Abstract:
Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least one hollow tube positioned between the optical element and a plasma formation site. The tube is oriented to capture debris while allowing light to pass through the tube's lumen via reflection at relatively small angles of grazing incidence. In another aspect of an embodiment of the present invention, a shield is disclosed which is heated to a temperature sufficient to remove one or more species of debris material that has deposited on the shield. In yet another aspect of an embodiment of the present invention, a system is disclosed which a shield is moved from a light source plasma chamber to a cleaning chamber where the shield is cleaned.
Abstract:
An x-ray source assembly includes an anode having a spot upon which electrons impinge based on power level supplied to the assembly, and an optic coupled to receive divergent x-rays generated at the spot and transmit output x-rays from the assembly. A control system is provided for maintaining intensity of the output x-rays dynamically during operation of the x-ray source assembly, notwithstanding a change in at least one operating condition of the x-ray source assembly, by changing the power level supplied to the assembly. The control system may include at least one actuator for effecting the change in the power level supplied to the assembly, by, e.g., controlling a power supply associated with the assembly. The control system may also change the temperature and/or the position of the anode to maintain the output intensity.
Abstract:
The device according to the first invention is intended for use in the creation of an image of an object using radiation which passes through the object, is scattered by it or generated within it. A lens is provided between the radiation source and the object positioning system, or between that system and an image-forming system which registers the intensity distribution of the radiation incident on it, or in both these spaces. This lens is designed in accordance with the second invention and converts the particle stream (focusing of divergent or quasi-parallel rays, formation of quasi-parallel rays from divergent rays, monochromatization, spatial separation of particles of different energies in an initial non-monochromatic stream, etc.). The lens comprises a set of channels for radiation transport (primarily in the form of vitreous mono- and polycapillaries) and is distinguished by an arrangement of the channels in its cross section which is in keeping with axial symmetry (reflectional, central, rotational); this results in a point of interference of the rays emerging from it. The channels can be grouped together in ordered and symmetrically configured modules (30), each of which in its turn can be formed by finer modules (31) of the same number, form and mutual configuration.
Abstract:
An x-ray or neutron optic configuration includes a plurality of single crystal portions (25) formed with respective spaced x-ray or neutron reflection faces (21, 22, 23) formed at predetermined asymmetry angles to a Bragg diffraction plane in the respective crystal portion. Means interconnects the crystal portions (25) to maintain a first and second (21, 22) of these faces spaced apart for receipt of a sample (8) between them and to allow small adjustments of the relative angle of the faces about the normal to the plane of diffraction while maintaining the normals to the Bragg planes for the first and second faces (21, 22) substantially in the plane of diffraction. First face (21) is arranged to be a monochromator and collimator with respect to x-rays or neutrons of appropriate wavelength incident reflected through the sample for receipt by the second face (22), which thereby serves as an analyzer face.
Abstract:
An apparatus for deriving X-ray absorbing and phase information comprises; a splitting element for splitting spatially an X-ray, a detector for detecting intensities of the X-rays transmitted through an object, the intensity of the X-rays changing according to X-ray phase and also position changes, and an calculating unit for calculating an X-ray transmittance image, and an X-ray differential phase contrast or phase sift contrast image as the phase information. The X-ray is split by a grating having unequal slit widths into two or more X-rays having different widths, and emitted onto the detector unit. And, the calculating unit calculates the X-ray absorbing and phase information based on a difference, between the two or more X-rays, in correlation between the changing of the phase of the X-ray and the changing the intensity of the X-ray in the detector unit.
Abstract:
Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least one hollow tube positioned between the optical element and a plasma formation site. The tube is oriented to capture debris while allowing light to pass through the tube's lumen via reflection at relatively small angles of grazing incidence. In another aspect of an embodiment of the present invention, a shield is disclosed which is heated to a temperature sufficient to remove one or more species of debris material that has deposited on the shield. In yet another aspect of an embodiment of the present invention, a system is disclosed which a shield is moved from a light source plasma chamber to a cleaning chamber where the shield is cleaned.