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21.发明专利Image acquisition method by multiple scan, image acquisition device, and sample inspection device 审中-公开多次扫描，图像采集装置和样本检测装置的图像采集方法
公开(公告)号：JP2009058382A
公开(公告)日：2009-03-19
申请号：JP2007226074
申请日：2007-08-31
Inventor： NAKAJIMA KAZUHIRO
IPC: G01N21/956 , G01B11/24
Abstract: PROBLEM TO BE SOLVED: To provide an image acquisition method by multiple scan, an image acquisition device, and a sample inspection device that easily reduce the effect of noise and acquire image data of high image quality and high quality.
SOLUTION: In the image acquisition method, travel movement of the X direction crossing the line direction of a one-dimensional image sensor with respect to a stage mounted with a mask 11, and step movement of the Y direction as the line direction are repeated, multiplex scan of first scan, ..., ninth scan, ..., n-th scan are performed, and two-dimensional image data of a mask 11 is acquired by the one-dimensional image sensor. The step movement amount is made smaller than the sensor width W consisting of the number of pixels of the line direction of the one-dimensional image sensor, the image in the same region of the mask 11 is imaged with different pixels on the line of the one-dimensional image sensor a plurality of times, and the image data imaged and acquired with the different pixels such as this is calculated between the pixels, and averaged or compared.
COPYRIGHT: (C)2009,JPO&INPITAbstract translation: 要解决的问题：为了提供通过多次扫描的图像获取方法，图像获取装置和样本检查装置，其容易地降低噪声的影响并获取高图像质量和高质量的图像数据。 解决方案：在图像采集方法中，相对于安装有掩模11的台阶，X方向与一维图像传感器的线方向的行进移动，Y方向的移动作为线方向 重复执行第一扫描，...，第九扫描，...，第n扫描的多重扫描，并且通过一维图像传感器获取掩模11的二维图像数据。 步长移动量小于由一维图像传感器的线方向的像素数构成的传感器宽度W，在与该图像传感器的线上的不同像素对掩模11的相同区域成像的图像 一维图像传感器多次，并且在像素之间计算像这样的不同像素成像和采集的图像数据，并进行平均或比较。 版权所有（C）2009，JPO＆INPIT
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22.发明专利
公开(公告)号：JP2008267903A
公开(公告)日：2008-11-06
申请号：JP2007109288
申请日：2007-04-18
Inventor： HIRANO RYOICHI , OGAWA TSUTOMU
IPC: G01N21/956 , G03F1/84
CPC classification number: G01N21/95607 , G01N2021/95676 , G01N2201/0631
Abstract: PROBLEM TO BE SOLVED: To provide a reticle defect testing device and an inspection method using the device that suppress deterioration in optical components due to luminescent spots caused by integrator and enabling a long-time high-precision defect inspection. SOLUTION: A reticle defect inspecting device and an inspection method by using the device are characterized in that the reticle defect inspecting device for inspecting reticle defects using a pattern image obtained, by irradiating a pattern-formed reticle with light is equipped with an illumination optical system for illuminating this reticle with inspection light and a detection optical system for detecting a pattern image of the illuminated reticle, wherein the illumination optical system comprises an integrator to uniform the luminance distribution of the inspection light and a shifting mechanism for finely moving the integrator in the vertical direction with respect to the light axis of the integrator. COPYRIGHT: (C)2009,JPO&INPIT
Abstract translation: 要解决的问题：提供一种掩模版缺陷检测装置和使用该装置的检查方法，该装置抑制由积分器引起的发光点引起的光学部件的劣化，并能够进行长时间的高精度缺陷检查。 解决方案：使用该装置的掩模版缺陷检查装置和检查方法的特征在于，使用通过用光照射图案形成的掩模版而获得的图案图像来检查掩模版缺陷的掩模版缺陷检查装置装备有 用于利用检查光照亮该掩模版的照明光学系统和用于检测照明的掩模版的图案图像的检测光学系统，其中所述照明光学系统包括用于使所述检查光的亮度分布均匀的积分器和用于精细地移动所述检测光的移动机构 积分器相对于积分器的光轴在垂直方向上。 版权所有（C）2009，JPO＆INPIT
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公开(公告)号：JP2008233723A
公开(公告)日：2008-10-02
申请号：JP2007075962
申请日：2007-03-23
Inventor： KATAOKA AKIRA , ISOMURA IKUNAO
IPC: G03F1/84 , G06T1/00 , H01L21/027
Abstract: PROBLEM TO BE SOLVED: To provide a device which performs pattern inspection for correcting a false image due to crosstalk.
