公开(公告)号：US20110293064A1

公开(公告)日：2011-12-01

申请号：US13147952

申请日：2010-07-06

Applicant: Zhifeng Huang ,  Zhiqiang Chen ,  Li Zhang ,  Zhentian Wang ,  Yuxiang Xing ,  Ziran Zhao ,  Yongshun Xiao

Inventor： Zhifeng Huang ,  Zhiqiang Chen ,  Li Zhang ,  Zhentian Wang ,  Yuxiang Xing ,  Ziran Zhao ,  Yongshun Xiao

IPC: A61B6/03 ,  G01N23/201

CPC classification number: G01N23/04 ,  B82Y10/00 ,  G01N23/20075 ,  G21K2201/061 ,  G21K2207/005

Abstract: An x-ray imaging technology, performing an x-ray dark-field CT imaging of an examined object using an imaging system which comprises an x-ray source, two absorbing gratings G1 and G2, an x-ray detector, a controller and a data processing unit, comprising the steps of: emitting x-rays to the examined object; enabling one of the two absorbing gratings G1 and G2 to perform phase stepping motion within at least one period range thereof; where in each phase stepping step, the detector receives the x-ray and converts it into an electric signal; wherein through the phase stepping of at least one period, the x-ray intensity at each pixel point on the detector is represented as an intensity curve; calculating a second moment of scattering angle distribution for each pixel, based on a contrast of the intensity curve at each pixel point on the detector and an intensity curve without presence of the examined object; taking images of the object at various angles, then obtaining an image with scattering information of the object in accordance with a CT reconstruction algorithm.

Abstract translation: 一种X射线成像技术，使用包括x射线源，两个吸收光栅G1和G2，x射线检测器，控制器和控制器的成像系统对检查对象进行X射线暗场CT成像 数据处理单元，包括以下步骤：向被检查对象发射X射线; 使得两个吸收光栅G1和G2中的一个能够在其至少一个周期范围内执行相位步进运动; 在每个相位步进步骤中，检测器接收x射线并将其转换为电信号; 其中通过至少一个周期的相位步进，将检测器上每个像素点处的x射线强度表示为强度曲线; 基于检测器上的每个像素点处的强度曲线的对比度和不存在检查对象的强度曲线，计算每个像素的散射角分布的第二时刻; 以各种角度拍摄对象的图像，然后根据CT重建算法获得具有对象的散射信息的图像。

公开(公告)号：US20110206187A1

公开(公告)日：2011-08-25

申请号：US12710064

申请日：2010-02-22

Applicant: Susanne Madeline Lee ,  Peter Michael Edic ,  Vanita Mani ,  Forrest Frank Hopkins ,  Eberhard Neuser

Inventor： Susanne Madeline Lee ,  Peter Michael Edic ,  Vanita Mani ,  Forrest Frank Hopkins ,  Eberhard Neuser

IPC: H01J35/06 ,  G21K5/04 ,  H01J35/14

CPC classification number: G21K1/067 ,  A61N5/1084 ,  B82Y10/00 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067

Abstract: A system for producing at least one high flux photon beam is provided. The system includes two or more photon sources configured to produce photon beams, and at least one first stage optic device coupled to at least one of the photon sources and providing at least one focused photon beam through total internal reflection, wherein at least one of the photon beams and the focused photon beams are combined at a virtual focal spot.

Abstract translation: 提供了一种用于产生至少一个高通量光子束的系统。 该系统包括被配置为产生光子束的两个或更多个光子源，以及耦合到至少一个光子源的至少一个第一级光学器件，并且通过全内反射提供至少一个聚焦光子束，其中至少一个 光子束和聚焦光子束在虚拟焦斑处组合。

公开(公告)号：US20110168925A1

公开(公告)日：2011-07-14

申请号：US12803075

申请日：2010-06-18

Applicant: Natale M. Ceglio ,  Giovanni Nocerino ,  Fabio Zocchi

Inventor： Natale M. Ceglio ,  Giovanni Nocerino ,  Fabio Zocchi

IPC: H05G2/00 ,  G02B5/10 ,  G03B27/54

CPC classification number: G03F7/70941 ,  B82Y10/00 ,  G02B5/0891 ,  G02B5/10 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70175 ,  G21K2201/061 ,  H05G2/005

Abstract: A source-collector module for an extreme ultraviolet (EUV) lithography system, the module including a laser-produced plasma (LPP) that generates EUV radiation and a grazing-incidence collector (GIC) mirror arranged relative thereto and having an input end and an output end. The LPP is formed using an LPP target system wherein a pulsed laser beam travels on-axis through the GIC and is incident upon solid, moveable LPP target. The GIC mirror is arranged relative to the LPP to receive the EUV radiation therefrom at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. An example GIC mirror design is presented that includes a polynomial surface-figure correction to compensate for GIC shell thickness effects, thereby improve far-field imaging performance.

