公开(公告)号：EP1655270A4

公开(公告)日：2008-07-09

申请号：EP04734356

申请日：2004-05-21

Applicant: SHINETSU QUARTZ PROD ,  HERAEUS QUARZGLAS

Inventor： OHAMA YASUO ,  TOGAWA TAKAYUKI ,  MIZUNO SHIGEO

IPC: C03B29/06 ,  C03B19/09 ,  C03B20/00 ,  C30B15/10

CPC classification number: C03B19/095 ,  C03B2201/03 ,  C30B15/10 ,  Y02P40/57 ,  Y10S65/08 ,  Y10S117/90 ,  Y10T117/10

Abstract: A quartz glass crucible for use in pulling up a silicon single crystal, wherein it has, at least in the curved portion thereof, a three-layer structure comprising a transparent inner layer being composed of a synthetic quartz glass and having a low Al concentration, a transparent or nontransparent intermediate layer being composed of a natural quartz glass or a mixture of natural and synthetic quartz glasses and having a high Al concentration, and a nontransparent outer layer being composed of a natural quartz glass and having an Al concentration higher than that of the intermediate layer. The quartz glass crucible is reduced in the deformation of the transparent inner layer, and allows the suppression of the change in the amount of dissolution of the quartz glass crucible associated with the pull-up of a single crystal and the achievement of the uniform oxygen concentration in the longitudinal direction of a single crystal.

公开(公告)号：EP1858815A1

公开(公告)日：2007-11-28

申请号：EP06708245.3

申请日：2006-02-14

Applicant: Degussa Novara Technology S.p.A.

Inventor： BOARA, Giulio ,  COSTA, Fulvio ,  RÜCKEMANN, Andreas

IPC: C03B19/12 ,  C03B37/016 ,  C03C1/00 ,  C03C3/06 ,  B01J13/00 ,  C01B33/158

CPC classification number: C03B19/12 ,  B01J13/0091 ,  C03B2201/03 ,  C03C1/006 ,  C03C2203/20 ,  C03C2203/26 ,  C03C2203/30 ,  C03C2203/34

Abstract: Process for the production of monoliths of glass by means of the sol-gel process, comprising the following steps: a) dispersion in water of an oxide prepared by the pyrogenic route, b) hydrolysis of an alkoxide in aqueous solution to form a hydrolysate, c) mixing of the hydrolysate of the alkoxide with the oxide prepared by the pyrogenic route to form a colloidal sol, d) optional removal of coarse contents from the colloidal sol, e) gelling of the colloidal sol in a mould, f) replacement of the water contained in the resulting aerogel by an organic solvent, g) drying of the aerogel, h) heat treatment of the dried aerogel.

Abstract translation: 该方法包括以下步骤：a）通过热解途径制备的氧化物在水中的分散，b）醇盐在水溶液中的水解以形成水解产物， c）将醇盐的水解产物与通过热解途径制备的氧化物混合以形成胶体溶胶，d）任选地从胶体溶胶中除去粗颗粒，e）胶体溶胶在模具中胶凝，f） 所得到的气凝胶中含有的有机溶剂中的水，g）气凝胶的干燥，h）干燥后的气凝胶的热处理。

公开(公告)号：EP1735250A2

公开(公告)日：2006-12-27

申请号：EP05732180.4

申请日：2005-04-05

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： SCHREIBER, Andreas ,  KÜHN, Bodo ,  SCHILLING, Franz-Josef ,  ARNOLD, Erich ,  WITZKE, Hans-Dieter

IPC: C03C3/06 ,  C03C4/00 ,  H01J61/30

CPC classification number: C03B19/01 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/23 ,  C03C3/06

Abstract: A conventional method for producing a quartz glass component for a UV radiation source includes melting SiO2 containing grains. The aim of the invention is to provide an improved and inexpensive method which allows for the production of a quartz glass component that is characterized by high radiation resistance. For this purpose, synthetically produced quartz crystals are smelted to give an initial product that consists of quartz glass, and contains hydroxyl groups in a number greater than the number of SiH groups. In order to remove the SiH groups, the initial product is subjected to a tempering step at a temperature of at least 850 °C, thereby obtaining the quartz glass component. The inventive quartz glass component is characterized in that the quartz glass is smelted from synthetically produced quartz crystals and has an SiH group content of less than 5 x 1017 molecules/cm3. The invention also relates to a method for testing the aptitude of a quartz glass component for the use thereof with a UV radiation source.

