Control grid design for an electron beam generating device
    8.
    发明授权
    Control grid design for an electron beam generating device 有权
    控制电子束发生装置的电网设计

    公开(公告)号:US08791424B2

    公开(公告)日:2014-07-29

    申请号:US13814612

    申请日:2011-08-24

    CPC classification number: H01J1/46 G21K5/02 H01J3/027 H01J33/02 H01J2203/022

    Abstract: The invention relates to a control grid for an electron beam generating device, wherein the control grid comprises apertures arranged in rows in a width direction and columns in a height direction, wherein a majority of the apertures in a row have the same size, and wherein the size of the apertures of at least one row differs from the size of the apertures of another row.

    Abstract translation: 本发明涉及一种用于电子束产生装置的控制栅格,其中控制栅格包括在宽度方向上排列成排的孔和高度方向的列,其中一排中的大部分孔具有相同的尺寸,并且其中 至少一排的孔的尺寸与另一排的孔的尺寸不同。

    CONTROL GRID DESIGN FOR AN ELECTRON BEAM GENERATING DEVICE
    9.
    发明申请
    CONTROL GRID DESIGN FOR AN ELECTRON BEAM GENERATING DEVICE 有权
    电子束生成装置的控制网格设计

    公开(公告)号:US20130140474A1

    公开(公告)日:2013-06-06

    申请号:US13814612

    申请日:2011-08-24

    CPC classification number: H01J1/46 G21K5/02 H01J3/027 H01J33/02 H01J2203/022

    Abstract: The invention relates to a control grid for an electron beam generating device, wherein the control grid comprises apertures arranged in rows in a width direction and columns in a height direction, wherein a majority of the apertures in a row have the same size, and wherein the size of the apertures of at least one row differs from the size of the apertures of another row.

    Abstract translation: 本发明涉及一种用于电子束产生装置的控制栅格,其中控制栅格包括在宽度方向上排列成排的孔和高度方向的列,其中一排中的大部分孔具有相同的尺寸,并且其中 至少一排的孔的尺寸与另一排的孔的尺寸不同。

    BACKLIGHT UNIT
    10.
    发明申请
    BACKLIGHT UNIT 审中-公开
    背光单元

    公开(公告)号:US20090189508A1

    公开(公告)日:2009-07-30

    申请号:US12341803

    申请日:2008-12-22

    Abstract: A backlight unit includes a base substrate and a first electrode which is formed on the base substrate in a line. An electron emission layer is formed on the first electrode in the substantially same pattern as the first electrode. A second electrode supporter is formed on the base substrate and disposed on sides of the first electrode and the electron emission layer. A second electrode is formed on the second electrode supporter and has an aperture pattern. A third electrode is formed on the front substrate for accelerating electrons emitted from the electron emission layer. A phosphor layer is formed on the third electrode responsive to electrons accelerated by the third electrode.

    Abstract translation: 背光单元包括基底基板和在基底基板上一行形成的第一电极。 以与第一电极基本相同的图案形成在第一电极上的电子发射层。 第二电极支撑件形成在基底基板上并且设置在第一电极和电子发射层的侧面上。 第二电极形成在第二电极支撑件上并具有孔径图案。 第三电极形成在前基板上,用于加速从电子发射层发射的电子。 响应于被第三电极加速的电子,在第三电极上形成荧光体层。

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