Abstract translation: 一种用于极紫外（EUV）光刻系统的源极收集器模块，该模块包括产生EUV辐射的激光产生等离子体（LPP）和相对于其放置的放射入射收集器（GIC）反射镜，并且具有输入端和 输出端。 LPP使用LPP目标系统形成，其中脉冲激光束在轴上行进通过GIC并入射到固体，可移动的LPP靶上。 GIC反射镜相对于LPP布置，以在其输入端接收EUV辐射，并将接收的EUV辐射聚焦在邻近输出端的中间焦点。 提出了一个示例GIC镜面设计，其中包括一个多项式曲面图校正，以补偿GIC外壳厚度效应，从而提高远场成像性能。

公开(公告)号：US20110063596A1

公开(公告)日：2011-03-17

申请号：US12949985

申请日：2010-11-19

Applicant: Hans-Juergen Mann ,  Wolfgang Singer

Inventor： Hans-Juergen Mann ,  Wolfgang Singer

IPC: G03B27/54

CPC classification number: G02B17/0615 ,  B82Y10/00 ,  G02B13/22 ,  G02B17/0657 ,  G03F7/70233 ,  G03F7/7025 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/067

Abstract: The disclosure concerns a projection objective, which can include an object plane in which an object field is formed, an entry pupil, a mirrored entry pupil (RE) in a mirrored entry pupil plane obtained by mirroring the entry pupil (VE) at the object plane, an image plane, an optical axis, at least a first mirror and a second mirror. The projection objective can have a negative back focus of the entry pupil, and a principal ray originating from a central point of the object field and traversing the objective from the object plane to the image plane can intersect the optical axis in at least one point of intersection, wherein the geometric locations of all points of intersection lie between the image plane and the mirrored entry pupil plane.

Abstract translation: 本公开涉及一种投影物镜，其可以包括其中形成物场的物平面，入射光瞳，通过在物体上镜像入射光瞳（VE）获得的镜像入射光瞳平面中的镜像入射光瞳（RE） 平面，图像平面，光轴，至少第一反射镜和第二反射镜。 投影物镜可以具有入射光瞳的负的后焦点，并且源自物场的中心点并且从物体平面向图像平面穿过物镜的主射线可以在光轴的至少一点 交叉点，其中所有交点交点的几何位置位于图像平面和镜像入射光瞳平面之间。

公开(公告)号：US07812929B2

公开(公告)日：2010-10-12

申请号：US11526802

申请日：2006-09-26

Applicant: Myoung-Soo Lee ,  Chan-Uk Jeon

Inventor： Myoung-Soo Lee ,  Chan-Uk Jeon

IPC: G21K5/10

CPC classification number: G03F7/70875 ,  B82Y10/00 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/7085 ,  G21K2201/061 ,  G21K2201/067 ,  H01L21/6831 ,  H02N13/00

Abstract: Disclosed is an electrostatic chuck with a temperature sensing unit, exposure equipment having the electrostatic chuck, and a method of detecting temperature on photomask surfaces. The temperature sensing unit and method of detecting temperature may include obtaining reflectance of a photomask using a multi-wavelength interferometer and determining a temperature on the photomask based on the reflectance.

