公开(公告)号：US20070207911A1

公开(公告)日：2007-09-06

申请号：US11747698

申请日：2007-05-11

Applicant: Akio KOIKE ,  Yasutomi Iwahashi ,  Noriaki Shimodaira ,  Shinya Kikugawa ,  Naoki Sugimoto

Inventor： Akio KOIKE ,  Yasutomi Iwahashi ,  Noriaki Shimodaira ,  Shinya Kikugawa ,  Naoki Sugimoto

IPC: C03C3/06 ,  C03B19/06

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B19/1484 ,  C03B2201/21 ,  C03B2201/42 ,  C03C17/40 ,  C03C2201/21 ,  C03C2201/42 ,  G03F7/70958

Abstract: Conventional TiO2—SiO2 glass contains hydrogen atoms substantially, and during deposition under ultrahigh vacuum condition, the hydrogen molecules will diffuse in the chamber, and H2 molecules will be taken into a film thereby formed. Hydrogen molecules will readily diffuse, and the optical characteristics of the multilayer film are likely to be thereby changed. In an optical material for EUV lithography, a multilayer film is coated by ion beam sputtering on a silica glass having a TiO2 concentration of from 3 to 12 mass % and a hydrogen molecule content of less than 5×1017 molecules/cm3 in the glass.

Abstract translation: 常规的TiO 2 -SiO 2 SiO 2玻璃基本上含有氢原子，并且在超高真空条件下沉积期间，氢分子将在室中扩散，并且H 2 < / SUB>分子将被吸收到由此形成的膜中。 氢分子将容易扩散，并且可能由此改变多层膜的光学特性。 在用于EUV光刻的光学材料中，通过离子束溅射在具有3至12质量％的TiO 2浓度和小于5×10 5质量％的氢分子含量的二氧化硅玻璃上涂覆多层膜， SUP> 17分子/ cm 3在玻璃中。

公开(公告)号：US20060276323A1

公开(公告)日：2006-12-07

申请号：US11435887

申请日：2006-05-18

Applicant: Yasutomi Iwahashi ,  Akio Koike

Inventor： Yasutomi Iwahashi ,  Akio Koike

IPC: C03C3/06

CPC classification number: C03C3/06 ,  C03B19/1415 ,  C03B19/1453 ,  C03B2201/12 ,  C03B2201/42 ,  C03B2207/30 ,  C03C2201/12 ,  C03C2201/42 ,  C03C2203/44 ,  C03C2203/50 ,  C03C2203/54

Abstract: A silica glass containing from 3 to 10 mass % of TiO2, which has a coefficient of thermal expansion from 0 to 100° C., i.e. CTE0 to 100, of 0±300 ppb/° C. and an internal transmittance per mm in thickness within a wavelength region of from 200 to 700 nm, i.e. T200 to 700, of at most 80%.

Abstract translation: 含有3〜10质量％的TiO 2的二氧化硅玻璃，其热膨胀系数为0〜100℃，即CTE 0〜100℃ 0〜300ppb /℃，在200〜700nm的波长区域内的每mm厚度的内部透射率，即200〜700℃，为80％以下。

公开(公告)号：US06988377B2

公开(公告)日：2006-01-24

申请号：US10302347

申请日：2002-11-22

Applicant: James J. Bernas ,  Bradley F. Bowden ,  Kenneth E. Hrdina

Inventor： James J. Bernas ,  Bradley F. Bowden ,  Kenneth E. Hrdina

IPC: C03B19/06

CPC classification number: C03C3/06 ,  B33Y80/00 ,  C03B19/06 ,  C03B2201/42 ,  C03C2201/42 ,  C03C2203/10

Abstract: A method for forming EUV LITHOGRAPHY GLASS STRUCTURES WITH VOIDS is disclosed which includes forming a slurry mixture including silica soot particles, and inserting the slurry mixture into a casting mold. The method provides low weight mass reduced rigid glass structures with beneficial thermal stability. The casting mold includes therein a casting form. The casting form is adapted to provide selected geometry void spaces within the glass lithography structure. The slurry mixture is dried to form a green ware object. The casting form is removed from the green ware and the green ware object is consolidated into a lithography glass structure with voids.

