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    HIGH-PURITY SILICA MONOLITHS AND PROCESS FOR THE SYNTHESIS THEREOF
    273.
    发明申请
    HIGH-PURITY SILICA MONOLITHS AND PROCESS FOR THE SYNTHESIS THEREOF 审中-公开
    高纯度二氧化硅单体及其合成方法

    公开(公告)号：WO2010040910A8

    公开(公告)日：2010-05-27

    申请号：PCT/FR2009001177

    申请日：2009-10-01

    Applicant: UNIV LILLE SCIENCES TECH ,  CENTRE NAT RECH SCIENT ,  BOUAZAOUI MOHAMED ,  CAPOEN BRUNO ,  EL HAMZAOUI HICHAM ,  BIGOT LAURENT ,  BOUWMANS GERAUD

    Inventor： BOUAZAOUI MOHAMED ,  CAPOEN BRUNO ,  EL HAMZAOUI HICHAM ,  BIGOT LAURENT ,  BOUWMANS GERAUD

    IPC: C03B19/12 ,  C03C1/00 ,  C03C3/06

    CPC classification number: C03B19/12 ,  C03B37/016 ,  C03B2201/04 ,  C03B2203/42 ,  C03C1/006 ,  C03C3/06

    Abstract: The present invention relates to a process for the synthesis of a silica monolith according to a process known as a "sol-gel process" that comprises the following steps: ° hydrolysis of a silicon alkoxide in order to form a hydrolysis precursor followed by a condensation of said hydrolysis precursor in the presence of an organic solvent, in the presence of water and of a basic catalyst in order to form oligomeric clusters containing several silicon atoms; ° dispersion of said oligomeric clusters in a solution in order to form a sol; ° polymerization of the sol in order to obtain a gel via a first heat treatment, at a temperature below the boiling point of the constituents of the sol; ° drying of the gel via a second heat treatment including an exposure of the gel to around 90°C for at least 24 hours followed by an increase in temperature, under vacuum, between around 90°C and around 180°C, said temperature increase being between 0.1°C/min and 5°C/min; ° conversion of the gel to a xerogel via a third heat treatment, said heat treatment including a hold at a drying temperature between 850 and 1000°C for at least an hour; ° dehydration and densification of the xerogel until the silica monolith is obtained via a fourth heat treatment, said fourth heat treatment comprising a hold at a temperature above 1100°C for at least one hour. The present invention also relates to a silica monolith obtained by the process of the invention, having a concentration of -OH groups of less than 1 ppm. The present invention also discloses the use of the monolith of the invention for producing optical fibres.

    Abstract translation: 本发明涉及根据已知为“溶胶 - 凝胶法”的方法合成二氧化硅整料的方法，其包括以下步骤：将硅烷醇盐水解以形成水解前体，然后冷凝 的所述水解前体在有机溶剂的存在下，在水和碱性催化剂的存在下，以形成含有几个硅原子的低聚簇; 所述低聚物簇在溶液中的分散度以形成溶胶; 在低于溶胶组分的沸点的温度下通过第一次热处理获得凝胶; 通过第二次热处理使凝胶干燥，包括将凝胶暴露于约90℃至少24小时，然后在真空下在约90℃至约180℃之间升高温度，所述温度升高 在0.1℃/分钟和5℃/分钟之间; 通过第三次热处理将凝胶转化为干凝胶，所述热处理包括在850至1000℃之间的干燥温度下保持至少1小时; 通过第四次热处理获得干燥凝胶的直接脱水和致密化，直到获得二氧化硅单块，所述第四热处理在1100℃以上的温度下保持至少1小时。 本发明还涉及通过本发明的方法得到的二氧化硅石墨，其浓度小于1ppm。 本发明还公开了本发明的整料用于生产光纤的用途。

    METHOD FOR THE PRODUCTION OF AN OPTICAL COMPONENT
    274.
    发明申请
    METHOD FOR THE PRODUCTION OF AN OPTICAL COMPONENT 审中-公开
    方法光学零件制造

