公开(公告)号：US20050284177A1

公开(公告)日：2005-12-29

申请号：US11168851

申请日：2005-06-29

Applicant: Norio Komine ,  Seishi Fujiwara ,  Akiko Yoshida ,  Hiroki Jinbo ,  Norihisa Yamaguchi

Inventor： Norio Komine ,  Seishi Fujiwara ,  Akiko Yoshida ,  Hiroki Jinbo ,  Norihisa Yamaguchi

IPC: C03B8/04 ,  C03B19/06 ,  C03B19/14 ,  C03C3/06

CPC classification number: C03B19/1415 ,  C03B19/1407 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/06 ,  C03B2207/12 ,  C03B2207/20 ,  C03B2207/22 ,  C03B2207/24 ,  C03B2207/32 ,  C03B2207/36 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/30 ,  C03C2201/50 ,  C03C2203/40

Abstract: An optical member made of silica glass manufactured by the direct method where a material gas comprising an organosilicon compound is allowed to react in an oxidizing flame, said optical member having a 2×1014 molecules/cm3 or less concentration of formyl radical generated by X-ray irradiation whose dose is 0.01 Mrad or more and 1 Mrad or less.

Abstract translation: 通过直接法制造的由石英玻璃制成的光学构件，其中包含有机硅化合物的材料气体在氧化火焰中反应，所述光学构件具有2×10 14分子/ cm 3 通过X射线照射产生的或更少浓度的甲酰基，其剂量为0.01Mrad以上且1Mrad以下。

公开(公告)号：US06920766B2

公开(公告)日：2005-07-26

申请号：US10161433

申请日：2002-05-30

Applicant: Frank Coriand ,  Andreas Menzel ,  Andreas Voitsch

Inventor： Frank Coriand ,  Andreas Menzel ,  Andreas Voitsch

IPC: G02B1/00 ,  C03B8/04 ,  C03B19/14 ,  C03B20/00 ,  C03C3/06 ,  C03C4/00 ,  C03B19/06

CPC classification number: C03C4/0085 ,  C03B19/1407 ,  C03B19/1423 ,  C03B2201/07 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/62 ,  C03C3/06 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40

Abstract: A synthetic quartz glass preform is produced by flame hydrolysis with subsequent cooling and is suitable for the application of high-energy DUV radiation in the wave length range under 250 nm. The preform has a core area which contains ≧1150 ppm OH, a strain double refraction of ≦5 nm/cm and a resistance to high-energy DUV radiation as a result of a transmission reduction of ΔT ≦0.1%/cm thickness. The quartz glass has been exposed to the following radiation: wavelength λ1=248 nm, laser shot frequency ≧300 Hz, laser shot value ≧109 and lumination ≦10 mJ/cm2, and wavelength λ2=193 nm, laser shot frequency ≧300 Hz, laser shot value ≧109 and lumination

Abstract translation: 合成石英玻璃预成型体通过随后的冷却通过火焰水解制备，并且适用于在250nm以下的波长范围内应用高能DUV辐射。 预成型件具有包含> = 1150ppm OH的核心区域，<= 5nm / cm的应变双折射和由于ΔT<= 0.1％/ cm厚度的透射率降低而导致的高能量DUV辐射的耐受性 。 石英玻璃暴露于以下辐射：波长λ1 = 248nm，激光射击频率> 300Hz，激光射击值> = 10 9和照明< 激光拍摄频率> = 300Hz，激光拍摄值> = 10/9> 10nm / >和照明<5MJ / CM <2> 。 用于生产预成型件的装置包括水平定位的具有彼此面对的两个不同尺寸开口的马弗。 较大的开口用于去除预制件，较小的开口用于引入燃烧器。 马弗炉的内腔从较大的开口变窄到较小的开口。

公开(公告)号：US20050152653A1

公开(公告)日：2005-07-14

申请号：US10502455

申请日：2003-08-20

Applicant: Ki-Wan Jang ,  Lae-Hyuk Park ,  Chan-Joo Lee

Inventor： Ki-Wan Jang ,  Lae-Hyuk Park ,  Chan-Joo Lee

IPC: G02B6/00 ,  C03B37/014 ,  C03B37/018 ,  G02B6/02 ,  G02B6/16

CPC classification number: C03B37/01853 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/28 ,  C03B2201/31 ,  G02B6/02

Abstract: Disclosed is a method of manufacturing an optical fiber perform using MCVD including dehydration and dechlorination, which executes the following process repeatedly with changing the composition of soot generation gas according to the refractive index profile, the process including the steps of: forming a soot layer having pores on an inner wall of a deposition tube at a temperature lower than the soot sintering temperature with putting soot generation gas and oxygen gas into the rotating deposition tube; removing hydroxyl groups with keeping the pores by putting dehydration gas into the deposition tube; removing chlorine impurities existing in the soot layer with keeping the pores by putting dehydration gas into the deposition tube; and sintering the soot layer by heating the deposition tube at a temperature over the soot sintering temperature.

