公开(公告)号：US20030096693A1

公开(公告)日：2003-05-22

申请号：US10298924

申请日：2002-11-19

Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.

Inventor： Yuichi Ohga ,  Tadashi Enomoto

IPC: C03C003/06 ,  C03C003/112

CPC classification number: C03C23/0025 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2207/30 ,  C03B2207/32 ,  C03B2207/36 ,  C03B2207/70 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2203/54

Abstract: Fluorine-containing glass which comprises silica and contains, in said silica, not more than 10 ppm of OH group, not more than 10 ppm of Cl and not less than 1000 ppm of F, said fluorine-containing glass having a concentration ratio of F/Cl of 100 or more. Also disclosed is fluorine-containing glass which contains not more than 10 ppm of OH group, not more than 10 ppm of Cl and not less than 1000 ppm of F, and has a concentration ratio of F/Cl of 1000 or more.

公开(公告)号：US06466365B1

公开(公告)日：2002-10-15

申请号：US09567725

申请日：2000-05-10

Applicant: Robert L. Maier ,  Lisa A. Moore ,  Charlene M. Smith

Inventor： Robert L. Maier ,  Lisa A. Moore ,  Charlene M. Smith

IPC: G02B1314

CPC classification number: C03C17/02 ,  C03B19/1453 ,  C03B19/1461 ,  C03B2201/075 ,  C03B2201/12 ,  C03C3/06 ,  C03C17/3452 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2203/46 ,  G02B1/105 ,  G02B1/14 ,  G02B5/208 ,  G03F7/70958

Abstract: The invention provides coated optical lithography elements and methods of coating optical elements, and particularly optical photolithography elements for use in below 240 nm optical photolithography systems utilizing vacuum ultraviolet light (VUV) lithography wavelengths no greater than about 193 nm, such as VUV projection lithography systems utilizing wavelengths in the 193 nm or 157 nm region. The optical devices manipulate vacuum ultraviolet lithography light less than 250 nm utilizing a deposited silicon oxyfluoride film. The deposited silicon oxyfluoride optical coating assists in the manipulation of incident light and protects the underlying optical materials, layers, and surfaces.

Abstract translation: 本发明提供涂覆光学光刻元件和涂覆光学元件的方法，特别是用于使用不大于约193nm的真空紫外光（VUV）光刻波长的240nm以下的光学光刻系统的光学光刻元件，例如VUV投影光刻系统 利用193nm或157nm区域中的波长。 光学器件利用沉积的氟氧化硅膜操纵小于250nm的真空紫外光刻光。 沉积的氟氧化硅光学涂层有助于对入射光的操纵并保护底层的光学材料，层和表面。

公开(公告)号：US20020144521A1

公开(公告)日：2002-10-10

申请号：US10117228

申请日：2002-04-08

Applicant: ALCATEL

Inventor： Gerard Orcel ,  Marc Nicolardot ,  Jean-Florent Campion

IPC: C03B037/018 ,  C03B037/075

CPC classification number: C03B37/01291 ,  C03B37/01205 ,  C03B37/01892 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20

Abstract: The invention provides a low cost method of manufacturing high capacity preforms by chemical vapor deposition. More particularly, there is described a method of manufacturing an optical fiber preform, which method comprises the steps of providing a substrate tube of silica doped with sufficient chlorine to obtain an OH concentration of less than 100 ppb and doped with sufficient fluorine proportional to the chlorine doping to obtain a refractive index that is lower than that of a natural silica, depositing inner cladding and an optical core inside the substrate tube, collapsing the substrate tube to form a primary preform, and depositing outer cladding of said natural silica on the resulting primary preform. The invention is applicable to manufacturing optical fibers.

