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公开(公告)号：DE69425815T2
公开(公告)日：2001-04-12
申请号：DE69425815
申请日：1994-04-21
Applicant: UNITED TECHNOLOGIES CORP
Inventor： BEERS RUSSELL A , MACHINCHICK MICHAEL F , NOETZEL ALLAN A
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公开(公告)号：SG67547A1
公开(公告)日：1999-09-21
申请号：SG1998003318
申请日：1998-08-27
Applicant: UNITED TECHNOLOGIES CORP
Inventor： BEERS RUSSELL A , ROYAL TYRUS E
Abstract: An apparatus for applying material by cathodic arc vapor deposition to a substrate is provided which includes a vessel, a disk-shaped cathode, a platter for supporting the substrate, apparatus for maintaining a vacuum in the vessel, and apparatus for selectively sustaining an arc of electrical energy between the cathode and an anode. The disk-shaped cathode has a first end surface, a second end surface, and an evaporative surface extending between the first and second end surfaces, and the cathode is mounted on a pedestal positioned inside the vessel. The platter has a slot for receiving the pedestal, thereby enabling the platter to be movable into and out of the vessel.
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公开(公告)号：MXPA00012781A
公开(公告)日：2003-04-25
申请号：MXPA00012781
申请日：2000-12-19
Applicant: UNITED TECHNOLOGIES CORP
Inventor： BEERS RUSSELL A
Abstract: Un catodo para utilizarse en un proceso de revestimiento de arco catodico es realizado por vaciado al vacio utilizando un proceso de en frio de1 haz de electron para fundir el material de fuente y entonces continuamente o semicontinuamente vaciar el catodo. El catodo es denso, libre de poros, y contiene el minimo de contaminantes.
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公开(公告)号：DE69425815D1
公开(公告)日：2000-10-12
申请号：DE69425815
申请日：1994-04-21
Applicant: UNITED TECHNOLOGIES CORP
Inventor： BEERS RUSSELL A , MACHINCHICK MICHAEL F , NOETZEL ALLAN A
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公开(公告)号：SG67548A1
公开(公告)日：1999-09-21
申请号：SG1998003324
申请日：1998-08-27
Applicant: UNITED TECHNOLOGIES CORP
Inventor： BEERS RUSSELL A , HENDRICKS ROBERT E , MARSZAL DEAN N , NOETZEL ALLAN A , WRIGHT ROBERT J
Abstract: According to the present invention, an apparatus (10) for applying material by cathodic arc vapor deposition to a substrate (12) is provided which includes a vessel (14), apparatus (16) for maintaining a vacuum in the vessel, an annular cathode (18) having a bore (46) and an evaporative surface (44) extending between first (40) and second (42) end surfaces, apparatus (24) for selectively sustaining an arc of electrical energy between the cathode and a anode, and apparatus for driving the arc around the evaporative surface. The apparatus for driving the arc is positioned within the cathode bore, and produces a magnetic field that runs substantially parallel to the evaporative surface. The annular cathode is disposed radially inside of, and aligned with, the substrates inside the vessel.
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Patent Agency Ranking
公开(公告)号：DE69103203T2
公开(公告)日：1995-05-04
申请号：DE69103203
申请日：1991-05-14
Applicant: UNITED TECHNOLOGIES CORP
Inventor： BEERS RUSSELL A , NOETZEL ALLAN A
Abstract: A shield (2) restricts the circulation of a metal bearing gas around the platform surface (8) of a turbine blade (1) so that the gas deposits a thinner coating on the platform surface (8) than on the airfoil surface (6), whereby the coating is thick enough to provide desired corrosion and oxidation resistant properties for the airfoil surface (6), but is thin enough to prevent the platform surface (8), where stress forces are greatest, from becoming too brittle. The shield (12) may be modified to cover only the high pressure side of the platform surface (8).
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公开(公告)号：DE69103203D1
公开(公告)日：1994-09-08
申请号：DE69103203
申请日：1991-05-14
Applicant: UNITED TECHNOLOGIES CORP
Inventor： BEERS RUSSELL A , NOETZEL ALLAN A
Abstract: A shield (2) restricts the circulation of a metal bearing gas around the platform surface (8) of a turbine blade (1) so that the gas deposits a thinner coating on the platform surface (8) than on the airfoil surface (6), whereby the coating is thick enough to provide desired corrosion and oxidation resistant properties for the airfoil surface (6), but is thin enough to prevent the platform surface (8), where stress forces are greatest, from becoming too brittle. The shield (12) may be modified to cover only the high pressure side of the platform surface (8).
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公开(公告)号：SG11201500286RA
公开(公告)日：2015-02-27
申请号：SG11201500286R
申请日：2013-07-31
Applicant: UNITED TECHNOLOGIES CORP
Inventor： NEAL JAMES W , LITTON DAVID A , BEERS RUSSELL A , ZIMMERMAN BENJAMIN JOSEPH , MALONEY MICHAEL J
Abstract: A coating system for coating a part (10), such as a turbine blade or vane, has a mask (14) positioned adjacent to a first portion (16) of the part (10) to be coated and a mechanism (30) for moving the mask (14) relative to the part (10). The mechanism (30) may be a gear mechanism or a magnetic mechanism.
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公开(公告)号：DE60041951D1
公开(公告)日：2009-05-20
申请号：DE60041951
申请日：2000-12-05
Applicant: UNITED TECHNOLOGIES CORP
Inventor： BEERS RUSSELL A
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公开(公告)号：DE69832016T2
公开(公告)日：2006-07-13
申请号：DE69832016
申请日：1998-08-28
Applicant: UNITED TECHNOLOGIES CORP HARTF
Inventor： BEERS RUSSELL A , MARSZAL DEAN N , NOETZEL ALLAN A , SILEO GERARD A , HENDRICKS ROBERT E , WRIGHT ROBERT J , ERVIN DAVID R
Abstract: A vapor deposition production system (10) for coating substrates (12) is provided which includes a plurality of vapor deposition coaters (14), a plurality of platters (16), a platter docking station (18), a shuttle track (20), and apparatus for transporting the platters between the coaters and the platter docking station. The shuttle track connects the platter docking station and the coaters. Platters selectively removed from the coaters are transported along the shuttle track to the platter docking station where processed substrates are unloaded from the platters and unprocessed substrates loaded on to the platters.
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