Abstract translation: 本发明公开了一种使用包括脱水和脱氯在内的MCVD进行的光纤的制造方法，其通过根据折射率分布改变烟灰发生气体的组成而重复地执行以下处理，该方法包括以下步骤：形成具有 在低于烟灰烧结温度的温度下在沉积管的内壁上的孔，将烟灰产生气体和氧气放入旋转沉积管中; 通过将脱水气体放入沉积管中，保持孔隙去除羟基; 通过将脱水气体放入沉积管中来除去存在于烟灰层中的氯杂质，同时保持孔; 并且通过在超过烟灰烧结温度的温度下加热沉积管来烧结烟灰层。

公开(公告)号：US06885787B2

公开(公告)日：2005-04-26

申请号：US10044452

申请日：2002-01-11

Applicant: A. Joseph Antos ,  Dana C. Bookbinder ,  Richard M. Fiacco ,  Kevin B. Sparks

Inventor： A. Joseph Antos ,  Dana C. Bookbinder ,  Richard M. Fiacco ,  Kevin B. Sparks

IPC: C03B37/014 ,  C03B37/018 ,  C03C13/04 ,  G02B6/02 ,  G02B6/036 ,  G02B6/28 ,  G02B6/34 ,  G02B6/255 ,  G02B6/16 ,  G02B6/36

CPC classification number: G02B6/03694 ,  C03B37/01446 ,  C03B37/01853 ,  C03B2201/07 ,  C03B2201/10 ,  C03B2201/12 ,  C03B2201/22 ,  C03B2201/23 ,  C03B2201/31 ,  C03B2203/22 ,  C03C13/045 ,  C03C13/047 ,  C03C2201/22 ,  G02B6/02 ,  G02B6/03622 ,  G02B6/2835 ,  Y02P40/57

Abstract: An optical waveguide fiber or body having a doped outer region which can be utilized in an optical coupler, a preform which can serve as the precursor for the fiber, an optical coupler, and methods of making same. Water, for example in the form of H2O and/or D2O, may be added to the cladding of the optical waveguide fiber or body.

公开(公告)号：US20050069640A1

公开(公告)日：2005-03-31

申请号：US10904843

申请日：2004-12-01

Applicant: Toivo Kodas ,  Mark Hampden-Smith ,  James Caruso ,  Quint Powell ,  Audunn Ludviksson

Inventor： Toivo Kodas ,  Mark Hampden-Smith ,  James Caruso ,  Quint Powell ,  Audunn Ludviksson

IPC: A61K6/06 ,  A61K6/083 ,  B01J13/02 ,  B01J19/00 ,  B01J19/10 ,  B01J19/24 ,  B24B37/04 ,  C01B13/18 ,  C01B17/20 ,  C01F17/00 ,  C01G23/00 ,  C03B8/02 ,  C03B8/04 ,  C03B19/10 ,  C03C8/16 ,  C03C11/00 ,  C03C12/00 ,  C03C14/00 ,  C03C17/30 ,  C09G1/02 ,  C09K3/14 ,  C09K11/58 ,  C09K11/59 ,  C09K11/62 ,  C09K11/64 ,  C09K11/66 ,  C09K11/67 ,  C09K11/77 ,  H01L21/321 ,  B05D1/12 ,  C08K3/40

CPC classification number: B82Y30/00 ,  A61K6/0276 ,  A61K6/08 ,  A61K6/083 ,  B01J13/02 ,  B01J19/10 ,  B01J19/2405 ,  B01J2219/00112 ,  B01J2219/00155 ,  B01J2219/00159 ,  B01J2219/00162 ,  B01J2219/00166 ,  B01J2219/00171 ,  B01J2219/00186 ,  B24B37/044 ,  C01B13/18 ,  C01B13/185 ,  C01B17/20 ,  C01F17/0043 ,  C01G23/003 ,  C01P2002/60 ,  C01P2004/03 ,  C01P2004/32 ,  C01P2004/34 ,  C01P2004/50 ,  C01P2004/52 ,  C01P2004/61 ,  C01P2004/62 ,  C01P2006/22 ,  C03B19/106 ,  C03B2201/07 ,  C03C8/16 ,  C03C11/002 ,  C03C12/00 ,  C03C14/004 ,  C03C17/30 ,  C03C2214/08 ,  C09G1/02 ,  C09K3/1436 ,  C09K3/1463 ,  C09K11/584 ,  C09K11/595 ,  C09K11/623 ,  C09K11/642 ,  C09K11/643 ,  C09K11/644 ,  C09K11/662 ,  C09K11/666 ,  C09K11/672 ,  C09K11/7701 ,  C09K11/7708 ,  C09K11/7729 ,  C09K11/7769 ,  C09K11/7776 ,  C09K11/7784 ,  C09K11/7786 ,  C09K11/7787 ,  H01L21/3212 ,  Y02P40/57 ,  Y10T428/29 ,  Y10T428/2982 ,  Y10T428/2991 ,  Y10T428/2995 ,  Y10T428/2996 ,  C08L33/00

