公开(公告)号：US09036789B2

公开(公告)日：2015-05-19

申请号：US13783520

申请日：2013-03-04

Applicant: Canon Kabushiki Kaisha

Inventor： Fumitaro Masaki ,  Naoya Iizuka ,  Mitsuaki Amemiya ,  Akira Miyake

IPC: G21K1/06

CPC classification number: G21K1/062 ,  G21K1/06 ,  G21K1/067 ,  G21K2201/064

Abstract: An adjusting method of an X-ray apparatus has a reflection structure, wherein assuming that one end plane of the reflection structure is an inlet port of the X-ray and the other end plane is an outlet port of the X-ray, a pitch of the reflection substrates at the outlet port is wider than that at the inlet port. When the X-ray source exists at a position where a glancing angle at the time when the X-ray enters the inlet port exceeds a critical angle, an intensity of the X-ray emitted from each passage is detected. On the basis of the detected X-ray intensity, a relative position of the X-ray source and the reflection structure is adjusted.

Abstract translation: X射线装置的调整方法具有反射结构，其中假设反射结构的一个端面是X射线的入口端口，另一端面是X射线的出口，则俯仰 在出口处的反射基板比入口处的反射基板宽。 当X射线源存在于X射线进入入口时的扫掠角超过临界角的位置时，检测从各通道发射的X射线的强度。 基于所检测的X射线强度，调整X射线源和反射结构的相对位置。

公开(公告)号：US09031203B2

公开(公告)日：2015-05-12

申请号：US13912364

申请日：2013-06-07

Applicant: Rigaku Innovative Technologies, Inc.

Inventor： Licai Jiang ,  Boris Verman

IPC: G21K1/06 ,  G01N23/201

CPC classification number: G21K1/067 ,  G01N23/201 ,  G21K2201/064

Abstract: A system for analyzing a sample is provided. The system includes an optical system capable of providing a one-dimensional beam and a two-dimensional beam. The system may include a beam selection device to select between providing a one-dimensional x-ray beam to the sample in a one-dimensional operation mode and a two-dimensional x-ray beam to the sample in a two-dimensional operation mode.

Abstract translation: 提供了一种用于分析样品的系统。 该系统包括能够提供一维光束和二维光束的光学系统。 所述系统可以包括波束选择装置，用于在以一维操作模式向所述样本提供一维X射线束和以二维操作模式向所述样本提供二维X射线束之间进行选择。

公开(公告)号：US09020102B2

公开(公告)日：2015-04-28

申请号：US13778780

申请日：2013-02-27

Applicant: Canon Kabushiki Kaisha

Inventor： Mitsuaki Amemiya ,  Ichiro Nomura ,  Takeo Tsukamoto ,  Akira Miyake

IPC: G21K1/06

CPC classification number: G21K1/06 ,  G21K2201/064

Abstract: The present invention provides an X-ray optical apparatus including an X-ray reflective structure in which at least three reflective substrates are arranged with an interval and an X-ray which is incident into a plurality of X-ray passages whose both sides are put between the reflective substrates is reflected from the reflective substrate at both sides of the X-ray passage to be parallelized and emitted from the X-ray passage. When an edge of the X-ray reflective structure is an inlet of the X-ray and the other edge is an outlet of the X-ray, a pitch of the reflective substrates at the outlet is larger than a pitch at the inlet. Therefore, it is possible to efficiently parallelize the incident X-ray to be emitted with a simple structure.

Abstract translation: 本发明提供了一种X射线光学装置，其包括X射线反射结构，其中至少三个反射基板间隔布置，并且X射线入射到放置在其两侧的多个X射线通道中 反射基板之间的反射基板在X射线通道的两侧被反射，以被平行化并从X射线通道发射。 当X射线反射结构的边缘是X射线的入口并且另一边缘是X射线的出口时，出口处的反射基板的间距大于入口处的间距。 因此，能够以简单的结构高效地并行化待发射的X射线。

