Abstract:
An electron emission device includes a substrate, first electrodes formed on the substrate, electron emission regions electrically connected to the first electrodes, and second electrodes placed over the first electrodes such that the second electrodes are insulated from the first electrodes. The second electrodes have openings to expose the electron emission regions. A third electrode is placed over the second electrodes such that the third electrode is insulated from the second electrodes. The third electrode has openings communicating with the openings of the second electrodes. Each of the electron emission regions and the second electrodes simultaneously satisfy the following conditions: D2/D1≦0.579, (1) and D2≧1 μ (2) where D1 indicates the width of each of the openings of the second electrode, and D2 indicates the width of each of the electron emission regions.
Abstract:
The present invention provides a novel method for the manufacture of an enhanced cold cathode electron emission source allowing a measure of area to be processed at one time. The method includes the steps of: dissolving first and second polymers in solvent to obtain a polymer solution, and applying the polymer solution onto a second conductive layer before forming a hole; precipitating and immobilizing the first polymer in a particulate in the second polymer by evaporating the solvent; removing the first polymer particulate with a developer to form an etching hole in the second polymer; and performing etching process via the etching hole so as to form the hole in the second conductive layer. In one embodiment, the second polymer has greater solubility than the first polymer in the solvent, and the first polymer has greater solubility than the second polymer in the developer.
Abstract:
An electron emission device includes a substrate, first electrodes formed on the substrate, electron emission regions electrically connected to the first electrodes, and second electrodes placed over the first electrodes such that the second electrodes are insulated from the first electrodes. The second electrodes have openings to expose the electron emission regions. A third electrode is placed over the second electrodes such that the third electrode is insulated from the second electrodes. The third electrode has openings communicating with the openings of the second electrodes. Each of the electron emission regions and the second electrodes simultaneously satisfy the following conditions: D2/D1≦0.579 (1), and D2≧1 μ (2) where D1 indicates the width of each of the openings of the second electrode, and D2 indicates the width of each of the electron emission regions.
Abstract:
The present disclosure is directed to an electron source and an X-ray source using the same. The electron source of the present invention comprises: at least two electron emission zones, each of which comprises a plurality of micro electron emission units, wherein the micro electron emission unit comprises: a base layer, an insulating layer on the base layer, a grid layer on the insulating layer, an opening in the grid layer, and an electron emitter that is fixed at the base layer and corresponds to a position of the opening, wherein the micro electron emission units in the same electron emission zone are electrically connected and simultaneously emit electrons or do not emit electrons at the same time, and wherein different electron emission zones are electrically partitioned.
Abstract:
The present disclosure is directed to an electron source and an X-ray source using the same. The electron source of the present invention comprises: at least two electron emission zones, each of which comprises a plurality of micro electron emission units, wherein the micro electron emission unit comprises: a base layer, an insulating layer on the base layer, a grid layer on the insulating layer, an opening in the grid layer, and an electron emitter that is fixed at the base layer and corresponds to a position of the opening, wherein the micro electron emission units in the same electron emission zone are electrically connected and simultaneously emit electrons or do not emit electrons at the same time, and wherein different electron emission zones are electrically partitioned.
Abstract:
The present disclosure is directed to an electron source and an X-ray source using the same. The electron source of the present invention comprises: at least two electron emission zones, each of which comprises a plurality of micro electron emission units, wherein the micro electron emission unit comprises: a base layer, an insulating layer on the base layer, a grid layer on the insulating layer, an opening in the grid layer, and an electron emitter that is fixed at the base layer and corresponds to a position of the opening, wherein the micro electron emission units in the same electron emission zone are electrically connected and simultaneously emit electrons or do not emit electrons at the same time, and wherein different electron emission zones are electrically partitioned.
Abstract:
The present disclosure is directed to an electron source and an X-ray source using the same. The electron source of the present invention comprises: at least two electron emission zones, each of which comprises a plurality of micro electron emission units, wherein the micro electron emission unit comprises: a base layer, an insulating layer on the base layer, a grid layer on the insulating layer, an opening in the grid layer, and an electron emitter that is fixed at the base layer and corresponds to a position of the opening, wherein the micro electron emission units in the same electron emission zone are electrically connected and simultaneously emit electrons or do not emit electrons at the same time, and wherein different electron emission zones are electrically partitioned.
Abstract:
An electron emission device includes a substrate, first electrodes formed on the substrate, electron emission regions electrically connected to the first electrodes, and second electrodes placed over the first electrodes such that the second electrodes are insulated from the first electrodes. The second electrodes have openings to expose the electron emission regions. A third electrode is placed over the second electrodes such that the third electrode is insulated from the second electrodes. The third electrode has openings communicating with the openings of the second electrodes. Each of the electron emission regions and the second electrodes simultaneously satisfy the following conditions: D 2 / D 1 ≤ 0.579 and D 2 ≥ 1 μm where D1 indicates the width of each of the openings of the second electrode, and D2 indicates the width of each of the electron emission regions.
Abstract:
The invention relates to a control grid (1 12) for an electron beam generating device, said control grid comprising apertures (122) arranged in rows (R) in a width direction and columns (C) in a height direction, wherein a majority of the apertures (122) in a row have the same size, and wherein the size of the apertures of at least one row differs from the size of the apertures of another row.