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公开(公告)号：US20230017491A1
公开(公告)日：2023-01-19
申请号：US17784566
申请日：2020-12-03
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Patricius Aloysius Jacobus TINNEMANS , Igor Matheus Petronalla AARTS , Kaustuve BHATTACHARYYA , Ralph BRINKHOF , Leendert Jan KARSSEMEIJER , Stefan Carolus Jacobus A KEIJ , Haico Victor KOK , Simon Gijsbert Josephus MATHIJSSEN , Henricus Johannes Lambertu MEGENS , Samee Ur REHMAN
Abstract: A metrology method relating to measurement of a structure on a substrate, the structure being subject to one or more asymmetric deviation. The method includes obtaining at least one intensity asymmetry value relating to the one or more asymmetric deviations, wherein the at least one intensity asymmetry value includes a metric related to a difference or imbalance between the respective intensities or amplitudes of at least two diffraction orders of radiation diffracted by the structure; determining at least one phase offset value corresponding to the one or more asymmetric deviations based on the at least one intensity asymmetry value; and determining one or more measurement corrections for the one or more asymmetric deviations from the at least one phase offset value.
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公开(公告)号：US11556063B2
公开(公告)日：2023-01-17
申请号：US16092021
申请日：2017-03-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Johannes Onvlee , Antonius Franciscus Johannes De Groot , Wim Symens , David Ferdinand Vles
IPC: G03F7/20
Abstract: A substrate support for supporting a substrate. The substrate support comprises a main body, a clamping device and a dither device. The main body comprises a support surface for supporting the substrate. The clamping device is arranged to provide the clamping force to clamp the substrate on the support surface. The dither device is configured to dither the clamping force. The dither device may be configured to dither the clamping force while the substrate W is being loaded onto the support surface.
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公开(公告)号：US11553582B2
公开(公告)日：2023-01-10
申请号：US16840714
申请日：2020-04-06
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , Daniel John William Brown , Alexander Anthony Schafgans , Palash Parijat Das
Abstract: An optical source for a photolithography tool includes a source configured to emit a first beam of light and a second beam of light, the first beam of light having a first wavelength, and the second beam of light having a second wavelength, the first and second wavelengths being different; an amplifier configured to amplify the first beam of light and the second beam of light to produce, respectively, a first amplified light beam and a second amplified light beam; and an optical isolator between the source and the amplifier, the optical isolator including: a plurality of dichroic optical elements, and an optical modulator between two of the dichroic optical elements.
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公开(公告)号：US20230005707A1
公开(公告)日：2023-01-05
申请号：US17944121
申请日：2022-09-13
Applicant: ASML Netherlands B.V.
Inventor： Yongxin WANG , Zhonghua DONG , Rui-Ling LAI
IPC: H01J37/244 , H01L27/146
Abstract: Systems and methods for implementing a detector array are disclosed. According to certain embodiments, a substrate comprises a plurality of sensing elements including a first element and a second element. The detector comprises a switching element configured to connect the first element and the second element. The switching region may be controlled based on signals generated in response to the sensing elements receiving electrons with a predetermined amount of energy.
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公开(公告)号：US20230005698A1
公开(公告)日：2023-01-05
申请号：US17778579
申请日：2020-10-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Tianming CHEN , Chiyan KUAN , Yixiang WANG , Zhi Po WANG
Abstract: A system for grounding a mask using a grounding component are provided. Some embodiments of the system include a grounding component comprising a base and an extension protruding from the base and comprising a conductive prong configured to contact a conductive layer of the mask. Some embodiments of the system include a plurality of conductive prongs configured to contact multiple positions of a conductive layer of the mask. Some other embodiments of the system include an extension comprising various shapes.
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Patent Agency Ranking
公开(公告)号：US20220415608A1
公开(公告)日：2022-12-29
申请号：US17856848
申请日：2022-07-01
Applicant: ASML NETHERLANDS B.V.
Inventor： Yongxin WANG , Zhonghua DONG , Rui-Ling LAI
IPC: H01J37/244 , H01L27/146
Abstract: Systems and methods for implementing a detector array are disclosed. According to certain embodiments, a substrate comprises a plurality of sensing elements including a first element and a second element, and a switching region therebetween configured to connect the first element and the second element. The switching region may be controlled based on signals generated in response to the sensing elements receiving electrons with a predetermined amount of energy.
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公开(公告)号：US11536654B2
公开(公告)日：2022-12-27
申请号：US17092397
申请日：2020-11-09
Applicant: ASML Netherlands B.V.
Inventor： Maxim Pisarenco , Nitesh Pandey , Alessandro Polo
Abstract: An acoustic scatterometer has an acoustic source operable to project acoustic radiation onto a periodic structure and formed on a substrate. An acoustic detector is operable to detect the −1st acoustic diffraction order diffracted by the periodic structure and while discriminating from specular reflection (0th order). Another acoustic detector is operable to detect the +1st acoustic diffraction order diffracted by the periodic structure, again while discriminating from the specular reflection (0th order). The acoustic source and acoustic detector may be piezo transducers. The angle of incidence of the projected acoustic radiation and location of the detectors and are arranged with respect to the periodic structure and such that the detection of the −1st and +1st acoustic diffraction orders and discriminates from the 0th order specular reflection.
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公开(公告)号：US20220406563A1
公开(公告)日：2022-12-22
申请号：US17897080
申请日：2022-08-26
Applicant: ASML Netherlands B.V.
Inventor： Laura DEL TIN , Almut Johanna STEGEMANN , German AKSENOV , Diego MARTINEZ NEGRETE GASQUE , Pieter Lucas BRANDT
IPC: H01J37/317 , H01J37/12 , H01J37/28 , H01J37/09 , H01J37/20
Abstract: Disclosed herein is an multi-array lens configured in use to focus a plurality of beamlets of charged particles along a multi-beam path, wherein each lens in the array comprises: an entrance electrode; a focusing electrode and a support. The focusing electrode is down beam of the entrance electrode along a beamlet path and is configured to be at a potential different from the entrance electrode. The support is configured to support the focusing electrode relative to the entrance electrode. The focusing electrode and support are configured so that in operation the lens generates a rotationally symmetrical field around the beamlet path.
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公开(公告)号：US11531280B2
公开(公告)日：2022-12-20
申请号：US17271684
申请日：2019-08-22
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor： Tamer Mohamed Tawfik Ahmed Mohamed Elazhary , Justin Lloyd Kreuzer , Franciscus Godefridus Casper Bijnen , Krishanu Shome
Abstract: An apparatus and system for determining alignment of a substrate in which a periodic alignment mark is illuminated with spatially coherent radiation which is then provided to a compact integrated optical device to create self images of the alignment mark which may be manipulated (e.g., mirrored, polarized) and combined to obtain information on the position of the mark and distortions within the mark. Also disclosed is a system for determining alignment of a substrate in which a periodic alignment mark is illuminated with spatially coherent radiation which is then provided to an optical fiber arrangement to obtain information such as the position of the mark and distortions within the mark.
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公开(公告)号：US20220397830A1
公开(公告)日：2022-12-15
申请号：US17776369
申请日：2020-10-12
Applicant: ASML NETHERLANDS B.V.
Inventor： Yang-Shan HUANG , Nicolaas TEN KATE
IPC: G03F7/20
Abstract: A fluid handling system that includes a liquid confinement structure configured to confine immersion liquid to a space between at least a part of the liquid confinement structure and a surface of a substrate. The fluid handling system also includes a mechanism configured to vibrate a vibration component in contact with the immersion liquid.
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