公开(公告)号：US20140301528A1

公开(公告)日：2014-10-09

申请号：US14354855

申请日：2012-10-29

Applicant: THE UNIVERSITY OF CHICAGO

Inventor： Patrick La Riviere

IPC: G01N23/04

CPC classification number: G01N23/04 ,  A61B6/032 ,  A61B6/482 ,  A61B6/508 ,  B82Y10/00 ,  G01N23/046 ,  G01N23/223 ,  G01N23/2251 ,  G01N2223/0766 ,  G01N2223/6126 ,  G06T19/00 ,  G06T2210/41 ,  G21K2201/061 ,  G21K2201/064

Abstract: Systems and methods are provided for staining tissue with multiple biologically specific heavy metal stains and then performing X-ray imaging, either in projection or tomography modes, using either a plurality of illumination energies or an energy sensitive detection scheme. The resulting energy-weighted measurements can then be used to decompose the resulting images into quantitative images of the distribution of stains. The decomposed images may be false-colored and recombined to make virtual X-ray histology images. The techniques thereby allow for effective differentiation between two or more X-ray dyes, which had previously been unattainable in 3D imaging, particularly 3D imaging of features at the micron resolution scale. While techniques are described in certain example implementations, such as with microtomography, the techniques are scalable to larger fields of view, allowing for use in 3D color, X-ray virtual histology of pathology specimens.

Abstract translation: 提供了用多个生物特异性重金属染色染色组织的系统和方法，然后使用多个照明能量或能量敏感检测方案，以投影或断层摄影模式进行X射线成像。 然后，所得到的能量加权测量可用于将所得图像分解成污渍分布的定量图像。 分解图像可能是假色的并重新组合以制作虚拟X射线组织学图像。 因此，这些技术允许两种或多种X射线染料之间的有效区分，其先前在3D成像中是不可实现的，特别是在微米分辨率刻度上的特征的3D成像。 虽然技术在某些示例实现中被描述，例如利用微影像技术，但是这些技术可扩展到更大的视野，允许在3D颜色，病理标本的X射线虚拟组织学中使用。

公开(公告)号：US08824631B2

公开(公告)日：2014-09-02

申请号：US13008866

申请日：2011-01-18

Applicant: Kazuhisa Mitsuda ,  Manabu Ishida ,  Yuichiro Ezoe ,  Kazuo Nakajima

Inventor： Kazuhisa Mitsuda ,  Manabu Ishida ,  Yuichiro Ezoe ,  Kazuo Nakajima

IPC: G21K1/06

CPC classification number: G21K1/067 ,  G21K2201/062 ,  G21K2201/064

Abstract: Provided is a technique for X-ray reflection, such as an X-ray reflecting mirror, capable of achieving a high degree of smoothness of a reflecting surface, high focusing (reflecting) performance, stability in a curved surface shape, and a reduction in overall weight. A silicon plate (silicon wafer) is subjected to thermal plastic deformation to form an X-ray reflecting mirror having a reflecting surface with a stable curved surface shape. The silicon wafer can be deformed to any shape by applying a pressure thereto in a hydrogen atmosphere at a high temperature of about 1300° C. The silicon plate may be simultaneously subjected to hydrogen annealing to further reduce roughness of a silicon surface to thereby provide enhanced reflectance.

Abstract translation: 提供了能够实现反射面的高度平滑度，高聚焦（反射）性能，曲面形状的稳定性以及缩小的X射线反射技术，例如X射线反射镜 总重。 硅板（硅晶片）经受热塑性变形，形成具有稳定曲面形状的反射面的X射线反射镜。 硅晶片可以通过在约1300℃的高温下在氢气氛中施加压力而变形为任何形状。硅板可以同时进行氢退火以进一步降低硅表面的粗糙度，从而提供增强的 反射率。

公开(公告)号：US08735844B1

公开(公告)日：2014-05-27

申请号：US13832778

申请日：2013-03-15

Applicant: Massachusetts Institute of Technology ,  The United States of America as Represented by the Administrator of the National Aeronautics and Space Adm

Inventor： Boris Khaykovich ,  David E. Moncton ,  Mikhail V. Gubarev ,  Brian D. Ramsey ,  Darell E. Engelhaupt

