単結晶シリコン引き上げ用シリカ容器及びその製造方法
    251.
    发明申请
    単結晶シリコン引き上げ用シリカ容器及びその製造方法 审中-公开
    用于绘制单晶硅的二氧化硅及其生产方法

    公开(公告)号:WO2013171937A1

    公开(公告)日:2013-11-21

    申请号:PCT/JP2013/000890

    申请日:2013-02-19

    Inventor: 山形 茂

    Abstract:  本発明は、内側に透明シリカガラスから成る透明層を有し、外側に気泡を含有する不透明シリカガラスから成る不透明層を有する単結晶シリコン引き上げ用シリカ容器であって、前記透明層が、前記シリカ容器の内表面側に位置し、OH基を200~2000massppmの濃度で含有する高OH基層と、該高OH基層よりもOH基濃度が低い低OH基層とから成り、前記高OH基層がBaを50~2000massppmの濃度で含有するものである単結晶シリコン引き上げ用シリカ容器である。これにより、単結晶シリコン引き上げ用にシリカ容器を用いた場合に、該容器使用開始後短時間のうちに該容器の透明シリカガラスから成る内側表面の全面が微細結晶化(グラスセラミックス化)することにより、該容器内側表面のシリコン融液に対する耐エッチング性(耐侵食性)を大幅に向上させるようなシリカ容器、及び、そのようなシリカ容器の製造方法が提供される。

    Abstract translation: 这种二氧化硅容器用于制造单晶硅,并且在内部具有包括透明石英玻璃的透明层,并且在外部具有包含含有气泡的不透明石英玻璃的不透明层。 透明层位于二氧化硅容器的内表面侧,并且包含OH基浓度为200-2000质量ppm的OH基团和OH基浓度低于OH基浓度的低OH基层的高OH基层。 的高OH基层,高OH基层含有Ba的50-2000质量ppm的浓度。 结果,提供了:二氧化硅容器,使得当二氧化硅容器用于制备单晶硅时,容器内表面相对于熔融硅的耐腐蚀性(耐侵蚀性)通过整个 包含容器的透明石英玻璃的内表面的表面在容器使用开始后的短时间内被微晶化(玻璃化); 以及这种二氧化硅容器的制造方法。

    PRODUCTION OF A SELF-SUPPORTING GLASS FILM
    252.
    发明申请
    PRODUCTION OF A SELF-SUPPORTING GLASS FILM 审中-公开
    生产自支撑玻璃膜

    公开(公告)号:WO2007112351A2

    公开(公告)日:2007-10-04

    申请号:PCT/US2007064930

    申请日:2007-03-26

    Inventor: KASAI TOSHIHIRO

    CPC classification number: C03B19/12 C03C1/008 C03C3/06 C03C2201/02 C03C2203/22

    Abstract: A process for the production of a self-supporting glass film is described. The method includes the steps of preparing a mixture containing a colloidal silica sol, at least one alkanolamine organic additive and an organic binder; coating the mixture onto a base material; drying the coated mixture to form a precursor film on the base material; releasing the precursor film from the base material; and firing the released precursor film to form a self-supporting glass film. Self-supporting glass films produced by the disclosed process are also described.

    Abstract translation: 描述了用于生产自支撑玻璃膜的方法。 该方法包括以下步骤:制备含有胶体二氧化硅溶胶,至少一种链烷醇胺有机添加剂和有机粘合剂的混合物; 将混合物涂覆到基材上; 干燥涂布的混合物以在基材上形成前体膜; 从基材释放前体膜; 并烧制释放的前体膜以形成自支撑玻璃膜。 还描述了通过公开的方法生产的自支撑玻璃膜。

    合成石英ガラスの製造方法及び合成石英ガラス体
    253.
    发明申请
    合成石英ガラスの製造方法及び合成石英ガラス体 审中-公开
    合成石英玻璃和合成石英玻璃制品的生产方法

