COATING DEVICE FOR GASEOUS PHASE DEPOSITION FORMING

    公开(公告)号:JPH11131221A

    公开(公告)日:1999-05-18

    申请号:JP24545998

    申请日:1998-08-31

    Abstract: PROBLEM TO BE SOLVED: To provide an efficient gaseous phase deposition forming device capable of continuously applying coating of high quality to many substrates and good in the efficiency of the cost. SOLUTION: A geseous phase deposition forming device for applying substrates with coating is provided, and this device contains plural gaseous phase deposition coaters 14, plural platers 16, a plater docking station 18 and a device for carrying the platers between the coaters and the plater docking station. A shuttle truck connects the plater docking station and coaters. The plater selectively discharged from the coater is carried to the plater docking station along the shuttle truck, where the treated substrate is taken down from the plater, and untreated substrate is placed on the plater.

    ARC CONTROLLER OF CATHODE ARC COATER

    公开(公告)号:JPH11140631A

    公开(公告)日:1999-05-25

    申请号:JP24546198

    申请日:1998-08-31

    Abstract: PROBLEM TO BE SOLVED: To provide a cathode arc vapor deposition device good in the cost effectiveness and capable of executing uniform coating with high quality on a substrate. SOLUTION: A device 10 for coating the surface of a substrate 12 with a material by a cathode arc vapor deposition method has a vessel 14, a device for keeping this vessel vacuum, a disk-shaped cathode 18, a means 22 for selectively maintaining the electric energy of an arc between the cathode 18 and an anode 24 and a means for moving the arc to the cathode. The electric energy of the arc stretching between the cathode 18 and the anode 24 evaporates the cathode part to be continuously deposited on a substrate arranged on the inside of the vessel.

    MANUFACTURING METHOD FOR CATHODE AND CATHODE FOR CATHODIC ARC DEPOSITION

    公开(公告)号:JP2001232447A

    公开(公告)日:2001-08-28

    申请号:JP2000386528

    申请日:2000-12-20

    Inventor: BEERS RUSSELL A

    Abstract: PROBLEM TO BE SOLVED: To provide a cathode suitable for depositing a metal coating layer of high quality on a superalloy base at a high speed using a cathode arc deposition method, and a manufacturing method thereof. SOLUTION: A cathode reform is manufactured by an electron beam cold hearth refining method (EBCHR). An initial alloy is melted in vacuum using an electron beam, and poured into a water-cooled copper-made hearth. A thin layer of a cathode alloy is solidified on the hearth and maintained in a contact state with the hearth and the pollution from the material of the hearth is prevented. The molten material is allowed to flow from the hearth having a skull into a cylindrical mold, and solidified, and then, drawn from the mold in a continuous or semi-continuous manner. The included gas is released by this continuously solidifying method, and a possibly shrinkable portion is filled with the molten metal. Then, a solidified ingot is cut into pieces of appropriate thickness, and a positioning mechanism to correctly position the cut piece is provided in a cathode arc deposition apparatus.

    CATHODE ARC VAPOR DEPOSITION DEVICE

    公开(公告)号:JPH11140630A

    公开(公告)日:1999-05-25

    申请号:JP24546098

    申请日:1998-08-31

    Abstract: PROBLEM TO BE SOLVED: To provide a cathode arc vapor deposition device good in the cost effectiveness and capable of executing uniform coating with high quality on a substrate. SOLUTION: A device 10 for coating the surface of a substrate 12 with a material by a cathode arc vapor deposition method has a vessel 14, a device 16 for keeping this vessel vacuum, an annular cathode 18 stretching between a primary edge face and a secondary edge face and having an evaporating face 44 provided with an opening part, a means 24 for selectively maintaining the electric energy of an arc between the cathode 18 and an anode 26 and a device for moving the arc to the cathode. The device 74 for moving the arc is arranged at the opening part of the cathode 18 and substantially generates the magnetic field stretching parallel to the evaporating face 44. The annular anode 26 is, on the inside in the radial direction of the substrate 12 arranged in the vessel, allowed to stand in a row with this.

    CATHODE ARC VAPOR DEPOSITION DEVICE

    公开(公告)号:JPH11140629A

    公开(公告)日:1999-05-25

    申请号:JP24545898

    申请日:1998-08-31

    Abstract: PROBLEM TO BE SOLVED: To provide a cathode vapor deposition device good in the cost effectiveness and capable of executing uniform coating with high quality on a substrate. SOLUTION: A device 10 for coating the surface of a substrate 12 with a material by a cathode arc vapor deposition method has a vessel 14, a device 16 for keeping this vessel vacuum, a cathode 18, a contactor 20, a means 24 for selectively maintaining the electric energy of an arc between the cathode 18 and an anode 26 and an actuator 22. The cathode 18 and the contactor 20 are arranged on the inside of the vessel, and the contactor 20 is electrically connected to the means 24 for selectively keeping the electric energy of the arc. The actuator 22 electrically connects the contactor 20 to the cathode 18 selectively and connects the cathode 18 to the means 24 for keeping the electric energy of the arc.

    CATHODIC ARC DEPOSITION COATINGS FOR TURBINE ENGINE COMPONENTS

    公开(公告)号:SG154408A1

    公开(公告)日:2009-08-28

    申请号:SG2009002700

    申请日:2009-01-15

    Abstract: A method for coating a metal component of a gas turbine engine, the method comprising forming a cathode ingot for a cathodic are deposition process, and performing a cathodic arc deposition process on the metal component with the cathode ingot to form a bond coat, where the formed cathode ingot comprises an MCrA1Y alloy base portion and a platinum-modified aluminide outer coating disposed over the base portion.

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