Abstract: Glass powders, methods for producing glass powders and compositions comprising glass powders. The powders preferably have a small particle size, narrow size distribution and a spherical morphology. The method includes forming the particles by a spray pyrolysis technique. The invention also includes novel devices and products formed from the glass powders. The compositions may be deposited on a substrate using various techniques including ink-jet printing.

Abstract translation: 玻璃粉末，玻璃粉末的制造方法以及包含玻璃粉末的组合物。 粉末优选具有小的粒度，窄的粒度分布和球形的形态。 该方法包括通过喷雾热解技术形成颗粒。 本发明还包括由玻璃粉末形成的新型器件和产品。 组合物可以使用包括喷墨印刷在内的各种技术沉积在基材上。

公开(公告)号：US20040235635A1

公开(公告)日：2004-11-25

申请号：US10842979

申请日：2004-05-11

Inventor： Nicholas F. Borrelli ,  Charlene M. Smith ,  Johannes Moll

IPC: C03C003/06

CPC classification number: G03F7/70041 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/36 ,  C03C3/06 ,  C03C4/0085 ,  C03C23/002 ,  C03C2201/21 ,  C03C2201/23 ,  G03F7/70058 ,  G03F7/70941 ,  G03F7/70958 ,  G03F7/70966

Abstract: Lithographic methods are disclosed. In one such method, a pulsed ultraviolet radiation source for producing ultraviolet lithography radiation having a wavelength shorter than about 300 nm at a fluence of less than 10 mJ/cm2/pulse and a high purity fused silica lithography glass having a concentration of molecular hydrogen of between about 0.02null1018 molecules/cm3 and about 0.18null1018 molecules/cm3 are provided. A lithography pattern is formed with the ultraviolet lithography radiation; the lithography pattern is reduced to produce a reduced lithography pattern; and the reduced lithography pattern is projected onto a ultraviolet radiation sensitive lithography medium to form a printed lithography pattern. At least one of the forming, reducing, and projecting steps includes transmitting the ultraviolet lithography radiation through the high purity fused silica lithography glass. Lithography systems and high purity fused silica lithography glass are also described.

公开(公告)号：US20040170365A1

公开(公告)日：2004-09-02

申请号：US10479852

申请日：2003-12-08

Inventor： Tomoyuki Yokokawa ,  Eiji Yanada ,  Masaaki Hirano

IPC: G02B006/02

CPC classification number: G02B6/03694 ,  C03B37/01211 ,  C03B37/01892 ,  C03B2201/03 ,  C03B2201/07 ,  C03B2203/22 ,  C03B2203/36 ,  G02B6/02261 ,  G02B6/02271 ,  G02B6/0228 ,  G02B6/03644 ,  G02B6/03666

Abstract: An object of the present invention is to provide an optical fiber manufacturing method and an optical fiber in which an increase in the transmission loss is suppressed by preventing hydroxyl group from entering near the core portion. This invention provides a method for manufacturing an optical fiber 10 including forming a glass pipe 16 by applying a ring portion 15 on the inner face of a starting pipe 14 as a starting material, inserting a glass rod 13 that becomes a central core portion 11 and a depressed portion 12 into the inside of the glass pipe 16, integrating the glass pipe 16 and the glass rod 13 by collapse to form a glass body 17, forming a preform 10a by providing a jacket portion 18 outside the glass body 17, and drawing the preform 10a, wherein the thickness of the starting pipe 14 is set in a range from 4 mm to 8 mm.