IPC: G01T3/00

CPC classification number: G21K1/06 ,  G21K2201/064 ,  G21K2201/067 ,  G21K2201/068

Abstract: A dispersed release of neutrons is generated from a source. A portion of this dispersed neutron release is reflected by surfaces of a plurality of nested, axisymmetric mirrors in at least an inner mirror layer and an outer mirror layer, wherein the neutrons reflected by the inner mirror layer are incident on at least one mirror surface of the inner mirror layer N times, wherein N is an integer, and wherein neutrons reflected by the outer mirror are incident on a plurality of mirror surfaces of the outer layer N+i times, where i is a positive integer, to redirect the neutrons toward a target. The mirrors can be formed by a periodically reversed pulsed-plating process.

Abstract translation: 从源产生中子的分散释放。 这种分散的中子释放的一部分被反射在至少内镜层和外镜层中的多个嵌套的轴对称镜的表面，其中由内镜层反射的中子入射在至少一个镜面上 内镜层N次，其中N是整数，并且其中由外镜反射的中子入射到外层N + i次的多个镜表面上，其中i是正整数，以将中子朝向 一个目标。 反射镜可以通过周期性反转的脉冲电镀工艺形成。

公开(公告)号：US20130335816A1

公开(公告)日：2013-12-19

申请号：US13971031

申请日：2013-08-20

Applicant: Carl Zeiss SMT GmbH ,  Carl Zeiss Laser Optics GmbH

Inventor： Holger Kierey ,  Heiko Siekmann ,  Andre Bresan

IPC: G02B5/20

CPC classification number: G02B5/208 ,  B24B13/00 ,  G02B1/10 ,  G02B5/0891 ,  G02B5/10 ,  G02B5/1838 ,  G02B5/1852 ,  G02B5/1857 ,  G03F7/70316 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067

Abstract: A method for producing a reflective optical component for an EUV projection exposure apparatus, the component having a substrate having a base body, and a reflective layer arranged on the substrate, wherein the substrate has an optically operative microstructuring, comprises the following steps: working the microstructuring into the substrate, polishing the substrate after the microstructuring has been worked into the substrate, applying the reflective layer to the substrate. A reflective optical component for an EUV projection exposure apparatus correspondingly has a polished surface between the microstructuring and the reflective layer.

Abstract translation: 一种用于制造用于EUV投影曝光装置的反射型光学部件的方法，具有基体的部件和设置在基板上的反射层的部件，其中基板具有光学上的微结构化，包括以下步骤： 微结构化到衬底中，在微结构化已经加工到衬底中之后对衬底进行抛光，将反射层施加到衬底上。 用于EUV投影曝光装置的反射型光学部件对应地具有在微结构化和反射层之间的抛光表面。

公开(公告)号：US08559597B2

公开(公告)日：2013-10-15

申请号：US12920641

申请日：2009-03-03

Applicant: Zewu Chen ,  David M. Gibson ,  Walter M. Gibson ,  Adam Bailey ,  R. Scott Semken ,  Kai Xin ,  John H. Burdett

Inventor： Zewu Chen ,  David M. Gibson ,  Walter M. Gibson ,  Adam Bailey ,  R. Scott Semken ,  Kai Xin ,  John H. Burdett

IPC: G21K1/06

CPC classification number: G21K1/06 ,  G01N23/20008 ,  G01N23/223 ,  G01N2223/076 ,  G01N2223/1003 ,  G01N2223/315 ,  G01N2223/423 ,  G21K2201/062 ,  G21K2201/064 ,  H05G1/04

Abstract: An x-ray analysis apparatus for illuminating a sample spot with an x-ray beam. An x-ray tube is provided having a source spot from which a diverging x-ray beam is produced having a characteristic first energy, and bremsstrahlung energy; a first x-ray optic receives the diverging x-ray beam and directs the beam toward the sample spot, while monochromating the beam; and a second x-ray optic receives the diverging x-ray beam and directs the beam toward the sample spot, while monochromating the beam to a second energy. The first x-ray optic may monochromate characteristic energy from the source spot, and the second x-ray optic may monochromate bremsstrahlung energy from the source spot. The x-ray optics may be curved diffracting optics, for receiving the diverging x-ray beam from the x-ray tube and focusing the beam at the sample spot. Detection is also provided to detect and measure various toxins in, e.g., manufactured products including toys and electronics.

