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    LOW SCATTERING SILICA GLASS AND METHOD FOR HEAT-TREATING SILICA GLASS
    231.
    发明申请
    LOW SCATTERING SILICA GLASS AND METHOD FOR HEAT-TREATING SILICA GLASS 审中-公开
    低散射二氧化硅玻璃和加热二氧化硅玻璃的方法

    公开(公告)号：US20160152504A1

    公开(公告)日：2016-06-02

    申请号：US15014359

    申请日：2016-02-03

    Applicant: ASAHI GLASS COMPANY, LIMITED

    Inventor： Madoka ONO ,  Setsuro ITO ,  Osamu HONMA ,  Yousuke AMINO

    IPC: C03B25/02 ,  C03C3/06

    CPC classification number: C03B25/02 ,  C03B19/1453 ,  C03B32/005 ,  C03B37/02727 ,  C03B2201/04 ,  C03B2201/075 ,  C03B2201/31 ,  C03B2201/42 ,  C03B2205/56 ,  C03C3/06 ,  Y02P40/57

    Abstract: To provide low scattering silica glass suitable as a material of an optical communication fiber.Silica glass, which has a fictive temperature of at least 1,000° C., and which has a void radius of at most 0.240 nm as measured by positron annihilation lifetime spectroscopy. A method for heat-treating silica glass, which comprises holding silica glass to be heat-treated in an atmosphere at a temperature of at least 1,200° C. and at most 2,000° C. under a pressure of at least 30 MPa, and cooling the silica glass at an average temperature-decreasing rate of at least 40° C./min during cooling within a temperature range of from 1,200° C. to 900° C. A method for heat-treating silica glass, which comprises holding silica glass to be heat-treated in an atmosphere at a temperature of at least 1,200° C. and at most 2,000° C. under a pressure of at least 140 MPa, and cooling the silica glass in an atmosphere under a pressure of at least 140 MPa during cooling within a temperature range of from 1,200° C. to 900° C.

    Abstract translation: 提供适合作为光通信光纤的材料的低散射二氧化硅玻璃。 二氧化硅玻璃具有至少1000℃的假想温度，并且通过正电子湮没寿命光谱测定具有至多0.240nm的空隙半径。 一种用于热处理石英玻璃的方法，其包括在至少1200℃和至多2000℃的温度下在至少30MPa的压力下在保持在大气中进行热处理的石英玻璃，以及冷却 二氧化硅玻璃在1200℃〜900℃的温度范围内的冷却时的平均降温速度为40℃/分钟以上。一种石英玻璃的热处理方法，其包括保持石英玻璃 在至少1200℃和最多2000℃的温度的气氛中在至少140MPa的压力下进行热处理，并在气氛中在至少140MPa的压力下冷却石英玻璃 在1200℃〜900℃的温度范围内进行冷却。

    High purity silica monoliths and process for the synthesis thereof
    236.
    发明授权
    High purity silica monoliths and process for the synthesis thereof 有权
    高纯二氧化硅整料及其合成方法

    公开(公告)号：US08563620B2

    公开(公告)日：2013-10-22

    申请号：US13123350

    申请日：2009-10-01

    Applicant: Mohamed Bouazaoui ,  Bruno Capoen ,  Hicham El-Hamzaoui ,  Laurent Bigot ,  Géraud Bouwmans

    Inventor： Mohamed Bouazaoui ,  Bruno Capoen ,  Hicham El-Hamzaoui ,  Laurent Bigot ,  Géraud Bouwmans

    IPC: C03B19/12 ,  C03C3/06

    CPC classification number: C03B19/12 ,  C03B37/016 ,  C03B2201/04 ,  C03B2203/42 ,  C03C1/006 ,  C03C3/06

    Abstract: The process for the synthesis of a silica monolith comprises the following steps: hydrolysis of a silicon alkoxide in order to form a hydrolysis precursor followed by a condensation of said hydrolysis precursor in the presence of an organic solvent, in the presence of water and of a basic catalyst in order to form oligomeric clusters containing several silicon atoms; dispersion of said oligomeric clusters in a solution in order to form a sol; polymerization of the sol in order to obtain a gel via a first heat treatment, at a temperature below the boiling point of the constituents of the sol; drying of the gel via a second heat treatment; conversion of the gel to a xerogel via a third heat treatment; dehydration and densification of the xerogel until the silica monolith is obtained via a fourth heat treatment.

    Abstract translation: 用于合成二氧化硅整料的方法包括以下步骤：水解硅烷醇以形成水解前体，随后在有机溶剂存在下，在水和有机溶剂存在下使所述水解前体缩合 碱性催化剂，以形成含有几个硅原子的低聚簇; 将所述低聚簇分散在溶液中以形成溶胶; 在低于溶胶成分的沸点的温度下通过第一热处理获得凝胶的溶胶的聚合; 通过第二次热处理干燥凝胶; 通过第三次热处理将凝胶转化为干凝胶; 干凝胶的脱水和致密化直到通过第四次热处理获得二氧化硅整料。

    SYNTHESIZED SILICA GLASS FOR OPTICAL COMPONENT
    238.
    发明申请
    SYNTHESIZED SILICA GLASS FOR OPTICAL COMPONENT 有权
    用于光学组件的合成二氧化硅玻璃

    公开(公告)号：US20120182622A1

    公开(公告)日：2012-07-19

    申请号：US13367780

    申请日：2012-02-07

    Applicant: Masaaki TAKATA ,  Long Shao ,  Kei Iwata ,  Tomonori Ogawa

    Inventor： Masaaki TAKATA ,  Long Shao ,  Kei Iwata ,  Tomonori Ogawa

    IPC: G02B27/12 ,  C03B25/00 ,  B82Y20/00

    CPC classification number: C03B19/1453 ,  C03B2201/04 ,  G03F7/70966 ,  Y02P40/57

    Abstract: The present invention provides a synthetic silica glass for an optical member in which not only a fast axis direction in an optical axis direction is controlled, and a birefringence in an off-axis direction is reduced, but a magnitude of a birefringence in the optical axis direction is controlled to an arbitrary value, such that an average value of a value BR cos 2θxy defined from a birefringence BR and a fast axis direction θxy as measured from a parallel direction to the principal optical axis direction is defined as an average birefringence AveBR cos 2θxy, and when a maximum value of a birefringence measured from a vertical direction to the principal optical axis direction of the optical member is defined as a maximum birefringence BRmax in an off-axis direction, the following expression (1-1) and expression (2-1) are established: −1.0≦AveBR cos 2θxy

    Abstract translation: 本发明提供一种用于光学构件的合成石英玻璃，其不仅控制光轴方向上的快轴方向，并且减少偏轴双折射，而且在光轴上具有双折射的大小 方向被控制为任意值，使得从平行方向到主光轴方向测量的从双折射BR和快轴方向＆yt; xy定义的值BR cos 2＆amp; t s; xy的平均值被定义为 平均双折射度AveBR cos 2＆amp; t s; xy，并且当从垂直方向测量到光学构件的主光轴方向的双折射的最大值被定义为在偏轴方向上的最大双折射率BRmax时，以下表达式（1 -1）和表达式（2-1）：-1.0＆nlE; AveBR cos 2＆thetas; xy <0.0（1-1）0.0＆nlE; BRmax＆nlE; 1.0（2-1）。

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