公开(公告)号：US20020159067A1

公开(公告)日：2002-10-31

申请号：US10092521

申请日：2002-03-08

Inventor： Petr Herman ,  Jaroslav Vecer

IPC: G01B009/02

CPC classification number: G01J3/447

Abstract: The method utilizes the physical phenomenon known as dispersion of the optical rotation. After passage of linearly polarized electromagnetic radiation through the optically active environment (rotator), with the rotating power characterized by a parameter p, and then through the analyzing polarizer, the function R(p) can be measured. For the given active medium and the relative orientation of polarization planes of the input light beam and the analyzing polarizer, R(p) has an unambiguous relation with the spectrum I(null) of the analyzed radiation (null stands for wavelength) and allows its unambiguous determination by special mathematical methods. In devices based on the above mentioned principle a linearly polarized collimated beam of analyzed radiation propagates through the optical rotator then passes through the analyzer and strikes a single-channel or multi-channel detector which measures R(p) as a function of the parameter p. Finally the desired spectrum is calculated from the known functional relation between the measured rotogram R(p) and I(null).

公开(公告)号：US06353477B1

公开(公告)日：2002-03-05

申请号：US09496011

申请日：2000-02-01

Applicant: Blaine D. Johs ,  Craig M. Herzinger

Inventor： Blaine D. Johs ,  Craig M. Herzinger

IPC: G01N2121

CPC classification number: G01J3/447 ,  G01J4/00 ,  G01J2003/2866 ,  G01N21/21 ,  G01N21/211 ,  G02B5/3058 ,  G02B5/3083 ,  G02B27/46

Abstract: A Spectroscopic Rotating Compensator Material System Investigation System including a Dual Waveplate Pseudo-Achromatic Compensator System, and a Photo-Array for simultaneously detecting a Multiplicity of Wavelengths, is disclosed. The Spectroscopic Rotating Compensator Material System Investigation System is calibrated by a Mathematical Regression based technique involving, where desirable, Parameterization of Calibration Parameters. Calibration is possible utilizing various dimensional Data Set(s) obtained with the Spectroscopic Rotating Compensator Material System Investigation System in a “Material System present” or in a Straight-through” configuration, said data sets being variously normalized to D.C., A.C. or combination D.C. and A.C. components thereof.

Abstract translation: 公开了一种包括双波片伪消色差补偿器系统的光谱旋转补偿器材料系统调查系统和用于同时检测波长的多重性的光阵列。 光谱旋转补偿器材料系统调查系统通过基于数学回归的技术进行校准，该技术涉及校准参数的参数化。 使用在“材料系统存在”或“直通”配置中的光谱旋转补偿器材料系统调查系统获得的各种维度数据集可以进行校准，所述数据集被不同地归一化到DC，AC或组合DC 及其AC成分。

公开(公告)号：US06121051A

公开(公告)日：2000-09-19

申请号：US3727

申请日：1998-01-07

Applicant: Kristine A. Bertness

Inventor： Kristine A. Bertness

IPC: G01J3/447 ,  G01J4/00 ,  G01N21/21

CPC classification number: G01J3/447 ,  G01J4/00 ,  G01N21/21 ,  Y10T436/12

Abstract: This invention provides an inexpensive, noninvasive optical method of quantitatively determining the volume fraction of anisotropic material in a mixture of anisotropic and isotropic material, and more particularly for determining the volume fraction of noncubic crystalline material in a mixed-phase specimen having noncubic crystalline material intermixed with cubic crystalline material. Polarized light is impinged on the specimen and the reflectance or transmission difference between two orthogonal polarization directions is measured. In cubic regions the reflectance or transmission is the same along both polarization directions so the contributions to the difference cancel, leaving a signal only from the noncubic regions. The optical difference can be measured as a function of wavelength and critical points in the band structure, including the band gap, can be profiled. From the band structure the film composition can be determined. This measurement is particularly suited to measuring III-V nitride semiconductor specimens having regions with zincblende symmetry mixed with regions of wurtzite symmetry.

Abstract translation: 本发明提供了一种廉价的无创光学方法，用于定量地测定各向异性和各向同性材料的混合物中的各向异性材料的体积分数，更具体地说，用于确定具有非孪晶结晶材料混合的混合相样品中的非耻结晶材料的体积分数 与立方晶体材料。 偏振光照射在样本上，测量两个正交偏振方向之间的反射率或透射差。 在立方体区域中，两个偏振方向的反射率或透射率相同，所以对差分的贡献取消，仅留下来自非立体区域的信号。 可以测量光学差异作为波长的函数，并且可以对包括带隙的带结构中的临界点进行分析。 从带结构可以确定膜组成。 该测量特别适用于测量III族氮化物半导体样品，其具有与纤锌矿对称性区域混合的闪锌矿对称区域。

公开(公告)号：US5936735A

公开(公告)日：1999-08-10

申请号：US52300

申请日：1998-03-31

Applicant: James F. Elman

Inventor： James F. Elman

IPC: G01J3/447 ,  G01J4/00 ,  G01N21/23

CPC classification number: G01N21/23 ,  G01J3/447 ,  G01J4/00 ,  G01J3/0224

Abstract: An apparatus for determining the optical retardation of a material. The apparatus includes a light source emitting light along a light path, and a lens disposed in the light path intermediate the light source and a sample of the material. A waveguide directs the light from the light source to the sample and directs light reflected from the sample to a wavelength analyzer, whereby the wavelength analyzer detects the wavelengths of the reflected light. The apparatus of the present invention includes a sole polarizing element disposed in the light path intermediate the light source and the wavelength analyzer.