公开(公告)号：US20050272590A1

公开(公告)日：2005-12-08

申请号：US11172950

申请日：2005-07-05

Applicant: Yasutomi Iwahashi ,  Akio Koike

Inventor： Yasutomi Iwahashi ,  Akio Koike

IPC: C03B8/04 ,  C03B19/14 ,  C03B20/00 ,  C03B37/014 ,  C03C3/06 ,  C03C3/112 ,  C03C4/00 ,  G03F1/22 ,  G03F1/24 ,  H01L21/027 ,  C03C3/076 ,  C03B19/06 ,  C03B37/018

CPC classification number: C03B19/1415 ,  C03B19/1461 ,  C03B2201/12 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/40 ,  C03C2203/54

Abstract: A silica glass containing TiO2, which has a fictive temperature of at most 1,200° C., a F concentration of at least 100 ppm and a coefficient of thermal expansion of 0±200 ppb/° C. from 0 to 100° C. A process for producing a silica glass containing TiO2, which comprises a step of forming a porous glass body on a target quartz glass particles obtained by flame hydrolysis of glass-forming materials, a step of obtaining a fluorine-containing porous glass body, a step of obtaining a fluorine-containing vitrified glass body, a step of obtaining a fluorine-containing formed glass body and a step of carrying out annealing treatment.

Abstract translation: 含有TiO 2的二氧化硅玻璃，其具有至多1200℃的假想温度，至少100ppm的F浓度和0±200ppb /℃的热膨胀系数。 0至100℃。一种制备含有TiO 2的石英玻璃的方法，其包括在通过玻璃形成材料的火焰水解获得的目标石英玻璃颗粒上形成多孔玻璃体的步骤 ，获得含氟多​​孔玻璃体的步骤，获得含氟玻璃化玻璃体的步骤，获得含氟成形玻璃体的步骤和进行退火处理的步骤。

公开(公告)号：US20050245383A1

公开(公告)日：2005-11-03

申请号：US11174533

申请日：2005-07-06

Applicant: Yasutomi Iwahashi ,  Akio Koike

Inventor： Yasutomi Iwahashi ,  Akio Koike

IPC: C03B20/00 ,  C03B19/14 ,  C03C3/06 ,  C03C4/00

CPC classification number: C03C3/06 ,  C03B19/1484 ,  C03B2201/42 ,  C03C4/0085 ,  C03C2201/42

Abstract: A silica glass containing TiO2, characterized in that the fluctuation of the refractive index (Δn) is at most 2×10−4 within an area of 30 mm×30 mm in at least one plane. A silica glass containing TiO2, characterized in that the TiO2 concentration is at least 1 mass %, and the striae pitch is at most 10 μm. An optical material for EUV lithography, characterized in that it is made of a silica glass containing TiO2, and the fluctuation of the refractive index (Δn) is at most 2×10−4 in a plane perpendicular to the incident light direction. An optical material for EUV lithography, characterized in that it is made of a silica glass containing TiO2, wherein the TiO2 concentration is at least 1 mass %, and the difference between the maximum value and the minimum value of the TiO2 concentration is at most 0.06 mass % in a plane perpendicular to the incident light direction.

Abstract translation: 含有TiO 2的二氧化硅玻璃，其特征在于，在30mm×30mm的区域内，折射率（Deltan）的波动至多为2×10 -4〜 飞机 含有TiO 2的二氧化硅玻璃，其特征在于TiO 2浓度为1质量％以上，条纹间距为10μm以下。 一种用于EUV光刻的光学材料，其特征在于其由含有TiO 2的二氧化硅玻璃制成，并且折射率（Deltan）的波动为至多2×10 -4 >垂直于入射光方向的平面。 一种用于EUV光刻的光学材料，其特征在于其由含有TiO 2的二氧化硅玻璃制成，其中TiO 2浓度为至少1质量％，并且差异 在垂直于入射光方向的平面中，TiO 2 2 浓度的最大值和最小值之间的浓度至多为0.06质量％。

公开(公告)号：US20040250573A1

公开(公告)日：2004-12-16

申请号：US10826078

申请日：2004-04-16

Inventor： Hrabanus Hack ,  Joerg Schuhmacher ,  Matthias Schmidt ,  Andreas Menzel