SOLUTION: A pattern inspection device 100 includes a line sensor 105 having a plurality of photodiodes detecting a plurality of pieces of pixel information in an optical image of a pattern-formed photomask 101 at the same time, a false image correcting unit 340 which makes corrections for subtracting a correcting amount based upon the plurality of pieces of pixel information and other pixel information from respective pieces of pixel information of the plurality of pieces of pixel information detected at the same time, and a comparing unit 360 which compares each piece of corrected pixel information with prescribed reference pixel information.
COPYRIGHT: (C)2009,JPO&INPITAbstract translation: 要解决的问题：提供一种执行用于校正由于串扰引起的假图像的图案检查的装置。 解决方案：图案检查装置100包括具有多个光电二极管的线传感器105，该多个光电二极管同时在图案形成的光掩模101的光学图像中检测多个像素信息，伪图像校正单元340 其对来自同时检测的多个像素信息的各个像素信息的多个像素信息和其他像素信息进行基于多个像素信息的减法校正量的校正，以及比较部360 具有规定的参考像素信息的校正像素信息。 版权所有（C）2009，JPO＆INPIT
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公开(公告)号：JP2008209664A
公开(公告)日：2008-09-11
申请号：JP2007046341
申请日：2007-02-27
Inventor： OGAWA TSUTOMU , HIRONO MASATOSHI
IPC: G01B11/24 , G01N21/956 , G02B27/18 , G03F1/84
CPC classification number: G01N21/956 , G03F1/84
Abstract: PROBLEM TO BE SOLVED: To provide an optical configuration suitable for achieving a Koehler illumination system using a light source with high spatial coherency. SOLUTION: A pattern inspection device to inspect a mask pattern is equipped with: a laser generating device generating laser beam; a mask having a pattern; an expander optical system disposed on the optical path between the laser generating device and the mask and expanding the laser beam to form an optical path of a collimated flux; a beam splitter optical system disposed on the optical path of the collimated flux and splitting the optical path into two paths; a transmissive illumination optical system disposed on one optical path and irradiating the mask with transmitted light; a reflective illumination optical system disposed on the other optical path and irradiating the mask with reflected light; a light receiving device receiving the pattern image of the mask; a comparing section comparing the pattern image received by the light receiving device with a reference image. COPYRIGHT: (C)2008,JPO&INPIT
Abstract translation: 要解决的问题：提供适于实现使用具有高空间一致性的光源的科勒照明系统的光学配置。
解决方案：用于检查掩模图案的图案检查装置配备有：产生激光束的激光产生装置; 具有图案的面具; 扩展器光学系统，设置在激光产生装置和掩模之间的光路上，并且扩大激光束以形成准直焊剂的光路; 分束器光学系统，设置在准直通量的光路上并将光路分成两个路径; 透射照明光学系统，设置在一个光路上并用透射光照射该掩模; 反射照明光学系统，设置在另一光路上并用反射光照射所述掩模; 接收所述掩模的图案图像的光接收装置; 将由光接收装置接收的图案图像与参考图像进行比较的比较部分。 版权所有（C）2008，JPO＆INPIT
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公开(公告)号：JP2008003111A
公开(公告)日：2008-01-10
申请号：JP2006169512
申请日：2006-06-20
Inventor： NAKATANI YUICHI
IPC: G01N21/956 , G03F1/84 , G06T1/00
CPC classification number: G06T7/001 , G06T2207/30108
Abstract: PROBLEM TO BE SOLVED: To easily detect a local CD error of a pattern of a sample to be inspected. SOLUTION: A pattern inspection device comprises a similar peripheral pattern exploring unit 14 that finds a plurality of similar peripheral patterns which are at the periphery of a specified pattern in the sample to be inspected and similar to the specified pattern, a nonsimilarity calculating unit 20 which finds nonsimilarity between the specified pattern and a similar peripheral pattern, a variance evaluating unit 22 which excludes an allowable error from the nonsimilarity and finds a local CD error judgement value, and a local CD error judges unit 24 which judges a local CD error if the local CD error judgement value exceeds a threshold when the distance between the specified pattern and similar peripheral pattern increases. COPYRIGHT: (C)2008,JPO&INPIT
Abstract translation: 要解决的问题：为了容易地检测要检查的样品的图案的局部CD误差。 解决方案：图案检查装置包括类似的周边图案探索单元14，其找到在待检查样本中的指定图案的外围的多个类似的外围图案，并且类似于指定的图案，非相似性计算 单元20，其在指定模式和类似的外围模式之间发现非相似性;方差评估单元22，其从非相似性中排除可允许的错误并找到本地CD错误判定值;以及本地CD错误判断单元24，其判断本地CD 如果指定图案和类似周边图案之间的距离增加，如果本地CD错误判断值超过阈值，则出现错误。 版权所有（C）2008，JPO＆INPIT
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Patent Agency Ranking26.发明专利Optical image acquiring apparatus, pattern inspection device, optical image acquiring method and pattern inspection method 审中-公开光学图像获取装置，图案检查装置，光学图像获取方法和图案检查方法
公开(公告)号：JP2007225311A
公开(公告)日：2007-09-06
申请号：JP2006043906
申请日：2006-02-21
Inventor： HIRANO RYOICHI , OGAWA TSUTOMU
IPC: G01N21/956 , G01B11/24 , G03F1/84 , H01L21/027 , H01L21/66
Abstract: PROBLEM TO BE SOLVED: To facilitate the focus matching of the pattern image thrown on the light detection surface of an optical image detecting part.