Abstract translation: 一种用于确定材料的光学延迟的装置。 该装置包括沿光路发射光的光源和设置在光源中间的光路中的透镜和材料的样本。 波导将来自光源的光引导到样品，并将从样品反射的光引导到波长分析仪，由此波长分析仪检测反射光的波长。 本发明的装置包括设置在光源和波长分析器之间的光路中的唯一偏振元件。

公开(公告)号：US5883717A

公开(公告)日：1999-03-16

申请号：US658087

申请日：1996-06-04

Applicant: Charles A. DiMarzio ,  Anthony J. Devaney ,  Scott C. Lindberg

Inventor： Charles A. DiMarzio ,  Anthony J. Devaney ,  Scott C. Lindberg

IPC: G01J3/447 ,  G01J3/453 ,  G01J9/02 ,  G01N21/47 ,  G01B9/02

CPC classification number: G01J3/447 ,  G01J3/453 ,  G01J9/02 ,  G01N21/4795

Abstract: An optical quadrature interferometer is presented. The optical quadrature interferometer uses a different state of polarization in each of two arms of the interferometer. A light beam is split into two beams by a beamsplitter, each beam directed to a respective arm of the interferometer. In one arm, the measurement arm, the light beam is directed through a linear polarizer and a quarter wave plate to produce circularly polarized light, and then to a target being measured. In the other arm, the to reference arm, the light beam is not subject to any change in polarization. After the light beams have traversed their respective arms, the light beams are combined by a recombining beamsplitter. As such, upon the beams of each arm being recombined, a polarizing element is used to separate the combined light beam into two separate fields which are in quadrature with each other. An image processing algorithm can then obtain the in-phase and quadrature components of the signal in order to construct an image of the target based on the magnitude and phase of the recombined light beam.

Abstract translation: 提出了一种光学正交干涉仪。 光学正交干涉仪在干涉仪的两个臂中的每一个中使用不同的偏振状态。 光束被分束器分成两束，每束光束指向干涉仪的相应臂。 在一个臂中，测量臂，光束被引导通过线性偏振器和四分之一波片以产生圆偏振光，然后到被测量的目标。 在另一个臂中，对于参考臂，光束不会发生极化的任何变化。 在光束穿过其各自的臂之后，光束通过重组分束器组合。 因此，在每个臂的光束被复合时，使用偏振元件将组合的光束分离成彼此成正交的两个分离的场。 然后，图像处理算法可以获得信号的同相和正交分量，以便基于重新组合的光束的大小和相位来构建目标的图像。

公开(公告)号：US5739909A

公开(公告)日：1998-04-14

申请号：US543570

申请日：1995-10-10

Applicant: Nadine Blayo ,  Arnaud Grevoz ,  Tseng-Chung Lee

Inventor： Nadine Blayo ,  Arnaud Grevoz ,  Tseng-Chung Lee

IPC: G01B11/02 ,  G01J3/447 ,  G01J4/00 ,  G01N21/21

CPC classification number: G01B11/02 ,  G01J3/447 ,  G01J4/00 ,  G01N2021/213

Abstract: A non destructive method of spectroscopic ellipsometry adapted to measure the width of features in periodic structures, particularly those features which are less than one micron wide. The method is also adapted to make comparisons between a known reference structure and a sample structure, and to control the fabrication of periodic structures in a plasma etching reactor. Peaks in functions DELTA and PSI versus wavelength are monitored and correlated against reference curves, permitting etching conditions to be modified. This technique avoids the need for use of scanning electron microscopy to measure the linewidth, which is a destructive method. It also posses an advantage over scatterometry which requires several detectors arrayed at different angles from an incident beam to measure the different diffracted orders.

