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公开(公告)号：US11654659B2
公开(公告)日：2023-05-23
申请号：US17248933
申请日：2021-02-12
Applicant: View, Inc. , Corning Incorporated
Inventor： Ronald M. Parker , Anshu A. Pradhan , Abhishek Anant Dixit , Douglas Dauson
IPC: B32B17/10 , G02F1/153 , G02F1/155 , G02F1/1524 , B29C65/00
CPC classification number: B32B17/10807 , B32B17/1088 , B32B17/1099 , B32B17/10146 , B32B17/10302 , B32B17/10513 , G02F1/153 , G02F1/155 , G02F1/1533 , B29C66/006 , B29C66/0382 , B29C2793/0027 , G02F1/1524
Abstract: Methods are provided for fabricating electrochromic devices that mitigate formation of short circuits under a top bus bar without predetermining where top bus bars will be applied on the device. Devices fabricated using such methods may be deactivated under the top bus bar, or may include active material under the top bus bar. Methods of fabricating devices with active material under a top bus bar include depositing a modified top bus bar, fabricating self-healing layers in the electrochromic device, and modifying a top transparent conductive layer of the device prior to applying bus bars.
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公开(公告)号：US11623433B2
公开(公告)日：2023-04-11
申请号：US16310164
申请日：2017-06-14
Applicant: View, Inc. , Corning Incorporated
Inventor： Ronald M. Parker , Anshu A. Pradhan , Abhishek Anant Dixit , Douglas Dauson
IPC: B32B17/10 , G02F1/153 , G02F1/155 , G02F1/1524 , B29C65/00
Abstract: Methods are provided for fabricating electrochromic devices that mitigate formation of short circuits under a top bus bar without predetermining where top bus bars will be applied on the device. Devices fabricated using such methods may be deactivated under the top bus bar, or may include active material under the top bus bar. Methods of fabricating devices with active material under a top bus bar include depositing a modified top bus bar, fabricating self-healing layers in the electrochromic device, and modifying a top transparent conductive layer of the device prior to applying bus bars.
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公开(公告)号：US11559970B2
公开(公告)日：2023-01-24
申请号：US16947834
申请日：2020-08-19
Applicant: View, Inc.
Inventor： Fabian Strong , Yashraj Bhatnagar , Abhishek Anant Dixit , Todd Martin , Robert T. Rozbicki
Abstract: Thin-film devices, for example electrochromic devices for windows, and methods of manufacturing are described. Particular focus is given to methods of patterning optical devices. Various edge deletion and isolation scribes are performed, for example, to ensure the optical device has appropriate isolation from any edge defects. Methods described herein apply to any thin-film device having one or more material layers sandwiched between two thin film electrical conductor layers. The described methods create novel optical device configurations.
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公开(公告)号：US20220259096A1
公开(公告)日：2022-08-18
申请号：US17661526
申请日：2022-04-29
Applicant: View, Inc.
Inventor： Ronald M. Parker , Anshu A. Pradhan , Abhishek Anant Dixit , Douglas Dauson
Abstract: Methods for protecting transparent electronically conductive layers on glass substrates are described herein. Methods include depositing a sacrificial coating during deposition of the transparent electronically conductive layer, before packing the glass substrate for storage or shipping, after unpacking glass substrates from a stack of glass substrates, and/or after a washing operation prior to fabricating an electrochromic stack on the transparent electronically conductive layer. Methods also include removing the sacrificial coating during a washing operation, during tempering, or prior to depositing an electrochromic stack by, e.g., heating the sacrificial coating or exposing the sacrificial coating to an inert plasma.
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公开(公告)号：US20220179273A1
公开(公告)日：2022-06-09
申请号：US17678979
申请日：2022-02-23
Applicant: View, Inc.
Inventor： John Gordon Halbert Mathew , Robert T. Rozbicki , Luis Vidal Ponce Cabrera , Anshu A. Pradhan , Abhishek Anant Dixit , Eithan Ritz
Abstract: Various embodiments herein relate to electrochromic windows that are bird friendly, as well as methods and apparatus for forming such windows. Bird friendly windows include one or more elements that make the window visible to birds so that the birds recognize that they cannot fly through the window. An electrochromic window includes one or more transparent substrates, wherein at least one of the substrates is an electrochromic (EC) lite including an electrochromic device and a pattern formed on at least one of the substrates by a laser, the pattern including a first feature configured to provide a set of optical properties different than optical properties of the transparent substrate. The set of optical properties includes one or more characteristics of refractivity, reflectivity and diffraction.