Abstract translation: 本发明提供了一种通过化学气相沉积制造高容量预成型件的低成本方法。 更具体地，描述了一种制造光纤预制件的方法，该方法包括以下步骤：提供掺杂足够氯的二氧化硅衬底管，以获得小于100ppb的OH浓度并掺入与氯成正比的足够的氟 掺杂以获得低于天然二氧化硅的折射率，在衬底管内沉积内包层和光学芯，使衬底管折叠以形成初级预制件，并将所述天然二氧化硅的外包层沉积在所得到的初级 预制件。 本发明适用于制造光纤。

公开(公告)号：US20020134111A1

公开(公告)日：2002-09-26

申请号：US09997782

申请日：2001-11-28

Inventor： Lisa A. Moore ,  Charlene M. Smith

IPC: C03C023/00 ,  C03B032/00

CPC classification number: G03F7/70958 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/21 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2203/54 ,  G03F1/60

Abstract: High purity silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a nulldry,null silicon oxyfluoride glass which contains doped O2 molecules and which exhibits very high transmittance and laser transmission durability in the vacuum ultraviolet (VUV) wavelength region. In addition to containing fluorine and having little or no OH content, the inventive silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm contains intersticial O2 molecules which provide improved endurance to laser exposure. Preferably the O2 doped silicon oxyfluoride glass is characterized by having less than 1null1017 molecules/cm3 of molecular hydrogen and low chlorine levels.

Abstract translation: 公开了适用于在低于190nm的VUV波长区域中用于光刻应用的光掩模基板的高纯度氟氧化硅玻璃。 本发明的氟氧化硅玻璃在157nm波长下是透射的，使其特别适用于157nm波长区域的光掩模衬底。 本发明的光掩模衬底是含有掺杂的O 2分子并且在真空紫外（VUV）波长区域中显示非常高的透射率和激光透射耐久性的“干式”氟氧化硅玻璃。 除了含氟并且具有很少或不具有OH含量之外，本发明的适用于157nm的光掩模衬底的氟氧化硅玻璃含有间隔的O 2分子，其提供了对激光曝光的改善的耐久性。 优选地，掺杂氧的氟氧化硅玻璃的特征在于具有小于1×10 17分子/ cm 3的分子氢和低氯水平。

公开(公告)号：US06451719B1

公开(公告)日：2002-09-17

申请号：US09692014

申请日：2000-10-19

Applicant: Shigeru Yamagata

Inventor： Shigeru Yamagata

IPC: C03C306

CPC classification number: G03F7/70958 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/54 ,  Y10S501/905

Abstract: A silica glass optical material for transmitting light with a wavelength of from 155 to 195 nm emitted from an excimer laser or an excimer lamp, which comprises silica glass optical material of ultrahigh purity, containing from 1 to 100 wtppm of OH groups, from 5×1016 to 5×1019 molecules/cm3 of H2, and from 10 to 10,000 wtppm of F, but substantially free from halogens other than F, and having a fluctuation in refractive index, &Dgr;n, of from 3×10−6 to 3×10−7.

Abstract translation: 一种二氧化硅玻璃光学材料，用于从准分子激光或准分子灯发射波长为155至195nm的光，其包括含有1至100重量ppm的OH基团的超高纯度的石英玻璃光学材料，从5×10 16至 5×1019分子/ cm 3的H 2和10至10,000重量ppm的F，但基本上不含F以外的卤素，并且具有3×10 -6至3×10 -7的折射率DELTAn。

公开(公告)号：US20020038557A1

公开(公告)日：2002-04-04

申请号：US09930693

申请日：2001-08-17

Applicant: Shin-Etsu Chemical Co., Ltd.

Inventor： Koji Matsuo ,  Hisatoshi Otsuka ,  Kazuo Shirota ,  Shigeru Maida

IPC: C03B019/14

CPC classification number: C03B19/1453 ,  C03B19/1423 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2207/30 ,  C03B2207/64 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/42 ,  C03C2203/54 ,  Y02P40/57

Abstract: Fluorine-containing synthetic quartz glass is produced by feeding silica-forming material, hydrogen, and oxygen gases from a burner to a reaction zone, flame hydrolyzing the silica-forming material in the reaction zone to form particles of silica, depositing the silica particles on a rotatable substrate in the reaction zone to form a porous silica matrix, and heating and vitrifying the porous silica matrix in a fluorine compound gas-containing atmosphere. During formation of the porous silica matrix, the angle between the center axes of the silica matrix and the silica-forming reactant flame from the burner is adjusted to 90-120null so that the porous silica matrix has a density of 0.1-1.0 g/cm3 with a narrow distribution within 0.1 g/cm3. The resulting quartz glass has a high transmittance to light in the vacuum ultraviolet region below 200 nm.

