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    METHODS OF COATING SUBSTRATES WITH ELECTRICALLY CHARGED CONDUCTIVE MATERIALS, ELECTRICALLY CONDUCTIVE COATED SUBSTRATES, AND ASSOCIATED APPARATUSES
    201.
    发明申请
    METHODS OF COATING SUBSTRATES WITH ELECTRICALLY CHARGED CONDUCTIVE MATERIALS, ELECTRICALLY CONDUCTIVE COATED SUBSTRATES, AND ASSOCIATED APPARATUSES 有权
    用电导电导电材料，电导电涂层基板和相关装置涂覆基板的方法

    公开(公告)号：US20140106143A1

    公开(公告)日：2014-04-17

    申请号：US14108126

    申请日：2013-12-16

    Applicant: The Boeing Company

    Inventor： Shahnaz SHOKRI ,  Quynhgiao N. Le ,  Christopher Broadbent ,  Alexandria Elena Corona ,  Terrell Diane Riley

    IPC: H01B1/04

    CPC classification number: H01B1/04 ,  B05D1/04 ,  B05D1/045 ,  B05D2201/02 ,  B05D2203/35 ,  B05D2601/20 ,  C23C30/00 ,  F01D5/288 ,  F05D2230/31 ,  F41H3/00 ,  Y02T50/671 ,  Y02T50/673 ,  Y10T428/24893 ,  Y10T428/249921

    Abstract: Methods include applying an electric charge to a coating material that includes carbon nanotubes and a carrier, such as paint, and depositing the electrically charged coating material to a substrate. In some methods, the applying includes utilizing an electrostatic sprayer. In some methods, the substrate is isolated from ground during the depositing. In some methods, the substrate is an insulator. Some methods result in regions of carbon nanotubes that are substantially longitudinally aligned after the depositing. Coated substrates may include a coating with carbon nanotubes that are substantially longitudinally aligned and in some examples that are arranged in a zig-zag pattern. Aircraft, spacecraft, land vehicles, marine vehicles, wind turbines, and apparatuses that may be susceptible to lightning strikes or other types of electromagnetic effects and that include a coated substrate also are disclosed.

    Abstract translation: 方法包括将电荷施加到包括碳纳米管的涂层材料和诸如涂料的载体上，并将带电涂层材料沉积到基底上。 在一些方法中，应用包括利用静电喷雾器。 在一些方法中，在沉积期间将衬底与地离开。 在一些方法中，衬底是绝缘体。 一些方法导致在沉积之后基本纵向排列的碳纳米管区域。 涂覆的基底可以包括具有基本纵向对准的碳纳米管的涂层，并且在一些示例中以Z字形图案排列。 还公开了可能易受雷击或其他类型的电磁效应的飞机，航天器，陆地车辆，船用车辆，风力涡轮机以及包括涂覆基板的设备。

    METHOD FOR PRODUCING ANTIGLARE FILM
    207.
    发明申请
    METHOD FOR PRODUCING ANTIGLARE FILM 有权
    生产胶片的方法

    公开(公告)号：US20110177240A1

    公开(公告)日：2011-07-21

    申请号：US13121386

    申请日：2009-09-29

    Applicant: Yuuki Saiki ,  Kazuhiro Shiojiri ,  Kazuhiro Oki

    Inventor： Yuuki Saiki ,  Kazuhiro Shiojiri ,  Kazuhiro Oki

    IPC: B05D5/06

    CPC classification number: G02B1/111 ,  B05D1/265 ,  B05D7/5385 ,  B05D2201/02 ,  B05D2252/02

    Abstract: A method for producing an antiglare film includes: a step of preparing coating liquids comprising components capable of being unevenly distributed in an antiglare layer-forming coating liquid and a low-refractive index layer-forming coating liquid, respectively; a coating step of applying the low-refractive index layer-forming coating liquid as an upper layer and the antiglare layer-forming coating liquid as a lower layer on a support to form a coating layer; and a drying step of drying the coating layer and making the coating layer cause phase-separation so as to unevenly distribute the components and form an antiglare layer and a low-refractive index layer. By the production method, an antiglare film which suppresses reflection and glaring of external light in a display and whitening due to irregular reflection can be produced at a low cost.

    Abstract translation: 制造防眩膜的方法包括：分别制备包含能够分散在防眩层形成用涂布液和低折射率层形成用涂布液中的成分的涂布液的工序; 将作为上层的低折射率层形成用涂布液和防眩层形成用涂布液作为下层涂布在载体上以形成涂层的涂布步骤; 以及干燥步骤，使涂层干燥并使涂层引起相分离，从而不均匀地分配组分并形成防眩光层和低折射率层。 通过该制造方法，可以低成本地制造抑制显示器中的外部光的反射和眩光的抗眩光膜，并且由于不规则的反射而发白。

    MACHINE FOR THE PLASMA TREATMENT OF CONTAINERS, COMPRISING OFFSET DEPRESSURIZATION/PRESSURIZATION CIRCUITS
    209.
    发明申请
    MACHINE FOR THE PLASMA TREATMENT OF CONTAINERS, COMPRISING OFFSET DEPRESSURIZATION/PRESSURIZATION CIRCUITS 有权
    用于等离子体处理容器的机器，包括偏置减压/加压电路

    公开(公告)号：US20100206232A1

    公开(公告)日：2010-08-19

    申请号：US12446055

    申请日：2007-10-17

    Applicant: Yves-Alban Duclos ,  Laurent Danel ,  Naima Boutroix

    Inventor： Yves-Alban Duclos ,  Laurent Danel ,  Naima Boutroix

    IPC: C23C16/00

    CPC classification number: B05D7/227 ,  B05D1/62 ,  B05D2201/02 ,  C23C16/045 ,  C23C16/4412 ,  C23C16/50

    Abstract: Machine (1) for the plasma treatment of containers (3), which comprises: a chamber (5) suitable for receiving a container (3) to be treated, a cover (8) defining a nozzle (9) in the extension of the chamber (5); a duct (14) for depressurization the container (3), which duct opens into the nozzle (9) and connects the latter to a vacuum source (15); a first valve (19) having a closed position, in which it closes off the depressurization duct (14), and an open position, in which it brings the nozzle (9) and the vacuum source (15) into communication; a duct (27) for pressurizing the container (3), separate from the depressurization duct (14), this pressurization duct (27) emerging in the nozzle (9) beyond the depressurization duct (14) and connecting the nozzle (9) to a pressure source (28); and a second valve (29) having a closed position, in which it closes off the pressurization duct (27), and an open position, in which it brings the nozzle (9) and the pressure source (28) into communication.

    Abstract translation: 用于容器（3）的等离子体处理的机器（1），其包括：适于接收待处理的容器（3）的室（5），在所述容器（3）的延伸部中限定喷嘴（9）的盖（8） 室（5）; 用于使容器（3）减压的管道（14），该管道通向喷嘴（9）并将其连接到真空源（15）; 具有闭合位置的第一阀（19），其封闭所述减压管道（14）;以及打开位置，使所述喷嘴（9）和所述真空源（15）连通; 用于对与所述减压管道14分离的所述容器（3）进行加压的管道（27），所述喷嘴（9）中出现的所述加压管道（27）超过所述减压管道（14）并将所述喷嘴（9）连接到 压力源（28）; 以及具有关闭位置的第二阀（29），其封闭所述加压管道（27），并且打开位置使所述喷嘴（9）和所述压力源（28）连通。

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