    公开(公告)号：WO2005095294A3

    公开(公告)日：2005-12-22

    申请号：PCT/EP2005002784

    申请日：2005-03-16

    Applicant: HERAEUS TENEVO GMBH ,  HOFMANN ACHIM ,  SCHMITT CLEMENS ,  VYDRA JAN

    Inventor： HOFMANN ACHIM ,  SCHMITT CLEMENS ,  VYDRA JAN

    IPC: C03B37/012 ,  C03B37/027

    CPC classification number: C03B37/01211 ,  C03B37/0126 ,  C03B2201/04

    Abstract: According to a previously known method for producing an optical component from synthetic quartz glass, a coaxial arrangement comprising an outer jacket tube (4), an inner jacket tube (3) that is provided with an internal bore, and a core rod (1) whose bottom face rests on a thrust bearing within the internal bore, is fed into a heating zone in a vertical orientation, is softened therein zone by zone, and is elongated so as to obtain the quartz glass component. In order to create a simple and inexpensive method that is based on said method and makes it possible to reproducibly manufacture a high-quality optical component, the thrust bearing is embodied as a constriction (6) of the internal bore of the inner jacket tube.

    Abstract translation: 在制造光学合成石英玻璃部件的一个已知的方法是同轴布置 - 包括外壳管（4），一个内孔表现出内壳管（3），并与它的下端面上的邻接芯棒的内孔的静止（ 1） - 在垂直取向的加热区供给，软化在其中逐区段和拉长成石英玻璃元件。 要指定此基础上简单且廉价的方法，其允许可再现生产高品质的光学元件的，它是按照本发明所提出的是，邻接的内套管的内孔的收缩（6）形成。

    VERFAHREN ZUR HERSTELLUNG EINES OPTISCHEN BAUTEILS
    275.
    发明申请
    VERFAHREN ZUR HERSTELLUNG EINES OPTISCHEN BAUTEILS 审中-公开
    方法光学零件制造

    公开(公告)号：WO2005095294A2

    公开(公告)日：2005-10-13

    申请号：PCT/EP2005/002784

    申请日：2005-03-16

    Applicant: HERAEUS TENEVO GMBH ,  HOFMANN, Achim ,  SCHMITT, Clemens ,  VYDRA, Jan

    Inventor： HOFMANN, Achim ,  SCHMITT, Clemens ,  VYDRA, Jan

    IPC: C03B37/012

    CPC classification number: C03B37/01211 ,  C03B37/0126 ,  C03B2201/04

    Abstract: Bei einem bekannten Verfahren zur Herstellung eines optischen Bauteils aus synthetischem Quarzglas wird eine koaxiale Anordnung - umfassend ein äußeres Mantelrohr, ein eine Innenbohrung aufweisendes inneres Mantelrohr und einen in der Innenbohrung mit seinem unteren stirnseitigen Ende an einem Widerlager aufliegenden Kernstab - in vertikaler Ausrichtung einer Heizzone zugeführt, darin zonenweise erweicht und zu dem Quarzglas-Bauteil elongiert. Um hiervon ausgehend ein einfaches und kostengünstiges Verfahren anzugeben, das eine reproduzierbare Herstellung eines optischen Bauteils hoher Qualität ermöglicht, wird erfindungsgemäß vorgeschlagen, dass das Widerlager als Verengung der Innenbohrung des inneren Mantelrohres ausgebildet ist.

    Abstract translation: 在制造光学合成石英玻璃部件的一个已知的方法是同轴布置 - 包括外壳管，表现出内护套管和在其下端面上的邻接芯棒的内孔的静止的内孔 - 在垂直方向提供给加热区 ，它逐渐软化拉长成石英玻璃元件。 要指定此基础上简单且廉价的方法，其允许可再现生产高品质的光学元件的，它是按照本发明提出的是，抵接被设计为内套管的内孔的收缩。

    METHOD FOR MANUFACTURING OPTICAL FIBER PREFORM INCLUDING DEHYDRATION PROCESS BY PHOTOCHEMICAL REACTION
    278.
    发明申请
    METHOD FOR MANUFACTURING OPTICAL FIBER PREFORM INCLUDING DEHYDRATION PROCESS BY PHOTOCHEMICAL REACTION 审中-公开
    通过光化学反应制造脱水工艺的光纤预制件的方法