    公开(公告)号:WO2004050570A1

    公开(公告)日:2004-06-17

    申请号:PCT/JP2003/015272

    申请日:2003-11-28

    Abstract: 第一に、不純物が少なく且つ天然石英ガラスと同等以上の高温粘度特性を有し、高温環境下にあっても変形し難い合成石英ガラスの製造方法、特に発泡が無く緻密な高耐熱性合成石英ガラスの製造方法を提供する。第二に、本発明の製造方法により容易に得られる高耐熱性合成石英ガラス体、特に、発泡が無く緻密、赤外線吸収率及び放出率が高い、またアルカリ金属拡散防止効果が極めて高い透明又は黒色石英ガラス体を提供する。 245nmの吸収係数が0.05cm −1 以上である高耐熱性石英ガラス体を製造する方法であって、シリカ多孔質体を、還元処理した後、焼成して緻密なガラス体とするようにした。

    Abstract translation: 一种制造在245nm以上的吸收系数为0.05cm -1以上的合成石英玻璃的制造方法,其特征在于,对多孔二氧化硅材料进行还原处理,然后烧成所得产物,从而形成致密的玻璃 文章; 和具有降低的杂质含量的透明或黑色合成石英玻璃,显示与天然石英玻璃相同或优于其的高温粘度特性即使在高温气氛中也不易变形,显示出高的 对于红外线的吸光度和高发射率,并且对于防止碱金属的扩散,特别是不含气泡的致密且高耐热的合成石英玻璃的扩散具有极高的效果。 该方法容易地生产上述合成石英玻璃。

    高純度石英粉およびその製造方法並びにガラス成型体
    254.
    发明申请
    高純度石英粉およびその製造方法並びにガラス成型体 审中-公开
    高纯度石墨粉及其生产方法,以及粉末形成的玻璃制品

    公开(公告)号:WO2003008332A1

    公开(公告)日:2003-01-30

    申请号:PCT/JP2002/007322

    申请日:2002-07-18

    Abstract: A quartz powder, preferably, a synthetic quartz powder prepared by the sol−gel method, which while heated from room temperature to 1700˚C, generates a gas containing CO and CO 2 in amounts of 300 nanoliter/g or less and 30 nanoliter/g or less, respectively; a method for preparing the quartz powder; and a formed glass article prepared by melting the quartz powder and forming the resultant molten quartz. The quartz powder has extremely high purity and quality and the formed glass article contains an extremely small amount of foam.

    Abstract translation: 优选石英粉末,优选通过溶胶 - 凝胶法制备的合成石英粉末,其在室温至1700℃下加热,产生含有300纳升/分钟的CO和CO 2气体的气体, g以下,30纳升/ g以下。 制备石英粉的方法; 以及通过熔融石英粉末并形成所得熔融石英制备的成形玻璃制品。 石英粉具有非常高的纯度和质量,并且形成的玻璃制品含有极少量的泡沫。

    SOL-GEL PROCESS FOR PRODUCING SYNTHETIC SILICA GLASS
    255.
    发明申请
    SOL-GEL PROCESS FOR PRODUCING SYNTHETIC SILICA GLASS 审中-公开
    用于生产合成二氧化硅玻璃的溶胶凝胶工艺

    公开(公告)号:WO01053225A1

    公开(公告)日:2001-07-26

    申请号:PCT/US2001/002325

    申请日:2001-01-23

    Abstract: An improved sol-gel process is disclosed for producing a synthetic silica glass article, in which a sol is formed having a silica loading as high as 34 to 40 %. This high loading is achieved by introducing an aqueous colloidal silica suspension into a silicon alkoxide solution and slowly stirring the mixture together, during which time the mixture hydrolyzes and the colloidal suspension is broken down by chemical reaction. This produces a hydrolyzed sol incorporating a suspension of very fine aggregates of colloidal particles, having particle sizes less than about 10 microns. The need for a stabilizing agent and/or continuous ultra-sonicating or violently stirring the sol is eliminated. One application of the process of the invention is in making silica photoblanks exhibiting very high optical transmission at UV wavelengths. For such applications, the silica powder is purified using a chlorination step prior to its being made into the aqueous colloidal silica suspension. In addition, warpage of the silica photoblanks is avoided by using silicon carbide plates as weights during sintering.