IPC: C03B019/06

CPC classification number: C03C4/0085 ,  C03B19/1407 ,  C03B19/1415 ,  C03B19/1469 ,  C03C3/06 ,  C03C2201/06 ,  C03C2201/42 ,  Y02P40/57

Abstract: A process for manufacturing glass bodies of doped silicate glass is disclosed. The process involves flame hydrolysis, wherein precursors for the forming of the doped glass are fed together with fuel gases into a single burner. A first formed body is generated on a target. The doped silicate glass produced in this way offers a low density of defects and a small breadth of striae. Preferably the first formed body is subsequently formed into a second formed body having a larger breadth and a smaller length than the first formed body. Thereby, the breadth of striae and the density of defects in the doped silica glass is further reduced.

Abstract translation: 公开了一种用于制造掺杂硅酸盐玻璃的玻璃体的方法。 该方法涉及火焰水解，其中用于形成掺杂玻璃的前体与燃料气体一起进料到单个燃烧器中。 在目标上产生第一成形体。 以这种方式生产的掺杂硅酸盐玻璃提供低密度的缺陷和小的条纹。 优选地，第一成形体随后形成具有比第一成形体更大的宽度和更小的长度的第二成形体。 因此，掺杂石英玻璃中的条纹宽度和缺陷密度进一步降低。

公开(公告)号：US20030232149A1

公开(公告)日：2003-12-18

申请号：US10372411

申请日：2003-02-25

Applicant: DEGUSA AG

Inventor： Monika Oswald ,  Klaus Deller ,  Helmut Mangold ,  Gerrit Schneider ,  Rolf Clasen ,  Markus Hornfeck

IPC: C23C004/10

CPC classification number: C01B33/1417 ,  C03C1/02 ,  C03C3/06 ,  C03C3/076 ,  C03C2201/42 ,  Y10S501/90

Abstract: Aqueous dispersion comprising silicon/titanium mixed oxide powder with a BET surface area of 5 to 500 m2/g which has been prepared by flame hydrolysis and has a titanium dioxide content of 0.5 to 20 wt. %, based on the powder, water and at least one pH-regulating substance which can be removed completely from the reaction mixture on heating, the aqueous dispersion having a solids content of between 40 and 80 wt. %. A green body produced therefrom with a green density of between 40 and 85%. A shaped glass article of optical quality with a coefficient of thermal expansion of not more than 0.5null10null6/K produced from the green body.

Abstract translation: 含有BET表面积为5〜500m 2 / g的硅/钛混合氧化物粉末的水分散体，其通过火焰水解制备，二氧化钛含量为0.5〜20重量％。 ％，基于粉末，水和至少一种pH调节物质，其可以在加热时从反应混合物中完全除去，水分散体的固体含量为40-80重量％。 ％。 由其生产的生坯，其生坯密度在40％至85％之间。 由绿色体制成的具有不大于0.5×10 -6 / K的热膨胀系数的光学品质的成形玻璃制品。

公开(公告)号：US20020157419A1

公开(公告)日：2002-10-31

申请号：US10137098

申请日：2002-05-01

Inventor： Rahul Ganguli ,  Enrico C.J. Westenberg

IPC: C03B008/02

CPC classification number: C03C3/06 ,  C03B19/12 ,  C03C2201/02 ,  C03C2201/32 ,  C03C2201/3476 ,  C03C2201/36 ,  C03C2201/40 ,  C03C2201/42 ,  C03C2203/22 ,  C03C2203/26 ,  C03C2203/34

Abstract: An improved sol-gel process is disclosed for producing a synthetic silica glass article, in which a sol is formed having a silica loading as high as 34 to 40%. This high loading is achieved by introducing an aqueous colloidal silica suspension into a silicon alkoxide solution and slowly stirring the mixture together, during which time the mixture hydrolyzes and the colloidal suspension is broken down by chemical reaction. This produces a hydrolyzed sol incorporating a suspension of very fine aggregates of colloidal particles, having particle sizes less than about 10 microns. The need for a stabilizing agent and/or continuous ultra-sonicating or violently stirring the sol is eliminated.

