. CONSTITUTION:A common large-diameter electron lens LEL is used for three in-line array electron beams. The beam spot on a screen 101 can be made very small because of the low magnifying power of the lerge-diameter lens and the effect of low aberration. An asymmetric lens AL is provided between the common large-diameter electron lens and an electrostatic deflecting section ED, this lens is changed synchronously with the period of the horizontal and vertical deflection by a deflecting yoke, thus the beam distortion by the magnetic field of the deflecting yoke can be corrected, spots with very little beam distortion can be obtained over the whole screen 101. The image quality can be sharply improved.

公开(公告)号：JPH01251544A

公开(公告)日：1989-10-06

申请号：JP7935888

申请日：1988-03-31

Applicant: TOSHIBA CORP

Inventor： KANBARA EIJI ,  KIYONO KAZUYUKI ,  SUGAWARA SHIGERU

IPC: H01J29/50

Abstract: PURPOSE:To suppress generation of a blooming phenomen in a high current region by forming a poor electron radiation part on the surface opposite to the first grid of a cathode, in the region corresponding to the central part of the beam pass hole digged on the first grid and in the neighborhood thereof. CONSTITUTION:A poor electron radiation part 30 is formed on the surface opposite to the first grid G1 of a cathode K1 composing an electron gun part and in the region corresponding to the central part of a beam pass hole 21 digged on the first grid G1 and in the neighborhood thereof. Consequently, not only in the low current region having small beam current value but also in the high current region having large beam current value, the size of an object point (an imaginary crossover diameter) VCOH1 can be suppressed small and an emission angle of the electron beam is suppressed small so that the influence of astigmation in the main electron lens part can be reduced. Thereby, generation of a blooming phenomen in the high current region can be suppressed and picture performance can be improved.