公开(公告)号：US20130141707A1

公开(公告)日：2013-06-06

申请号：US13754720

申请日：2013-01-30

Applicant: Carl Zeiss SMT GmbH ,  ASML Netherlands B.V.

Inventor： Norman Baer ,  Ulrich Loering ,  Oliver Natt ,  Gero Wittich ,  Timo Laufer ,  Peter Kuerz ,  Guido Limbach ,  Stefan Hembacher ,  Holger Walter ,  Yim-Bun-Patrick Kwan ,  Markus Hauf ,  Franz-Josef Stickel ,  Jan Van Schoot

IPC: G03B27/54 ,  G02B5/08 ,  G02B3/00

CPC classification number: G03F7/7015 ,  B82Y10/00 ,  G02B3/00 ,  G02B5/08 ,  G02B5/0816 ,  G02B5/0891 ,  G02B7/1815 ,  G02B17/0647 ,  G02B27/0043 ,  G03B27/542 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70316 ,  G03F7/70825 ,  G03F7/70891 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/064

Abstract: A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.

Abstract translation: 具有至少两个反射光学元件的EUV光刻投影曝光系统的投影透镜，每个反射光学元件均包括主体和反射表面，用于在掩模版上投影到基板上的图像场上，如果投影透镜曝光 EUV光的功率，其中至少两个反射光学元件的主体包括具有温度依赖的热膨胀系数的材料，其在相应的零交叉温度下为零，并且其中零交叉温度之间的差的绝对值更多 超过6K。

公开(公告)号：US20130108022A1

公开(公告)日：2013-05-02

申请号：US13662038

申请日：2012-10-26

Applicant: Lawrence Livermore National Security, LLC

Inventor： Nathan Kugland ,  Tilo Doeppner ,  Siegfried Glenzer ,  Carmen Constantin ,  Chris Niemann ,  Paul Neumayer

IPC: G21K1/06

CPC classification number: G21K1/06 ,  G01N23/2076 ,  G01N2223/331 ,  G21B1/23 ,  G21K2201/062 ,  G21K2201/064

Abstract: A method is provided for characterizing spectrometric properties (e.g., peak reflectivity, reflection curve width, and Bragg angle offset) of the Kα emission line reflected narrowly off angle of the direct reflection of a bent crystal and in particular of a spherically bent quartz 200 crystal by analyzing the off-angle x-ray emission from a stronger emission line reflected at angles far from normal incidence. The bent quartz crystal can therefore accurately image argon Kα x-rays at near-normal incidence (Bragg angle of approximately 81 degrees). The method is useful for in-situ calibration of instruments employing the crystal as a grating by first operating the crystal as a high throughput focusing monochromator on the Rowland circle at angles far from normal incidence (Bragg angle approximately 68 degrees) to make a reflection curve with the He-like x-rays such as the He-α emission line observed from a laser-excited plasma.

Abstract translation: 提供了一种用于表征Kalpha发射线的光谱特性（例如，峰值反射率，反射曲线宽度和布拉格角偏移）的方法，其反映了弯曲晶体的直接反射的窄偏角，特别是反射曲线的石英200晶体 通过分析从远离正常入射角度反射的较强发射线的偏角x射线发射。 因此，弯曲的石英晶体可以以近似法线入射（约为81度的布拉格角）精确地成像氩Kalpha x射线。 该方法对于使用晶体作为光栅的仪器的原位校准是有用的，首先将晶体作为高通量聚焦单色仪在Rowland圆上以远离法向入射角度（布拉格角约68度）进行操作，以形成反射曲线 与He-like x射线如从激光激发等离子体观察到的He-α发射线。