Abstract translation: 本发明的目的是提供一种光纤制造方法和光纤，其中通过防止羟基进入芯部附近而抑制传输损耗的增加。 本发明提供了一种制造光纤10的方法，该光纤10包括通过在作为起始材料的起始管14的内表面上施加环形部分15，插入成为中心芯部11的玻璃棒13和 将凹部12插入到玻璃管16的内部，将玻璃管16和玻璃棒13倒塌形成玻璃体17，通过在玻璃体17的外侧设置护套部18而形成预制件10a， 预成型件10a，其中起始管14的厚度设定在4mm至8mm的范围内。

公开(公告)号：US06782716B2

公开(公告)日：2004-08-31

申请号：US10702266

申请日：2003-11-05

Applicant: Lisa A. Moore ,  Charlene M. Smith

Inventor： Lisa A. Moore ,  Charlene M. Smith

IPC: C03C1500

CPC classification number: C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  G03F1/60

Abstract: High purity silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed with the silicon oxyfluoride glass having a preferred fluorine content

公开(公告)号：US20040121247A1

公开(公告)日：2004-06-24

申请号：US10733009

申请日：2003-12-10

Inventor： George Edward Berkey ,  Lisa Anne Moore ,  Michelle Diane Pierson

IPC: B32B015/00 ,  B32B009/00 ,  C03B037/10 ,  B32B017/06 ,  C03B037/018 ,  G02B006/18 ,  C03B037/075 ,  C03C013/00 ,  G02B006/00 ,  C03C003/112 ,  C03B019/00 ,  G03F009/00

CPC classification number: C03C4/0085 ,  C03B19/1453 ,  C03B19/1469 ,  C03B23/043 ,  C03B23/045 ,  C03B23/051 ,  C03B23/07 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03C3/06 ,  C03C2201/12 ,  C03C2203/50 ,  G03F1/60

Abstract: The present invention is a method of making a lithography photomask and photomask blank. The method of making the lithography photomask and photomask blank includes providing a silicon oxyfluoride glass tube having an OH content less than 50 ppm. The method further includes cutting the silicon oxyfluoride glass tube, flattening the silicon oxyfluoride glass tube, and forming the flattened cut silicon oxyfluoride glass tube into a photomask blank having a planar surface. The present invention includes a glass lithography mask preform. The glass lithography mask preform is a longitudinal silicon oxyfluoride glass tube that has an OH contentnull10 ppm, a F wt. % concentrationnull0.5 wt. %.

Abstract translation: 本发明是制造光刻光掩模和光掩模坯料的方法。 制造光刻光掩模和光掩模坯料的方法包括提供OH含量低于50ppm的氟氧化硅玻璃管。 该方法还包括切割氟氧化硅玻璃管，使氟氧化硅玻璃管扁平化，并将扁平切割的氟氧化硅玻璃管形成具有平坦表面的光掩模坯料。 本发明包括玻璃光刻掩模预制件。 玻璃光刻掩模预制件是具有OH含量<= 10ppm的纵向硅氧氟化物玻璃管，F wt。 ％浓度> = 0.5wt。 ％。

公开(公告)号：US06754002B2

公开(公告)日：2004-06-22

申请号：US09967841

申请日：2001-09-27

Applicant: Nicholas F. Borrelli ,  Charlene M. Smith ,  Johannes Moll

Inventor： Nicholas F. Borrelli ,  Charlene M. Smith ,  Johannes Moll

IPC: G02B1314

CPC classification number: G03F7/70041 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/36 ,  C03C3/06 ,  C03C4/0085 ,  C03C23/002 ,  C03C2201/21 ,  C03C2201/23 ,  G03F7/70058 ,  G03F7/70941 ,  G03F7/70958 ,  G03F7/70966

Abstract: Lithographic methods are disclosed. In one such method, a pulsed ultraviolet radiation source for producing ultraviolet lithography radiation having a wavelength shorter than about 300 nm at a fluence of less than 10 mJ/cm2/pulse and a high purity fused silica lithography glass having a concentration of molecular hydrogen of between about 0.02×1018 molecules/cm3 and about 0.18×1018 molecules/cm3 are provided. A lithography pattern is formed with the ultraviolet lithography radiation; the lithography pattern is reduced to produce a reduced lithography pattern; and the reduced lithography pattern is projected onto a ultraviolet radiation sensitive lithography medium to form a printed lithography pattern. At least one of the forming, reducing, and projecting steps includes transmitting the ultraviolet lithography radiation through the high purity fused silica lithography glass. Lithography systems and high purity fused silica lithography glass are also described.

Abstract translation: 公开了平版印刷方法。 在一种这样的方法中，用于产生波长短于约300nm的波长小于10mJ / cm 2 /脉冲的紫外光刻辐射的脉冲紫外辐射源和具有浓度为 提供约0.02×10 18分子/ cm 3和约0.18×10 18分子/ cm 3之间的分子氢。 用紫外光刻法形成光刻图案; 光刻图案被减少以产生减小的光刻图案; 并且将还原的光刻图案投影到紫外线照射敏感光刻介质上以形成印刷光刻图案。 形成，还原和突出步骤中的至少一个步骤包括通过高纯度熔融石英光刻玻璃传输紫外光刻辐射。 还描述了平版印刷系统和高纯度熔融石英光刻玻璃。