公开(公告)号：EP1700830A1

公开(公告)日：2006-09-13

申请号：EP05005095.4

申请日：2005-03-09

Applicant: Novara Technology S.R.L.

Inventor： Boara, Guilio ,  Costa, Fulvio ,  Rückemann, Andreas

IPC: C03B19/12 ,  C03B37/016 ,  C03C1/00 ,  C03C3/06 ,  B01J13/00 ,  C01B33/158

CPC classification number: C03B19/12 ,  B01J13/0091 ,  C03B2201/03 ,  C03C1/006 ,  C03C2203/20 ,  C03C2203/26 ,  C03C2203/30 ,  C03C2203/34

Abstract: Process for the production of monoliths of glass by means of the sol-gel process, comprising the following steps:

a) dispersion in water of an oxide prepared by the pyrogenic route,
b) hydrolysis of an alkoxide in aqueous solution to form a hydrolysate,
c) mixing of the hydrolysate of the alkoxide with the oxide prepared by the pyrogenic route to form a colloidal sol,
d) optional removal of coarse contents from the colloidal sol,
e) gelling of the colloidal sol in a mould,
f) replacement of the water contained in the resulting aerogel by an organic solvent,
g) drying of the aerogel,
h) heat treatment of the dried aerogel.

Abstract translation: 通过溶胶 - 凝胶法生产玻璃整体的方法，包括以下步骤：a）通过热解法制备的氧化物在水中的分散，b）在水溶液中水解醇盐以形成水解产物， c）将醇盐的水解产物与通过热解途径制备的氧化物混合以形成胶体溶胶，d）任选地从胶体溶胶中除去粗含量，e）胶体溶胶在模具中的凝胶化，f） 通过有机溶剂包含在所得气凝胶中的水，g）干燥气凝胶，h）干燥气凝胶的热处理。

公开(公告)号：EP1101741B1

公开(公告)日：2005-07-13

申请号：EP00123504.3

申请日：2000-10-27

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： Uebbing, Bruno, Dr. ,  Vydra, Jan, Dr.

IPC: C03C3/06 ,  C03B19/14 ,  C03C4/00

CPC classification number: C03C4/0085 ,  C03B19/1453 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/075 ,  C03C3/06 ,  C03C2201/06 ,  C03C2201/08 ,  C03C2201/23 ,  C03C2203/40 ,  Y10S65/08 ,  Y10S65/16 ,  Y10S501/905

公开(公告)号：EP1386890A3

公开(公告)日：2004-12-15

申请号：EP03017239.9

申请日：2003-07-30

Applicant: Heraeus Quarzglas GmbH & Co. KG ,  Shin-Etsu Quartz Products Co., Ltd.

Inventor： Sato, Tatsuhiro ,  Fujinoki, Akira

IPC: C03B32/00 ,  C03B25/00 ,  C03C15/00 ,  C03C3/06 ,  C30B25/12 ,  C30B31/14

CPC classification number: C03B32/00 ,  C03B25/00 ,  C03B2201/03 ,  C03C3/06 ,  C03C2201/30 ,  C03C2201/50 ,  C03C2201/54 ,  Y02P40/57

Abstract: An object of the present invention is to provide a production method which is low in cost and easily and surely increases surface layer cleanliness (purity) of a quartz glass jig used in semiconductor industry, and to provide a quartz glass jig improved in surface layer cleanliness (purity). The above object is solved in a first embodiment of the invention comprising processing a quartz glass material through various treatments including flame treatment into a desired shape, then annealing it for strain removal, and washing it, whereby the shaped tool is heated at a high temperature falling between 800°C and 1300°C for at least 30 minutes in a clean atmosphere containing HCI gas, the heating step being after it is annealed for strain removal but before being washed. In a second alternative the step of annealing the shaped tool for strain removal is effected in a clean atmosphere containing HCL gas at a temperature falling between 800°C and 1300°C for at least 30 minutes (instead of the heat treatment step in HCL). A quartz glass tool for use in the field of semiconductor industry is obtained showing a total mean concentration of Li, Na, Mg, K, Ca, Fe, Cr, Ni and Cu of at most 1.0 ppm in its surface layer to a depth of at least 100 µm.