    Abstract translation: 公开了一种改进的溶胶 - 凝胶法,用于生产合成石英玻璃制品,其中形成具有高达34至40%的二氧化硅载量的溶胶。 通过将水性胶体二氧化硅悬浮液引入硅醇溶液中并缓慢搅拌混合物来实现该高负载,在此期间混合物水解,并且胶体悬浮液通过化学反应分解。 这产生了一种水合溶胶,其结合了非常细的胶体颗粒聚集体的悬浮液,其具有小于约10微米的粒度。 消除了对稳定剂和/或连续超声波或剧烈搅拌溶胶的需要。 本发明方法的一个应用是使二氧化硅photoblank在UV波长下表现出非常高的光学透射率。 对于这种应用,二氧化硅粉末在制成水性胶体二氧化硅悬浮液之前,使用氯化步骤进行纯化。 此外,通过在烧结期间使用碳化硅板作为重量来避免二氧化硅照相片的翘曲。

    QUARTZ GLASS CRUCIBLE AND METHOD FOR THE PRODUCTION THEREOF
    256.
    发明申请
    QUARTZ GLASS CRUCIBLE AND METHOD FOR THE PRODUCTION THEREOF 审中-公开
    石英玻璃坩埚和方法进行生产

    公开(公告)号:WO01046077A1

    公开(公告)日:2001-06-28

    申请号:PCT/EP2000/012686

    申请日:2000-12-14

    Abstract: The invention relates to a crucible characterized in that said crucible is of high purity and high opacity or exhibits low transmission characteristics in the IR range and is derived from a quartz glass crucible known in prior art. Said crucible known in prior art has a crucible body which is symmetrical about a rotational axis and said body is made of opaque quartz glass, whereby the crucible has an outer zone (3) made of opaque quartz glass which projects radially inwards to an inner zone (2) made of transparent quartz glass having a density of at least 2.15 g/cm . The crucible body (1) is made of a synthetic SiO2 granulate with a specific surface (according to BET) in the range of 0.5 m /g to 40 m /g and having a stamp density of at least 0.8 g/cm and is produced from an at least partially porous agglomerate of SiO2 primary particles. A method for producing said quartz glass crucible is characterized according to the invention in that during the production of said crucible, an at least partially porous agglomorate of synthetically produced SiO2 granulate made of SiO2 primary particles is produced having a specific surface (according to BET) in the range of 0.5 m /g to 40 m /g and a stamp density of at least 0.8 g/cm . Heating is performed in such a manner that a vitrification front progresses from the inside to the outside of an inner zone (4) made of transparent quartz glass.

    Abstract translation: 为了从一个已知的石英玻璃坩埚开始与周围不透明石英玻璃的具有外区中的旋转轴坩埚主体对称(3)不透明石英玻璃构成,在内部区域径向向内(2)具有至少2.15克密度透明石英玻璃的 /厘米<3>通过提供一种石英玻璃坩埚,其特征是高纯度,高的不透明度和在IR范围内的低传输,根据它建议将锅体(1)由合成二氧化硅颗粒(具有特定的表面的本发明 /克至40μm<2> / g,且至少为0.8的夯实密度克/厘米<3>,它是由BET在0.5微米<2>的SiO至少部分多孔附聚物2个一次粒子的范围形成的) 被产生。 一种用于制造这样的石英玻璃坩埚的方法是根据本发明的特征在于,合成产生的SiO至少部分多孔附聚物其 2的特征在于<形成一次粒子的SiO> 2 <颗粒使用具有比表面积(按照BET) > /克至40μm<2> / g,且至少为0.8的夯实密度克/厘米<3>在0.5毫升2的范围内,其中所述加热进行,使得内部区域的形成(4) 玻璃化前从内侧向透明石英玻璃的外侧进行。

    METHOD FOR PREPARATION OF SYNTHETIC VITREOUS SILICA AND APPARATUS FOR HEAT TREATMENT
    257.
    发明申请
    METHOD FOR PREPARATION OF SYNTHETIC VITREOUS SILICA AND APPARATUS FOR HEAT TREATMENT 审中-公开
    合成二氧化硅的制备方法和热处理装置

    公开(公告)号:WO01012566A1

    公开(公告)日:2001-02-22

    申请号:PCT/JP2000/005412

    申请日:2000-08-11

    Abstract: A method for preparation of a synthetic vitreous silica which comprises a first step comprising ejecting a silicon compound together with a combustion gas containing oxygen and hydrogen from a burner, to hydrolyze the silicon compound in an oxyhydrogen flame and form vitreous silica particles, and depositing the silica particles onto a target being opposed to the burner, to thereby produce a transparent synthetic vitreous silica ingot, a second step of heating the silica ingot to a first holding temperature of 900 DEG C or higher and holding it at the temperature, and then cooling it to a temperature of 500 DEG C or less by a temperature-decreasing rate of 10 DEG C/hr or less, and a third step of heating the resultant glass ingot to a second holding temperature of from 500 DEG C to 1100 DEG C and holding it at the temperature, and then cooling it to a temperature 100 DEG C lower than the second holding temperature by a temperature-decreasing rate of 50 DEG C/hr or greater.