Abstract translation: 含氟合成石英玻璃是通过将二氧化硅形成材料，氢气和氧气从燃烧器送入反应区而产生的，火焰水解反应区中二氧化硅形成材料，形成二氧化硅颗粒，将二氧化硅颗粒沉积在 反应区中的可旋转基底，形成多孔二氧化硅基质，并在含氟化合物气体的气氛中加热和玻璃化多孔二氧化硅基质。 在形成多孔二氧化硅基体期间，将二氧化硅基体的中心轴线与来自燃烧器的形成二氧化硅的反应物火焰之间的角度调节至90-120°，使得多孔二氧化硅基质的密度为0.1-1.0g / cm3，分布在0.1g / cm3以内。 所得的石英玻璃对于低于200nm的真空紫外线区域的光具有高透射率。

公开(公告)号：US20020037797A1

公开(公告)日：2002-03-28

申请号：US09921137

申请日：2001-08-03

Applicant: Sumitomo Electric Industries, Ltd.

Inventor： Yuichi Ohga ,  Tadashi Enomoto

IPC: C03C003/06

CPC classification number: C03C23/0025 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2207/30 ,  C03B2207/32 ,  C03B2207/36 ,  C03B2207/70 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2203/54

Abstract: Fluorine-containing glass which comprises silica and contains, in said silica, not more than 10 ppm of OH group, not more than 10 ppm of Cl and not less than 1000 ppm of F, said fluorine-containing glass having a concentration ratio of F/Cl of 100 or more. Also disclosed is fluorine-containing glass which contains not more than 10 ppm of OH group, not more than 10 ppm of Cl and not less than 1000 ppm of F, and has a concentration ratio of F/Cl of 1000 or more.

Abstract translation: 含有二氧化硅的含氟玻璃，在所述二氧化硅中含有不超过10ppm的OH基，不超过10ppm的Cl和不小于1000ppm的F，所述含氟玻璃的浓度比为F / Cl为100以上。 还公开了含有不超过10ppm的OH基，不超过10ppm的Cl和不小于1000ppm的F，并且具有1000或更大的F / Cl的浓度比的含氟玻璃。

公开(公告)号：US20020000104A1

公开(公告)日：2002-01-03

申请号：US09843838

申请日：2001-04-30

Applicant: Sumitomo Electric Industries, Ltd.

Inventor： Hideyuki Ijiri ,  Kouichi Uchiyama ,  Toshio Danzuka ,  Tomonori Kashiwada

IPC: C03B037/10

CPC classification number: C03B37/01228 ,  C03B37/01211 ,  C03B37/0124 ,  C03B37/01248 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2203/22 ,  C03C25/68 ,  G02B6/02261 ,  G02B6/02285 ,  G02B6/03644

Abstract: The present invention relates to a method of making a preform which can restrain each member from deforming at the time of making, and a method of making an optical fiber with a smaller polarization mode dispersion by utilizing this preform. In the method of making a preform, the collapsing step carried out when making the preform is divided into at least two stages composed of a first step of forming a first collapsed body by collapsing a core rod member and a first cladding tube member, and a second step of forming a new collapsed body by collapsing the first collapsed body and a second cladding tube member. Also, in at least the first step, the collapsed body obtained is elongated, whereas such a plurality of stages of collapsing step and elongation of the resulting collapsed body reduce the outer diameter ratio of the outer member to the inner member to be collapsed, whereby the deformation resulting from the heating at the time of a single collapsing operation and the like is hard to occur. In an optical fiber obtained from thus manufactured preform, the core and cladding are effectively restrained from becoming noncircular, whereby the polarization mode dispersion characteristic, which becomes important in communications based on a WDM system, is improved in particular.