Abstract translation: 公开了具有温度感测单元的静电卡盘，具有静电卡盘的曝光设备以及检测光掩模表面温度的方法。 温度检测单元和检测温度的方法可以包括使用多波长干涉仪获得光掩模的反射率，并且基于反射率确定光掩模上的温度。

公开(公告)号：US20100246768A1

公开(公告)日：2010-09-30

申请号：US12729375

申请日：2010-03-23

Applicant: Hideo TORAYA ,  Hisashi Konaka

Inventor： Hideo TORAYA ,  Hisashi Konaka

IPC: G01T1/36

CPC classification number: G01N23/207 ,  B82Y10/00 ,  G21K2201/061 ,  G21K2201/062

Abstract: In an X-ray diffraction method using the parallel beam method, an X-ray parallel beam is incident on a sample, and diffracted X-rays from the sample are reflected at a mirror and thereafter detected by an X-ray detector. The reflective surface of the mirror consists of a combination of plural flat reflective surfaces. The respective centers of the flat reflective surfaces are located on an equiangular spiral having a center that is located on a surface of the sample. The X-ray detector is one-dimensional position-sensitive in a plane parallel to the diffraction plane. X-rays that have been reflected at different flat reflective surfaces reach different points on the X-ray detector respectively. A corrective operation is performed for separately recognizing the different reflected X-rays on the assumption that the different reflected X-rays that have been reflected at the different flat reflective surfaces might be unfortunately mixed each other on the same detecting region of the X-ray detector. This X-ray diffraction method is superior in angular resolution, and is small in X-ray intensity reduction, and is simple in structure.

Abstract translation: 在使用平行光束法的X射线衍射方法中，X射线平行光束入射到样品上，并且来自样品的X射线衍射被反射，然后通过X射线检测器检测。 反射镜的反射表面由多个平面反射表面的组合组成。 平面反射表面的各个中心位于具有位于样品表面上的中心的等角螺旋上。 X射线检测器在与衍射平面平行的平面中是一维位置敏感的。 已经在不同平面反射表面反射的X射线分别到达X射线探测器的不同点。 假设在不同的平面反射面上反射的不同的反射的X射线可能不幸地在X射线的相同检测区域上彼此混合，进行用于单独识别不同的反射X射线的校正操作 探测器。 该X射线衍射法的角分辨率优异，X射线强度降低小，结构简单。

公开(公告)号：US20100239822A1

公开(公告)日：2010-09-23

申请号：US12679601

申请日：2007-10-02

Applicant: Maria-Gugliel Pelizzo ,  Piergiorgio Nicolosi ,  Michele Suman ,  David L. Windt

Inventor： Maria-Gugliel Pelizzo ,  Piergiorgio Nicolosi ,  Michele Suman ,  David L. Windt

IPC: B32B3/00 ,  G03B27/00 ,  G06F17/50 ,  G06F17/10

CPC classification number: G03F7/70958 ,  B82Y10/00 ,  G02B5/0891 ,  G02B27/0012 ,  G03F1/24 ,  G03F7/70233 ,  G21K1/062 ,  G21K2201/061 ,  Y10T428/24612

Abstract: An aperiodic multilayer structure (2, 2′) comprising a plurality of alternating layers of a first (4, 4′) and a second (6, 6′) material and a capping layer (10, 10′) covering these alternating layers, wherein the structure (2, 2′) is characterized in that the thickness of the alternating layers chaotically varies in at least a portion of said structure (2, 2′). The invention further comprises design method comprising the step of define a time interval and a first plurality of periodic multilayer structures (A), then calculate a first merit function (∫R(λ)10*I(λ)dλ) and define a first domain for each first structures. The method further includes the step of apply at least one random mutation to each first structures inside the associated first domain and calculate a second merit function (∫R(λ)10*I(λ)dλ for the at least one mutation. Then, the method proceeds with a comparison of each first merit functions with the second merit function of the associated at least one mutation and if said second merit function is enhanced with respect to the first merit function, the at least one mutation is substituted for the structure of the first plurality and a second domain is defined for the mutation, otherwise, the structure of the first plurality is maintained inside the corresponding first domain. The method further includes the step of calculate a mean value of the merit functions of the first plurality of structures or mutations present in each first or second domain and define a threshold value to said mean value; then, for each first plurality of structures or mutations present in each first or second domain whose merit function is enhanced of the threshold with respect to the mean value, substitute a third domain to the first or second domain until the corresponding merit function is enhanced of said predetermined threshold. Then, the preceding step are repeated until the time interval has lapsed and the merit functions of the first plurality of structures or mutations present in each first domain are compared and the structure or mutation whose merit function is the more enhanced is selected.

