11.
    发明专利
    未知

    公开(公告)号:DE69835324T2

    公开(公告)日:2007-08-23

    申请号:DE69835324

    申请日:1998-08-28

    Abstract: According to the present invention, an apparatus (10) for applying material by cathodic arc vapor deposition to a substrate (12) is provided which includes a vessel (14), apparatus (16) for maintaining a vacuum in the vessel, an annular cathode (18) having a bore (46) and an evaporative surface (44) extending between first (40) and second (42) end surfaces, apparatus (24) for selectively sustaining an arc of electrical energy between the cathode and a anode, and apparatus for driving the arc around the evaporative surface. The apparatus for driving the arc is positioned within the cathode bore, and produces a magnetic field that runs substantially parallel to the evaporative surface. The annular cathode is disposed radially inside of, and aligned with, the substrates inside the vessel.

    12.
    发明专利
    未知

    公开(公告)号:DE69835324D1

    公开(公告)日:2006-09-07

    申请号:DE69835324

    申请日:1998-08-28

    Abstract: According to the present invention, an apparatus (10) for applying material by cathodic arc vapor deposition to a substrate (12) is provided which includes a vessel (14), apparatus (16) for maintaining a vacuum in the vessel, an annular cathode (18) having a bore (46) and an evaporative surface (44) extending between first (40) and second (42) end surfaces, apparatus (24) for selectively sustaining an arc of electrical energy between the cathode and a anode, and apparatus for driving the arc around the evaporative surface. The apparatus for driving the arc is positioned within the cathode bore, and produces a magnetic field that runs substantially parallel to the evaporative surface. The annular cathode is disposed radially inside of, and aligned with, the substrates inside the vessel.

    13.
    发明专利
    未知

    公开(公告)号:DE69832016T2

    公开(公告)日:2006-07-13

    申请号:DE69832016

    申请日:1998-08-28

    Abstract: A vapor deposition production system (10) for coating substrates (12) is provided which includes a plurality of vapor deposition coaters (14), a plurality of platters (16), a platter docking station (18), a shuttle track (20), and apparatus for transporting the platters between the coaters and the platter docking station. The shuttle track connects the platter docking station and the coaters. Platters selectively removed from the coaters are transported along the shuttle track to the platter docking station where processed substrates are unloaded from the platters and unprocessed substrates loaded on to the platters.

    14.
    发明专利
    未知

    公开(公告)号:DE69533933D1

    公开(公告)日:2005-02-17

    申请号:DE69533933

    申请日:1995-02-15

    Abstract: An oxidation resistant structure is taught comprising a Ti alloy substrate and a uniform coating of a Cu alloy deposited on the substrate, wherein the Cu alloy comprises Cu and from 0 to 10 wt% Al and from 0 to 6 wt% Si and the percentages of Al and Si are not simultaneously zero, the structure having substantially no intermetallic compound formation and substantially no diffusion of coating constituents in the substrate.

    Cathodic arc vapor deposition apparatus

    公开(公告)号:SG67546A1

    公开(公告)日:1999-09-21

    申请号:SG1998003308

    申请日:1998-08-27

    Abstract: An apparatus (10) for applying material by cathodic arc deposition to a substrate (12) is provided which includes a vessel (14), means (16) for maintaining a vacuum in the vessel, a cathode (18), a contactor (20), means (24) for selectively sustaining an arc of electrical energy between the cathode and an anode (26), and an actuator (22). The cathode and contactor are positioned inside the vessel, and the contactor is electrically connected to the means for selectively sustaining an arc of electrical energy. The actuator selectively actuates the contactor into electrical contact with the cathode, and thereby electrically connects the cathode to the means for sustaining an arc of electrical energy.

    Cathodic arc vapor deposition apparatus (annular cathode)

    公开(公告)号:SG67548A1

    公开(公告)日:1999-09-21

    申请号:SG1998003324

    申请日:1998-08-27

    Abstract: According to the present invention, an apparatus (10) for applying material by cathodic arc vapor deposition to a substrate (12) is provided which includes a vessel (14), apparatus (16) for maintaining a vacuum in the vessel, an annular cathode (18) having a bore (46) and an evaporative surface (44) extending between first (40) and second (42) end surfaces, apparatus (24) for selectively sustaining an arc of electrical energy between the cathode and a anode, and apparatus for driving the arc around the evaporative surface. The apparatus for driving the arc is positioned within the cathode bore, and produces a magnetic field that runs substantially parallel to the evaporative surface. The annular cathode is disposed radially inside of, and aligned with, the substrates inside the vessel.

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