Abstract translation: 本发明的目的是提供一种低成本，容易且可靠地提高半导体工业中使用的石英玻璃夹具的表面清洁度（纯度）的制造方法，提供改善表面清洁度的石英玻璃夹具 （纯度）。 上述目的在本发明的第一实施例中得到解决，包括通过包括火焰处理的所需形状的各种处理来处理石英玻璃材料，然后将其退火以进行应变去除并洗涤，由此成形工具被加热 在含有HCl气体的清洁气氛中，在800℃至1300℃之间的高温下降至少30分钟，加热步骤在退火之后进行应变去除，但在洗涤之前。 在第二个替代方案中，用于应变去除的成形工具的退火步骤在含有HCL气体的清洁气氛中在800℃至1300℃的温度下进行至少30分钟（而不是HCL中的热处理步骤） 。 得到在半导体工业领域中使用的石英玻璃工具，其表面层中的Li，Na，Mg，K，Ca，Fe，Cr，Ni和Cu的总平均浓度为1.0ppm以下 至少100亩的深度。

公开(公告)号：EP1413559A1

公开(公告)日：2004-04-28

申请号：EP02741357.4

申请日：2002-06-27

Applicant: M. Watanabe & Co., Ltd. ,  ASAHI DENKA KOGYO KABUSHIKI KAISHA

Inventor： KUSUHARA, Masakio M. WATANABE & CO., LTD. ,  WATANABE, Hiroyuki M. WATANABE & CO., LTD. ,  UEHARA, Hirofumi M. WATANABE & CO., LTD. ,  SANPEI, Keiko M. WATANABE & CO., LTD. ,  KURITA, Naoyasu ASAHI DENKA KOGYO KABUSHIKI KAISHA ,  TADA, Shuichi ASAHI DENKA KOGYO KABUSHIKI KAISHA ,  OMI, Jinichi ASAHI DENKA KOGYO KABUSHIKI KAISHA ,  TAKAHASHI, Makio ASAHI DENKA KOGYO KABUSHIKI K. ,  MORITA, Hiroshi ASAHI DENKA KOGYO KABUSHIKI KAISHA

IPC: C03C3/06

CPC classification number: C03B19/1065 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/23 ,  C03C1/026 ,  C03C3/06 ,  C03C2201/02

Abstract: High purity synthetic quartz glass particles are derived from alkali metal silicate and have a total amount of metal impurities content of at least 1 µg/g and, in particular, have oxygen-deficient defects. The high-purity synthetic quartz glass particles having high viscosity similar to natural quartz and high-purity similar to known synthetic quartz can be provided at a low cost.

Abstract translation: 高纯度合成石英玻璃颗粒来自总金属杂质量为至多1微克/克的碱金属硅酸盐。

公开(公告)号：EP1332116A1

公开(公告)日：2003-08-06

申请号：EP01968806.8

申请日：2001-09-12

Applicant: CORNING INCORPORATED

Inventor： BROWN, John, T ,  DOBBINS, Michael, S ,  HECKLE, Christine, E ,  McLAY, Robert, E ,  MISRA, Mahendra, K ,  POWERS, Dale, R ,  WASILEWSKI, Michael, H

IPC: C03B20/00

CPC classification number: C03B19/1423 ,  C03B19/1415 ,  C03B2201/03 ,  C03B2201/07 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/06 ,  C03B2207/12 ,  C03B2207/20 ,  C03B2207/22 ,  C03B2207/32 ,  C03B2207/36

Abstract: A method for preparing high-purity, bulk fused silica includes supplying silane gas (11), a gaseous fuel (8), and oxygen gas (10B) to a combustion burner (14). A fuel and oxygen mixture (13) is produces when fuel (8) and oxygen gas (10A) in a premixing chamber (12). Nitrogen gas (17A) may also be supplied to the burner (14) which is located in the crown (16) of a furnace (15). Silica particles are formed by passing the silane gas into a flame formed by the combustion reaction of the gaseous fuel with the oxygen gas while maintaining the ratio of the flow rate of the gaseous fuel to the flow rate of the silane gas no less than twelve and the ratio of the flow rate of the gaseous fuel to the flow rate of the oxygen gas no less than three. Silane flow rates are controlled with a mass flow controller (51) and the flow of other gasses is monitored with flow meters (49). The silica particles formed are immediately deposited onto a hot bait (18) inside a containment vessel (21) to form a boule (19).