    公开(公告)号：WO2004043870A1

    公开(公告)日：2004-05-27

    申请号：PCT/KR2003/002209

    申请日：2003-10-21

    Applicant: LG CABLE LTD. ,  JANG, Ki-Wan ,  LEE, Chan-Joo ,  PARK, Ji-Sang ,  SON, Soon-Il ,  KWON, Young-Il

    Inventor： JANG, Ki-Wan ,  LEE, Chan-Joo ,  PARK, Ji-Sang ,  SON, Soon-Il ,  KWON, Young-Il

    IPC: C03B37/018

    CPC classification number: C03B37/01228 ,  C03B37/01446 ,  C03B37/01853 ,  C03B2201/04 ,  C03B2201/075 ,  C03B2201/28 ,  C03B2201/31 ,  C03C25/6208 ,  C03C25/64

    Abstract: A method for manufacturing an optical fiber preform including a dehydration process by photochemical reaction is provided. The method performs forming a clad and a core according to a predetermined refractive index profile by repeated deposition and sintering of soot particles by means of oxidation of soot generation gas, and a dehydration step for removing moisture and hydroxyl groups from a soot deposition region by means of photochemical reaction is executed between the deposition and sintering. The dehydration step activates dehydration gas into ionic or atomic state by irradiating light, in a wavelength range capable of inducing activation of the dehydration gas, from light source to the dehydration gas including chlorine and supplied to the soot deposition region, and then adsorbs the activated dehydration gas onto surface of the soot in order to induce dehydration reaction with moisture or hydroxyl groups.

    Abstract translation: 提供了一种通过光化学反应制造包括脱水过程的光纤预制件的方法。 该方法通过烟灰发生气体的氧化反复沉积和烧结烟灰颗粒，根据预定的折射率分布形成包层和芯，以及通过手段从烟灰沉积区域除去水分和羟基的脱水步骤 在沉积和烧结之间进行光化学反应。 脱水步骤通过在能够引起脱水气体的激活的波长范围内从光源向包括氯的脱水气体照射光并将其供应到烟灰沉积区域，将脱水气体激活成离子或原子状态，然后吸附活化的 将烟气脱气到烟灰表面，以引起与水分或羟基的脱水反应。

    METHOD FOR PRODUCING EXTREME ULTRAVIOLET LITHOGRAPHY SUBSTRATES
    280.
    发明申请
    METHOD FOR PRODUCING EXTREME ULTRAVIOLET LITHOGRAPHY SUBSTRATES 审中-公开
    用于生产超极本超薄基板的方法

    公开(公告)号：WO2002088035A1

    公开(公告)日：2002-11-07

    申请号：PCT/US2002/009189

    申请日：2002-03-25

    Applicant: CORNING INCORPORATED ,  HRDINA, Kenneth E ,  RUSSO, Nikki J ,  WASILEWSKI, Michael H

    Inventor： HRDINA, Kenneth E ,  RUSSO, Nikki J ,  WASILEWSKI, Michael H

    IPC: C03B8/04

    CPC classification number: C03B19/1453 ,  C03B19/1407 ,  C03B19/1484 ,  C03B2201/04 ,  C03B2201/075 ,  C03B2201/42 ,  C03B2207/32

    Abstract: A method for forming EUV Lithography large dimension homogeneous glass body is disclosed which includes delivering a silica precursor (28) to a burner (16) and passing the silica precursor (16) through the flame (36) of the burner (16) to form silica particles (38), depositing the silica particles (38) on a planar surface (14) to form a flat porous EUV Lithography large dimension preform (40) and consolidating the flat porous EUV Lithography large dimension preform (40) into a flat dense EUV Lithography large dimension homogeneous glass body.

    Abstract translation: 公开了一种用于形成EUV平版印刷大尺寸均匀玻璃体的方法，其包括将二氧化硅前体（28）输送到燃烧器（16）并使二氧化硅前体（16）通过燃烧器（16）的火焰（36）形成 二氧化硅颗粒（38），将二氧化硅颗粒（38）沉积在平坦表面（14）上以形成平坦多孔EUV平版印刷大尺寸预制件（40），并将平面多孔EUV平版印刷大尺寸预成型件（40）固结成扁平密度 EUV平版印刷大尺寸均匀玻璃体。

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