公开(公告)号：US07738630B2

公开(公告)日：2010-06-15

申请号：US12397504

申请日：2009-03-04

Applicant: John H. Burdett, Jr. ,  Adam Bailey ,  Zewu Chen ,  R. Scott Semken ,  Kai Xin

Inventor： John H. Burdett, Jr. ,  Adam Bailey ,  Zewu Chen ,  R. Scott Semken ,  Kai Xin

IPC: G21K1/06

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/062 ,  G21K2201/064 ,  G21K2201/067

Abstract: An x-ray analysis apparatus for illuminating a sample spot with an x-ray beam. An x-ray tube is provided having a source spot from which a diverging x-ray beam is produced, the source spot requiring alignment along a transmission axis passing through the sample spot. A first housing section is provided, to which the x-ray tube is attached, including mounting features for adjustably mounting the x-ray tube therein such that the source spot coincides with the transmission axis. A second housing section includes a second axis coinciding with the transmission axis; and at least one x-ray optic attached to the second housing section for receiving the diverging x-ray beam and directing the beam toward the sample spot. Complimentary mating surfaces may be provided to align the first and second sections, and the optics, to the transmission axis. A third housing section may also be provided, including an aperture through which the x-ray beam passes, and to which a detector may be attached.

Abstract translation: 一种用X射线束照射样品斑点的X射线分析装置。 提供了具有产生发散X射线束的源极点的X射线管，源点需要沿着穿过样品斑点的透射轴对准。 提供了第一容纳部分，X射线管被附接到该第一壳体部分，包括用于可调节地将x射线管安装在其中的安装特征，使得源点与透射轴一致。 第二壳体部分包括与传动轴线重合的第二轴线; 以及附接到第二壳体部分的至少一个x射线光学器件，用于接收发散的X射线束并将光束引向样品斑点。 可以提供免费配合表面以将第一和第二部分以及光学元件对准到透射轴线。 还可以设置第三壳体部分，其包括x射线束通过的孔，并且可以附接检测器。

公开(公告)号：US07720197B2

公开(公告)日：2010-05-18

申请号：US12130574

申请日：2008-05-30

Applicant: Licai Jiang

Inventor： Licai Jiang

IPC: G21K1/06

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G21K1/062 ,  G21K2201/06 ,  G21K2201/061 ,  G21K2201/062 ,  G21K2201/064 ,  G21K2201/067

Abstract: An x-ray optical system for producing high intensity x-ray beams. The system includes an optic with a surface formed by revolving a defined contour around a revolving axis that is different than the geometric symmetric axis of the optic. Accordingly, the system may use a source that has a circular emission profile or a large source to provide increased flux to a sample.

Abstract translation: 一种用于产生高强度X射线束的X射线光学系统。 该系统包括具有通过围绕不同于光学器件的几何对称轴线的旋转轴线旋转限定轮廓而形成的表面的光学元件。 因此，系统可以使用具有圆形发射轮廓或大的源的源来向样品提供增加的通量。

公开(公告)号：US20090267003A1

公开(公告)日：2009-10-29

申请号：US12469176

申请日：2009-05-20

Applicant: Masato MORIYA ,  Osamu WAKABAYASHI ,  Georg SOUMAGNE

Inventor： Masato MORIYA ,  Osamu WAKABAYASHI ,  Georg SOUMAGNE

IPC: G21K5/00

CPC classification number: H05G2/003 ,  B82Y10/00 ,  G03F7/70575 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067

Abstract: The exposure device is able to supply only EUV radiation to a mask, while eliminating radiation other than the EUV radiation. A multi layer made from a plurality of Mo/Si pair layers is provided upon the front surface of a mirror, and blazed grooves are formed in this multi layer. Radiation which is incident from a light source device is incident upon this mirror, and is reflected or diffracted. Since the reflected EUV radiation (including diffracted EUV radiation) and the radiation of other wavelengths are reflected or diffracted at different angles, accordingly their directions of progression are different. By eliminating the radiation of other wavelengths with an aperture and/or a dumper, it is possible to irradiate a mask only with EUV radiation of high purity.

Abstract translation: 曝光装置只能将EUV辐射提供给掩模，同时消除EUV辐射以外的辐射。 在反射镜的前表面上设置由多个Mo / Si对层制成的多层，并且在该多层中形成闪耀的凹槽。 从光源装置入射的辐射入射在该反射镜上并被反射或衍射。 由于反射的EUV辐射（包括衍射的EUV辐射）和其他波长的辐射以不同的角度被反射或衍射，因此它们的进展方向是不同的。 通过用孔和/或自卸车消除其它波长的辐射，可以仅用高纯度的EUV辐射照射掩模。