公开(公告)号：EP1256547A1

公开(公告)日：2002-11-13

申请号：EP00987771.3

申请日：2000-12-28

Applicant: M. Watanabe & Co., Ltd. ,  ASAHI DENKA KOGYO KABUSHIKI KAISHA

Inventor： SUGIYAMA, Kunio Asahi Denka Kogyo Kabushiki Kaisha ,  TADA, Shuichi Asahi Denka Kogyo Kabushiki Kaisha ,  OMI, Jinichi Asahi Denka Kogyo Kabushiki Kaisha ,  NAKADA, Tadahiro Asahi Denka Kogyo Kab. Kaisha ,  MORITA, Hiroshi Asahi Denka Kogyo Kabushiki Kaisha ,  KUSUHARA, Masaki M. Watanabe & Co., Ltd. ,  WATANABE, Hiroyuki M. Watanabe & Co., Ltd. ,  UEHARA, Hirofumi M. Watanabe & Co., Ltd. ,  SANPEI, Keiko M. Watanabe & Co., Ltd.

IPC: C01B33/18 ,  C03B20/00

CPC classification number: C03B19/1065 ,  C01B33/16 ,  C03B2201/03 ,  C03B2201/04 ,  C03C1/006

Abstract: A hydrous silica gel is dehydrated by freezing, thawing, and removing water separated by thawing, thereby yielding silica particles. In addition, the silica particles thus formed is washed and fired, thereby producing a synthetic quartz glass power.
A water glass is dealkalized, an oxidizing agent and an acid are added, the mixture thus formed is passed through a hydrogen type cation exchange resin, the aqueous silica ,solution thus formed is then gelled, and the gelled material is then washed and fired, thereby producing a synthetic quartz powder.
Silica is sequentially held for a predetermined time at each temperature range of 150 to 400°C, 500 to 700°C, and 1,100 to 1,300°C, thereby producing a quartz glass.

Abstract translation: 含水硅胶通过冷冻，解冻，并除去解冻分离的水，由此得到的二氧化硅颗粒脱水。 此外，由此形成的二氧化硅颗粒进行洗涤和煅烧，由此制造合成石英玻璃的功率。 甲水玻璃脱碱到氧化剂和上酸的添加，由此形成通过氢型阳离子交换树脂通过的混合物中，wässrige二氧化硅，溶液然后将这样形成凝胶化，凝胶状材料然后洗涤并焙烧， 由此产生的合成石英粉。 二氧化硅在各温度范围的150〜400℃，500至700℃，和1100〜1300℃保持按顺序在预定时间内，由此产生的石英玻璃。

公开(公告)号：EP1242324A1

公开(公告)日：2002-09-25

申请号：EP00961725.9

申请日：2000-09-08

Applicant: CORNING INCORPORATED

Inventor： KOTACSKA, Lawrence, H. ,  PAVLIK, Robert, S., Jr.

IPC: C03B37/018 ,  C03B37/01

CPC classification number: C04B35/10 ,  C03B19/1407 ,  C03B2201/02 ,  C03B2201/03 ,  C03B2201/07 ,  C03B2201/42 ,  C03B2207/32 ,  C03B2207/50 ,  F27B9/26 ,  F27B17/00 ,  F27D1/0006 ,  F27D1/0043 ,  F27D3/0033

Abstract: An article of relatively pure silica, and a furnace (50) and method of producing the article. The article is produced by collecting molten silica particles (30) in a refractory furnace (50) in which at least a portion of the refractory (32) has been exposed to a halogen-containing gas to react with contaminating metal ions in the refractory (32).