Abstract translation: 适用于测量周期结构中特征宽度的非破坏性方法，特别是那些小于1微米宽的特征。 该方法还适于在已知参考结构和样品结构之间进行比较，并且控制等离子体蚀刻反应器中周期性结构的制造。 监测功能DELTA和PSI对波长的峰值，并与参考曲线相关，允许修改蚀刻条件。 这种技术避免了使用扫描电子显微镜来测量线宽，这是一种破坏性的方法。 它还具有优于散射法的优点，其需要以与入射光束不同的角度排列的多个检测器来测量不同的衍射级。

公开(公告)号：US5504582A

公开(公告)日：1996-04-02

申请号：US339834

申请日：1994-11-14

Applicant: Blaine D. Johs ,  Shakil A. Pittal ,  Steven E. Green ,  John A. Woollam ,  David W. Doerr ,  Reed A. Christenson

Inventor： Blaine D. Johs ,  Shakil A. Pittal ,  Steven E. Green ,  John A. Woollam ,  David W. Doerr ,  Reed A. Christenson

IPC: G01J3/28 ,  G01J3/36 ,  G01J3/447 ,  G01J4/00 ,  G01N21/21

CPC classification number: G01J3/36 ,  G01J3/447 ,  G01J4/00 ,  G01N21/211 ,  G01J2003/2866 ,  G01J3/0289

Abstract: An ellipsometer system which includes a pivotal dispersive optics positioned to receive polychromatic light from an analyzer thereof, without further focusing after reflection from a substrate system, is presented. In addition, a stationary compensator, positioned between an analyzer and the dispersive optics, which serves to reduce detector element polarization dependent sensitivity to light entering thereto after it interacts with the dispersive optics, is disclosed. The use of a light fiber to carry light from a source thereof, to a polarization state generator, is also disclosed. The method of the present invention can include application of mathematical correction factors to, for instance, substrate system characterizing PSI and DELTA values, or Fourier ALPHA and BETA coefficients.

Abstract translation: 一种椭偏仪系统，其包括枢转分散光学器件，其被定位成从其分析器接收多色光，而不需要在从衬底系统反射之后进一步聚焦。 此外，公开了一种位于分析仪和分散光学器件之间的固定补偿器，其用于在与分散光学器件相互作用之后降低对入射到其上的光的检测器元件偏振依赖的灵敏度。 还公开了使用光纤将光从其源携带到偏振状态发生器。 本发明的方法可以包括将数学校正因子应用于例如表征PSI和DELTA值的基底系统，或傅里叶ALPHA和BETA系数。

公开(公告)号：JP6218338B2

公开(公告)日：2017-10-25

申请号：JP2015544521

申请日：2013-11-29

Applicant: オリバ ジョビン イボン エス. アー. エス.

Inventor： アシェール オリヴィエ ,  リシャール シモン

IPC: G01J3/18 ,  G01J3/02

CPC classification number: G01J3/0224 ,  G01J3/0208 ,  G01J3/447

公开(公告)号：JP2015535611A

公开(公告)日：2015-12-14

申请号：JP2015544521

申请日：2013-11-29

Applicant: オリバ ジョビン イボン エス. アー. エス. ,  オリバ ジョビン イボン エス. アー. エス.

Inventor： オリヴィエ アシェール ,  オリヴィエ アシェール ,  シモン リシャール ,  シモン リシャール

IPC: G01J3/02 ,  G01J3/18

CPC classification number: G01J3/0224 ,  G01J3/0208 ,  G01J3/447

Abstract: 本発明は、入口スリット(101)と角度分散手段(130)とを含む上流光ビーム(1)のスペクトルを分析するための分光計(100)に関する。本発明により、角度分散手段は、補正光ビームが、円である事前設定された補正偏光状態を有するときに、複数の波長(λ1,λ2,λ3)において、+1回折次数又は−1回折次数のいずれかである偏光依存回折格子の与えられた特定の回折次数で補正光ビーム(20)を回折光ビーム(31,32,33)に回折するのに適する少なくとも1つの偏光−分離回折格子を含み、分光計は、入口スリットと角度分散手段の間に置かれた偏光を修正するための手段(1100)を含み、この手段は、事前設定された補正偏光状態を有する補正光ビームを発生させるために上流光ビームの偏光状態を修正するのに適切である。【選択図】図4

Abstract translation: 本发明是用于分析所述入口狭缝（101）和所述角色散的装置（130）和上行光束的光谱，其包括光谱仪（1）有关（100）。 本发明中，角色散的装置中，校正光束，具有预先设定的修正偏振状态时是圆形的，多个波长中（λ1，λ2，λ3）的，+ 1个衍射级或-1衍射级 至少一个偏振校正光束（20），适合于在衍射的衍射光束（31，32，33）在特定的衍射级给定偏振依赖性的衍射光栅是要么 - 分离光栅 其中，所述光谱仪包括用于修改配置在入口狭缝和角色散装置之间的偏振装置（1100），该装置产生具有校正偏振状态的校正光束已预先设定的 是适当的修改上游光束的偏振状态。 点域4

公开(公告)号：JP5686684B2

公开(公告)日：2015-03-18

申请号：JP2011157394

申请日：2011-07-19

Applicant: 株式会社日立製作所

Inventor： 茂治 木村 ,  茂治 木村

IPC: G02B21/06 ,  G02B21/36

CPC classification number: G02B21/0072 ,  G01B9/02038 ,  G01J3/447 ,  G01J3/453 ,  G01J9/02 ,  G01N21/4795 ,  G02B21/0056 ,  G02B21/0068 ,  G02B27/0988