Abstract translation: 本发明涉及制造能够抑制每个构件在制造时变形的预成型件的方法，以及通过利用该预制件制造具有较小偏振模色散的光纤的方法。 在制造预成型体的方法中，将制造预成型体时的折叠工序分为至少两个阶段，所述至少两个阶段是通过使芯棒部件和第一包层管部件收缩而形成第一折叠体的第一工序， 通过使第一折叠体和第二包层管构件折叠来形成新的收缩体的第二步骤。 此外，在至少第一步骤中，所获得的塌陷体是细长的，而所得到的塌缩体的这种多个塌陷阶段和伸长阶段减小了外部构件与内部构件的外径比，以使其塌缩，由此 在单次的折叠作业等时由加热引起的变形难以发生。 在由这样制造的预成型体获得的光纤中，芯和包层被有效地抑制成非圆形，从而特别地改善了在基于WDM系统的通信中变得重要的偏振模色散特性。

公开(公告)号：US20010017042A1

公开(公告)日：2001-08-30

申请号：US09789744

申请日：2001-02-22

Inventor： Shigeru Maida ,  Motoyuki Yamada ,  Hisatoshi Otsuka ,  Kazuo Shirota ,  Koji Matsuo

IPC: C03B020/00

CPC classification number: C03B19/1453 ,  C03B19/1415 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2207/32 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2203/40 ,  C03C2203/46 ,  C03C2203/54 ,  Y02P40/57

Abstract: Synthetic quartz glass is produced by feeding a silica-forming raw material gas, hydrogen gas, oxygen gas and a fluorine compound gas from a burner to a reaction zone, flame hydrolyzing the silica-forming raw material gas in the reaction zone to form fine particles of fluorine-containing silica, depositing the silica fine particles on a rotatable substrate in the reaction zone so as to create a fluorine-containing porous silica matrix, and heat vitrifying the porous silica matrix in a fluorine compound gas-containing atmosphere. This process enables the low-cost manufacture of a synthetic quartz glass having a higher and more uniform transmittance to light in the vacuum ultraviolet region than has hitherto been achieved.

Abstract translation: 合成石英玻璃是通过将来自燃烧器的二氧化硅形成原料气体，氢气，氧气和氟化合物气体从反应区域供给到反应区域而进行的，在反应区域中对二氧化硅形成原料气体进行火焰水解而形成微粒子 的含氟二氧化硅，将二氧化硅微粒沉积在反应区中的可旋转基板上，以产生含氟多孔二氧化硅基质，并在含氟化合物气体的气氛中对多孔二氧化硅基质进行玻璃化。 该方法使得能够低成本地制造与迄今为止已经实现的在真空紫外区域中对于光的透射率更高且更均匀的合成石英玻璃。

公开(公告)号：US5616159A

公开(公告)日：1997-04-01

申请号：US422104

申请日：1995-04-14

Applicant: Roger J. Araujo ,  Nicholas F. Borrelli ,  Christine L. Hoaglin ,  Charlene Smith

Inventor： Roger J. Araujo ,  Nicholas F. Borrelli ,  Christine L. Hoaglin ,  Charlene Smith

IPC: C03B8/04 ,  C03B19/14 ,  C03B20/00 ,  C03C3/06 ,  C03C4/00 ,  C03B19/01

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/32 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/54 ,  Y10S501/90 ,  Y10S501/905

Abstract: High purity fused silica glass which is highly resistant to optical damage by ultraviolet radiation in the laser wavelength of about 300 nm or shorter is produced. In particular, a fused silica optical member or blank exhibits substantially no optical damage up to 10.sup.7 pulses (350 mJ/cm.sup.2) at the KrF laser wavelength region of about 248 nm, and at the ArF laser wavelength region of about 193 nm.

Abstract translation: 产生高纯度熔融石英玻璃，其在约300nm或更短的激光波长下通过紫外线辐射高度抵抗光学损伤。 特别地，熔融石英光学构件或坯料在约248nm的KrF激光波长区域和约193nm的ArF激光波长区域基本上不表现出至多107个脉冲（350mJ / cm 2）的光学损伤。