SOLUTION: This optical image acquiring apparatus is equipped with a mount on which a sample to be inspected is placed, a light irradiation part for irradiating the sample to be inspected placed on the mount with irradiation light, an optical image detecting part for detecting the irradiation light thrown on the sample to be inspected, a focus adjusting device for matching the focus of the pattern image of the sample to be inspected with the optical image detecting part, a slit image forming device for forming a slit image on the sample to be inspected and an observation display device for displaying the slit image on the sample to be inspected. The focus of the pattern image of the sample to be inspected in the optical image detecting part is adjusted from the slit image on the sample to be inspected displayed on the observation display device.
COPYRIGHT: (C)2007,JPO&INPITAbstract translation: 要解决的问题：为了便于投影在光学图像检测部分的光检测表面上的图案图像的焦点匹配。 解决方案：该光学图像获取装置配备有放置待检查样品的安装台，用照射光照射待检查样品的光照射部分，用于照射光的光学图像检测部分 检测投射在要检查的样品上的照射光;焦点调节装置，用于使待检测样品的图案图像的焦点与光学图像检测部分匹配;狭缝图像形成装置，用于在样品上形成狭缝图像 以及用于在要检查的样品上显示狭缝图像的观察显示装置。 从观察显示装置上显示的待检查样本上的狭缝图像调整光学图像检测部中要检查的样本的图案图像的焦点。 版权所有（C）2007，JPO＆INPIT
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公开(公告)号：JP2007107942A
公开(公告)日：2007-04-26
申请号：JP2005297242
申请日：2005-10-12
Applicant: Advanced Mask Inspection Technology Kk , Topcon Corp , アドバンスド・マスク・インスペクション・テクノロジー株式会社 , 株式会社トプコン
Inventor： KOBAYASHI NOBORU , OGAWA TSUTOMU , HIDESHIMA MASAYUKI , NAGAHAMA HIROYUKI , NAKAJIMA KOJI
IPC: G01J1/44
Abstract: PROBLEM TO BE SOLVED: To simplify an optical system and correct the sensitivity drift or linearity of a light reception element.
SOLUTION: A light quantity measuring apparatus is provided with an optical chopper 2 for interrupting incident signal light at prescribed periods while rotating; a reference light source 6 for irradiating reference light different from the signal light during the period in which the signal light is interrupted by the optical chopper 2; the light reception element 5 for receiving both the signal light and the reference light and measuring the light quantity of the signal light and the light quantity of the reference light; a correction operation circuit 13 for correcting the light quantity of the signal light on the basis of the light quantity of the reference light; and a correction value computation circuit 12 for computing a correction value by comparing a prescribed reference value with a light quantity value of the prescribed light. The correction operation circuit 13 corrects the light quantity of the signal light on the basis of the correction value.
COPYRIGHT: (C)2007,JPO&INPITAbstract translation: 要解决的问题：为了简化光学系统并校正光接收元件的灵敏度漂移或线性度。 光量测量装置设置有用于在旋转的同时中断入射信号光的光斩波器2; 参考光源6，用于在由光斩波器2中断信号光的时段期间照射与信号光不同的参考光; 光接收元件5，用于接收信号光和参考光，并测量信号光的光量和参考光的光量; 校正运算电路13，用于根据参考光的光量校正信号光的光量; 以及校正值计算电路12，用于通过将规定的参考值与规定的光的光量值进行比较来计算校正值。 校正运算电路13根据校正值校正信号光的光量。 版权所有（C）2007，JPO＆INPIT
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公开(公告)号：JP2007093826A
公开(公告)日：2007-04-12
申请号：JP2005281109
申请日：2005-09-28
Inventor： NAKAJIMA KAZUHIRO
IPC: G01B11/26 , G03F1/84 , H01L21/027 , H01L21/68
Abstract: PROBLEM TO BE SOLVED: To provide an alignment method of a mask inspection device that can shorten an alignment time. SOLUTION: Disclosed is the alignment method of the mask inspection device characterized in: relating and storing image data of alignment marks and coordinate data of length-measured stage positions; calculating the gradient of an alignment in an acquired image of the alignment mark from the acquired image; calculating the gradient of a stage travel direction to a stage coordinate axis from coordinate data of a stage position related to the acquired image of the alignment mark; calculating the actual gradient between a mask and the stage coordinate axis from the calculated gradient of the alignment mark in the acquired image and the calculated gradient of the stage travel direction to the stage coordinate axis; and correcting rotation of the mask based upon the gradient between the mask and stage coordinate axis which is calculated as to only the acquired image of the alignment at one place. COPYRIGHT: (C)2007,JPO&INPIT
