MULTIFUNCTION WAFER AND FILM FRAME HANDLING SYSTEM
    201.
    发明公开
    MULTIFUNCTION WAFER AND FILM FRAME HANDLING SYSTEM 审中-公开
    多功能系统用于处理晶片和膜架

    公开(公告)号:EP2891173A4

    公开(公告)日:2016-03-30

    申请号:EP13832999

    申请日:2013-09-02

    Abstract: A wafer table structure providing a single wafer table surface suitable for handling both wafers and film frames includes a base tray having a set of compartments formed therein by way of a set of ridges formed in or on an interior base tray surface; a hardenable fluid permeable compartment material disposed within the set of base tray compartments; and a set of openings formed in the base tray interior surface by which the hardened compartment material is exposable to negative or positive pressures. The base tray includes a first ceramic material (e.g., porcelain), and the hardenable compartment material includes a second ceramic material. The base tray and the compartment material are simultaneously machinable by way of a standard machining process to thereby planarize exposed outer surfaces of the base tray and the hardened compartment material at an essentially identical rate for forming a highly or ultra-planar wafer table surface.

    晶圓邊緣偵測及檢查
    210.
    发明专利
    晶圓邊緣偵測及檢查 审中-公开
    晶圆边缘侦测及检查

    公开(公告)号:TW201602560A

    公开(公告)日:2016-01-16

    申请号:TW104115658

    申请日:2015-05-15

    Abstract: 本發明提供用於判定一晶圓上之(若干)固定位置之晶圓檢查座標之方法及系統。一系統包含經組態以將光引導至一晶圓之一邊緣上之一光點之一照明子系統。該光點延伸超出該晶圓之該邊緣。該系統亦包含一載台,該載台使該晶圓旋轉藉此使該光點掃描遍及該晶圓之該邊緣。該系統亦包含一偵測器,該偵測器經組態以在該光點掃描遍及該邊緣時偵測來自該光點之光且回應於該經偵測光產生輸出。該系統進一步包含一電腦處理器,該電腦處理器經組態以基於該輸出判定該晶圓之該邊緣上之兩個或兩個以上位置之晶圓檢查座標且基於該邊緣上之該兩個或兩個以上位置之該等晶圓檢查座標判定該晶圓上之(若干)固定位置之晶圓檢查座標。

    Abstract in simplified Chinese: 本发明提供用于判定一晶圆上之(若干)固定位置之晶圆检查座标之方法及系统。一系统包含经组态以将光引导至一晶圆之一边缘上之一光点之一照明子系统。该光点延伸超出该晶圆之该边缘。该系统亦包含一载台,该载台使该晶圆旋转借此使该光点扫描遍及该晶圆之该边缘。该系统亦包含一侦测器,该侦测器经组态以在该光点扫描遍及该边缘时侦测来自该光点之光且回应于该经侦测光产生输出。该系统进一步包含一电脑处理器,该电脑处理器经组态以基于该输出判定该晶圆之该边缘上之两个或两个以上位置之晶圆检查座标且基于该边缘上之该两个或两个以上位置之该等晶圆检查座标判定该晶圆上之(若干)固定位置之晶圆检查座标。

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