Abstract translation: 公开了一种改进的溶胶 - 凝胶法，用于生产合成石英玻璃制品，其中形成具有高达34至40％的二氧化硅载量的溶胶。 通过将水性胶体二氧化硅悬浮液引入硅烷醇溶液中并缓慢搅拌混合物来实现该高负载，在此期间混合物水解，并且胶体悬浮液通过化学反应分解。 这产生了一种水合溶胶，其结合了非常细的胶体颗粒聚集体的悬浮液，其具有小于约10微米的粒度。 消除了对稳定剂和/或连续超声波或剧烈搅拌溶胶的需要。

公开(公告)号：US20020026810A1

公开(公告)日：2002-03-07

申请号：US09794251

申请日：2001-02-28

Inventor： Rolf Clasen ,  Helmut Mangold ,  Klaus Deller ,  Gerrit Schneider ,  Christine Wagner

IPC: C03B008/00

CPC classification number: C03C23/0095 ,  C03C3/06 ,  C03C3/076 ,  C03C2201/42

Abstract: SiO2nullTiO2 glasses having a low coefficient of thermal expansion are produced by a molding being produced that consists of SiO2 powder, SiO2nullTiO2 powder or TiO2 powder and that contains by way of secondary component a titanium-containing component which is converted into amorphous TiO2.

Abstract translation: 通过由SiO 2粉末，SiO 2 -TiO 2粉末或TiO 2粉末组成的成型体制造具有低热膨胀系数的SiO 2 -TiO 2玻璃，并且通过次要组分含有钛成分转化为无定形TiO 2 。

公开(公告)号：US20010047665A1

公开(公告)日：2001-12-06

申请号：US09850709

申请日：2001-05-07

Applicant: Zenastra Photonics Inc.

Inventor： Zhiyi Zhang ,  Gaozhi Xiao ,  Guang Pan ,  Pinqing Zhang ,  Ming Zhou

IPC: C03C003/06

CPC classification number: C03C4/0042 ,  C03C1/006 ,  C03C1/008 ,  C03C3/06 ,  C03C17/25 ,  C03C2201/22 ,  C03C2201/31 ,  C03C2201/32 ,  C03C2201/3476 ,  C03C2201/40 ,  C03C2201/42 ,  C03C2203/26 ,  C03C2217/213 ,  C03C2217/24 ,  C03C2218/113

Abstract: Deuterium oxide, D2O, also called heavy water, is used for the hydrolysis of silanes and metal compounds. The D2O-hydrolyzed silanes polycondense much easier than H2O-hydrolyzed silanes, resulting in a fast SinullOnullSi network build up. The most important feature of using D2O is that the final materials are 100% free of OnullH and the residual OnullD bond does not have an absorption peak in the wavelength range of 1.0 to 1.8 nullm, which is crucial in reducing optical loss at the wavelengths of 1.3 and especially 1.55 nullm. OnullH free sol-gel materials with low optical loss have been developed based on this process. D2O may be applied in all kinds of hydrolysis-processes, such as the sol-gel process of silanes and metal compounds, the synthesis of polysiloxane, and may be extended to other silica and metal-oxides deposition processes for example, flame hydrolysis deposition (FHD) whenever water is used or OnullH bond involved. The concept of replacing OnullH bond with OnullD bond is applicable to any OnullH bond containing materials used in optical based telecommunication.

Abstract translation: 氧化氘（D2O）也被称为重水，用于水解硅烷和金属化合物。 D2O水解的硅烷聚缩醛比H2O水解的硅烷容易得多，导致快速的Si-O-Si网络积聚。 使用D2O最重要的特征是最终的材料是100％不含OH，并且残留的OD键在1.0-1.8μm的波长范围内不具有吸收峰，这对减少波长的光损耗至关重要 1.3，特别是1.55。 基于该方法开发了具有低光损耗的O-H游离溶胶凝胶材料。 D2O可以应用于各种水解过程，如硅烷和金属化合物的溶胶 - 凝胶法，聚硅氧烷的合成，并可扩展到其他二氧化硅和金属氧化物沉积工艺，例如火焰水解沉积（ FHD）每当使用水或涉及OH键时。 用O-D键替代O-H键的概念适用于光通信中使用的任何含O-H键的材料。