Abstract translation: 要解决的问题：提供一种可以缩短对准时间的掩模检查装置的对准方法。 解决方案：掩模检查装置的对准方法，其特征在于：将对准标记的图像数据和长度测量级位置的坐标数据相关联并存储; 从所获取的图像计算所获取的对准标记图像中的对准的梯度; 从与对准标记的获取图像相关的台位置的坐标数据计算舞台行进方向到舞台坐标轴的梯度; 从计算出的获取图像中的对准标记的梯度和所计算的载物台行进方向的梯度到载物台坐标轴计算掩模和载物台坐标轴之间的实际坡度; 并且基于掩模和平台坐标轴之间的梯度来校正掩模的旋转，所述梯度坐标轴仅被计算为在一个位置获取的对准图像。 版权所有（C）2007，JPO＆INPIT
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公开(公告)号：JP2007088375A
公开(公告)日：2007-04-05
申请号：JP2005278209
申请日：2005-09-26
Inventor： ISOMURA IKUNAO
IPC: H01L21/66 , G01N21/956 , H01L21/027
CPC classification number: G06T7/001 , G06T2207/30148
Abstract: PROBLEM TO BE SOLVED: To provide an apparatus, a method and a program for carrying out a sample inspection with a proper precision. SOLUTION: A sample inspection apparatus compares plural partial optical picture data of the same inspected sample in which a pattern forming is carried out. The apparatus is equipped with an optical picture data acquisition 150 for acquiring an optical picture data of the inspected sample, and a comparison circuit 108 for comparing the plural partial optical picture data. In the comparison circuit 108, region picture data are input as formed based on region pattern information showing a predetermined region. When the plural partial optical picture data are compared, a criterion is changed with reference to the region picture data, and consequently an existence of a defect is judged on the sample. COPYRIGHT: (C)2007,JPO&INPIT
Abstract translation: 要解决的问题：提供一种以适当精度进行样品检查的装置，方法和程序。 解决方案：样品检查装置比较执行图案形成的相同检验样品的多个部分光学图像数据。 该装置配备有用于获取被检查样本的光学图像数据的光学图像数据获取150以及用于比较多个部分光学图像数据的比较电路108。 在比较电路108中，根据表示预定区域的区域图案信息，形成区域图像数据。 当比较多个部分光学图像数据时，参考区域图像数据改变标准，因此在样本上判断缺陷的存在。 版权所有（C）2007，JPO＆INPIT
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公开(公告)号：JP2007086101A
公开(公告)日：2007-04-05
申请号：JP2005271310
申请日：2005-09-20
Applicant: Advanced Mask Inspection Technology Kk , Megaopto Co Ltd , アドバンスド・マスク・インスペクション・テクノロジー株式会社 , 株式会社メガオプト
Inventor： KANEDA YUJI , URATA YOSHIHARU , WADA TOMOYUKI , IMAI SHINICHI
CPC classification number: H01S3/2375 , G02F1/3532 , G02F2001/354 , H01S3/06754 , H01S3/2383 , H01S5/00
Abstract: PROBLEM TO BE SOLVED: To obtain high output by efficiently emitting deep ultraviolet laser light having a wavelength in the deep ultraviolet range. SOLUTION: Laser light having a wavelength of about 227 nm is obtained by sum frequency mixing of a fourth higher harmonic of laser light obtained by amplifying semiconductor laser light having a wavelength of 1,064.0 to 1,065.0 nm by an optical fiber amplifier and laser light obtained by amplifying semiconductor laser light having a wavelength of 1,557.0 to 1,571.0 nm by an optical fiber amplifier. Further, laser light having a wavelength of 198.4 to 198.7 nm is obtained by sum frequency mixing of this laser light and the laser light having the wavelength of 1,557.0 to 1,571.0 nm. COPYRIGHT: (C)2007,JPO&INPIT
Abstract translation: 要解决的问题：通过有效地发射具有深紫外范围波长的深紫外激光，获得高输出。 解决方案：通过用光纤放大器和激光将由波长为1,064.0至1,065.0nm的半导体激光放大而获得的激光的第四高次谐波进行和频混合来获得具有约227nm波长的激光 通过光纤放大器放大波长为1,557.0-1,571.0nm的半导体激光获得。 此外，通过对该激光的和频混合和波长为1,557.0〜1571.0nm的激光，获得波长为198.4〜198.7nm的激光。 版权所有（C）2007，JPO＆INPIT
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