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Patent Agency Ranking
公开(公告)号：US20210394489A1
公开(公告)日：2021-12-23
申请号：US17446566
申请日：2021-08-31
Applicant: View, Inc.
Inventor： Fabian Strong , Yashraj Bhatnagar , Abhishek Anant Dixit , Todd Martin , Robert T. Rozbicki
Abstract: Thin-film devices, for example electrochromic devices for windows, and methods of manufacturing are described. Particular focus is given to methods of patterning optical devices. Various edge deletion and isolation scribes are performed, for example, to ensure the optical device has appropriate isolation from any edge defects. Methods described herein apply to any thin-film device having one or more material layers sandwiched between two thin film electrical conductor layers. The described methods create novel optical device configurations.
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公开(公告)号：US11086182B2
公开(公告)日：2021-08-10
申请号：US16195693
申请日：2018-11-19
Applicant: View, Inc.
Inventor： Abhishek Anant Dixit , Todd William Martin , Anshu A. Pradhan
IPC: G02F1/1524 , G02F1/1333 , B32B17/10 , G02F1/153 , B32B37/14 , B32B38/10 , B32B38/00 , G02F1/155
Abstract: Certain aspects pertain to methods of fabricating an optical device on a substantially transparent substrate that include a pre-deposition operation that removes a width of lower conductor layer at a distance from the outer edge of the substrate to form a pad at the outer edge. The pad and any deposited layers of the optical device may be removed in a post edge deletion operation.
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公开(公告)号：US20210001426A1
公开(公告)日：2021-01-07
申请号：US16947841
申请日：2020-08-19
Applicant: View, Inc.
Inventor： Abhishek Anant Dixit , Todd William Martin , Anshu A. Pradhan , Fabian Strong , Robert T. Rozbicki
IPC: B23K26/0622 , G02F1/155 , H01L27/144 , G02F1/153 , B23K26/082 , B23K26/402 , B23K26/57 , B23K26/08 , B23K26/38 , E06B9/24 , B23K26/361 , G02F1/1524 , B32B17/06 , C03B33/07 , H01B5/14
Abstract: Thin-film devices, for example electrochromic devices for windows, and methods of manufacturing are described. Particular focus is given to methods of patterning optical devices. Various edge deletion and isolation scribes are performed, for example, to ensure the optical device has appropriate isolation from any edge defects. Methods described herein apply to any thin-film device having one or more material layers sandwiched between two thin film electrical conductor layers. The described methods create novel optical device configurations.
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19.发明申请公开(公告)号：US20200218124A1
公开(公告)日：2020-07-09
申请号：US16826086
申请日：2020-03-20
Applicant: View, Inc.
Inventor： Todd Martin , Abhishek Anant Dixit , Fabian Strong , Anshu A. Pradhan
IPC: G02F1/153 , G02F1/155 , G02F1/1523
Abstract: Certain embodiments relate to optical devices and methods of fabricating optical devices that pre-treat a sub-layer to enable selective removal of the pre-treated sub-layer and overlying layers. Other embodiments pertain to methods of fabricating an optical device that apply a sacrificial material layer.
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公开(公告)号：US20190146295A1
公开(公告)日：2019-05-16
申请号：US16310164
申请日：2017-06-14
Applicant: View, Inc. , Corning Incorporated
Inventor： Ronald M. Parker , Anshu A. Pradhan , Abhishek Anant Dixit , Douglas Dauson
IPC: G02F1/155 , G02F1/153 , G02F1/161 , G02F1/1523
Abstract: Methods are provided for fabricating electrochromic devices that mitigate formation of short circuits under a top bus bar without predetermining where top bus bars will be applied on the device. Devices fabricated using such methods may be deactivated under the top bus bar, or may include active material under the top bus bar. Methods of fabricating devices with active material under a top bus bar include depositing a modified top bus bar, fabricating self-healing layers in the electrochromic device, and modifying a top transparent conductive layer of the device prior to applying bus bars.
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