    Abstract translation: 一种合成玻璃状二氧化硅的制备方法,包括第一步骤,包括将来自燃烧器的含有氧和氢的燃烧气体与硅化合物一起喷出,在氢氧焰中水解硅化合物并形成二氧化硅玻璃颗粒,并沉积 将二氧化硅颗粒放置在与燃烧器相对的靶上,由此制造透明的合成玻璃态石英锭,将二氧化硅锭加热至第一保持温度为900℃以上并将其保持在该温度的第二步骤,然后冷却 以10℃/小时以下的降温速度将其加热至500℃以下的温度,将第三工序加热至500〜1100℃的第二保持温度, 将其保持在温度下,然后以50℃/ hr以上的降温速度将其冷却至比第二保持温度低100℃的温度。

    CRISTOBALITE-CONTAINED SILICA GLASS, METHOD OF PRODUCING SAME AND SILICA GLASS JIG MADE OF SAME
    258.
    发明申请
    CRISTOBALITE-CONTAINED SILICA GLASS, METHOD OF PRODUCING SAME AND SILICA GLASS JIG MADE OF SAME 审中-公开
    含CRISTOBALITE的含硅玻璃,其制造方法和二氧化硅玻璃制品

    公开(公告)号:WO1996026908A1

    公开(公告)日:1996-09-06

    申请号:PCT/EP1996000794

    申请日:1996-02-27

    Abstract: An object of the present invention is to provide silica glass having high purity, high heat resistance, large coefficient of thermal expansion, and low light transmittance and a method of producing the same. Another object of the present invention is to provide a silica glass jig with a vapor-deposited film thereon. Therefore cristobalite-contained silica glass wherein alpha -cristobalite in the shape of a small sphere or a small, round-edged or sharp-edged, three-dimensional region is dispersed in the silica glass matrix, the diameter of each alpha -cristobalite sphere or region is in the range of 0.1 mu m to 1000 mu m, and a content of the alpha -cristobalite is at least 10 wt.%. A method of producing the cristobalite-contained silica glass by heating a mixture of two kinds or more of crystalline silicon dioxide powder the melting points of which silicon dioxide are different from each other by 20 DEG C or more wherein the mixture contains the silicon dioxide having the highest melting point at a content in the range of 10 wt.% to 80 wt.% and is heated at temperatures in the range of the lowest melting point of the ingredients to a temperature lower than the highest melting point. The silica glass jig is made of the cristobalite-contained silica glass and the surface of the jig is covered with a vapor-deposited thin film which has a property of being resistant to plasma etching, and which is made of a material of almost the same coefficient of thermal expansion as that of the silica glass. The silica glass jig has no chance to generate particles therefrom and thereby to contaminate a silicon wafer.

    Abstract translation: 本发明的目的是提供纯度高,耐热性高,热膨胀系数高,透光率低的石英玻璃及其制造方法。 本发明的另一个目的是提供一种在其上具有气相沉积膜的石英玻璃夹具。 因此,含方英石的二氧化硅玻璃,其中形成小球形或小圆形边缘或锐边三维区域的α-方英石分散在石英玻璃基体中,每个α-方英石球体的直径或 区域在0.1〜1000μm的范围内,α-方英石的含量为10重量%以上。 通过将二氧化硅的熔点彼此不同的熔点为20℃以上的结晶二氧化硅粉末的混合物加热制造含方石英的二氧化硅玻璃的方法,其中,所述混合物含有二氧化硅, 在10重量%至80重量%范围内的含量最高的熔点,并且在成分的最低熔点范围内的温度下加热到低于最高熔点的温度。 二氧化硅玻璃夹具由含方石英的二氧化硅玻璃制成,夹具的表面被具有耐等离子蚀刻性的气相沉积薄膜覆盖,并由几乎相同的材料制成 热膨胀系数为石英玻璃的热膨胀系数。 二氧化硅玻璃夹具没有机会从中产生颗粒,从而污染硅晶片。

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