公开(公告)号：US20250138440A1

公开(公告)日：2025-05-01

申请号：US19009394

申请日：2025-01-03

Applicant: ASML NETHERLANDS B.V

Inventor： Nicolaas TEN KATE ,  Joost Jeroen OTTENS ,  Bastiaan Andreas Wilhelmus Hubertus KNARREN ,  Robbert Jan VOOGD ,  Giovanni Francisco NINO ,  Marinus Jan REMIE ,  Johannes Henricus Wilhelmus JACOBS ,  Thibault Simon Mathieu LAURENT ,  Johan Gertrudis Cornelis KUNNEN

IPC: G03F7/00

Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.

公开(公告)号：US20240027915A1

公开(公告)日：2024-01-25

申请号：US18453594

申请日：2023-08-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis LAFARRE ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas TEN KATE ,  Nina Vladimirovna DZIOMKINA ,  Yogesh Pramod KARADE ,  Elisabeth Corinne RODENBURG

IPC: G03F7/00 ,  B23K26/354 ,  B23K26/342 ,  B22F10/00 ,  B22F10/20 ,  B23Q3/18 ,  G03F7/20 ,  B05D3/06 ,  B05D5/00 ,  B33Y10/00 ,  B33Y80/00 ,  B22F7/06

CPC classification number: G03F7/70341 ,  B23K26/354 ,  B23K26/342 ,  G03F7/70416 ,  G03F7/707 ,  G03F7/70708 ,  B22F10/00 ,  B22F10/20 ,  B23Q3/18 ,  G03F7/20 ,  G03F7/70716 ,  B05D3/06 ,  B05D5/00 ,  G03F7/70733 ,  B33Y10/00 ,  B33Y80/00 ,  B22F7/062 ,  G03F7/708 ,  B22F10/25

Abstract: An object holder for a lithographic apparatus has a main body having a surface. A plurality of burls to support an object are formed on the surface or in apertures of a thin-film stack. At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.

公开(公告)号：US20230048272A1

公开(公告)日：2023-02-16

申请号：US17952067

申请日：2022-09-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis LAFARRE ,  Nicolaas TEN KATE ,  Nina Vladimirovna DZIOMKINA ,  Yogesh Pramod KARADE

IPC: G03F7/20 ,  H01L21/687 ,  C23C16/44

Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.

公开(公告)号：US20220397830A1

公开(公告)日：2022-12-15

申请号：US17776369

申请日：2020-10-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Yang-Shan HUANG ,  Nicolaas TEN KATE

IPC: G03F7/20

Abstract: A fluid handling system that includes a liquid confinement structure configured to confine immersion liquid to a space between at least a part of the liquid confinement structure and a surface of a substrate. The fluid handling system also includes a mechanism configured to vibrate a vibration component in contact with the immersion liquid.

公开(公告)号：US20220390850A1

公开(公告)日：2022-12-08

申请号：US17775361

申请日：2020-10-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Ruud Antonius Catharina Maria BEERENS ,  Koen Gerhardus WINKELS ,  Dirk Willem HARBERTS ,  Lucas Henricus Johannes STEVENS ,  Dennis Dominic VAN DER VOORT ,  Edwin Johannes Cornelis BOS ,  George Alois Leonie LEENKNEGT ,  Nicolaas TEN KATE

IPC: G03F7/20 ,  H01L21/687 ,  H01L21/67

Abstract: A substrate support is configured to support a substrate. The substrate support comprises a plurality of burls protruding from a base surface of the substrate support. The burls have distal ends in a plane for supporting a lower surface of the substrate with a gap between the base surface of the substrate support and the lower surface of the substrate. The substrate support comprises a liquid supply channel for supplying a conductive liquid to the gap so as to bridge the gap between the base surface of the substrate support and the lower surface of the substrate, thereby allowing charge to pass between the substrate support and the substrate. The substrate support has a controlled electrical potential such that charge distribution at the lower surface of the substrate can be manipulated.

公开(公告)号：US20220206400A1

公开(公告)日：2022-06-30

申请号：US17698100

申请日：2022-03-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas TEN KATE ,  Joost Jeroen OTTENS ,  Bastiaan Andreas Wilhelmus Hubertus KNARREN ,  Robbert Jan VOOGD ,  Giovanni Francisco NINO ,  Marinus Jan REMIE ,  Johannes Henricus Wilhelmus JACOBS ,  Thibault Simon Mathieu LAURENT ,  Johan Gertrudis Cornelis KUNNEN

IPC: G03F7/20

Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.

公开(公告)号：US20210375498A1

公开(公告)日：2021-12-02

申请号：US17395709

申请日：2021-08-06

Applicant: ASML Netherlands B.V.

Inventor： Pieter Willem Herman DE JAGER ,  Sipke Jacob BIJLSMA ,  Olav Waldemar Vladimir FRIJNS ,  Andrey Alexandrovich NIKIPELOV ,  Nicolaas TEN KATE ,  Antonius Theodorus Anna Maria DERKSEN ,  Jacobus Johannus Leonardus Hendricus VERSPAY ,  Robert Gabriël Maria LANSBERGEN ,  Aukje Arianne Annette KASTELIJN

IPC: G21G1/10 ,  G21G1/12

Abstract: A radioisotope production apparatus comprising an electron source arranged to provide an electron beam. The electron source comprises an electron injector and an electron accelerator. The radioisotope production apparatus further comprises a target support structure configured to hold a target and a beam splitter arranged to direct the a first portion of the electron beam along a first path towards a first side of the target and to direct a second portion of the electron beam along a second path towards a second side of the target.

公开(公告)号：US20210132514A1

公开(公告)日：2021-05-06

申请号：US16604976

申请日：2018-01-31

Applicant: ASML Netherlands B.V.

Inventor： Gosse Charles DE VRIES ,  Nicolaas TEN KATE

IPC: G03F7/20

Abstract: A lithographic apparatus arranged to project a pattern from a patterning device onto a substrate, comprising at least one housing comprising at least one internal wall, at least one optical component arranged within at least one chamber defined at least in part by the at least one internal wall and configured to receive a radiation beam and a cooling apparatus arranged to cool at least a portion of the at least one internal wall to a temperature below that of the at least one optical component.

公开(公告)号：US20190179232A1

公开(公告)日：2019-06-13

申请号：US16276861

申请日：2019-02-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Marcel BECKERS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Johannes Henricus Wilhelmus JACOBS ,  Nicolaas TEN KATE ,  Nicolaas Rudolf KEMPER ,  Ferdy MIGCHELBRINK ,  Elmar EVERS

IPC: G03F7/20

Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.

公开(公告)号：US20180292762A1

公开(公告)日：2018-10-11

申请号：US16008355

申请日：2018-06-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Rudolf KEMPER ,  Nicolaas TEN KATE ,  Joost Jeroen OTTENS ,  Marcel BECKERS ,  Marco POLIZZI ,  Michel RIEPEN ,  Anthonie KUIJPER ,  Koen STEFFENS ,  Adrianes Johannes BAETEN ,  Anca Mihaela ANTONEVICI

IPC: G03F7/20 ,  B01D19/00

Abstract: An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.