公开(公告)号：GB2311144B

公开(公告)日：2000-05-24

申请号：GB9605235

申请日：1996-03-12

Applicant: HOLTRONIC TECHNOLOGIES LTD

Inventor： CLUBE FRANCIS STACE MURRAY

IPC: G02B5/18 ,  G03F7/20 ,  G03H1/00 ,  G03H1/04

Abstract: The present invention relates to a method and an apparatus for holographically recording periodic or quasi-periodic features of a mask (14) in a holographic recording layer (17). In holographic lithography the object beam (11) is directed to the first substrate (19) bearing a holographic recording layer (17) such that it passes the mask substrate (13) and interferes with a reference beam (15) in the recording layer (17) to form a hologram of the mask pattern (14). According to the new method the object beam (11) is directed to the second substrate (13) at an off-axis angle and the wavelength used and/or the angle of incidence of the object beam (11) are selected according to the period of the features to be recorded such that essentially just the zero and one of the first diffraction orders are present for forming the hologram.

公开(公告)号：DE69128771T2

公开(公告)日：1998-08-20

申请号：DE69128771

申请日：1991-10-07

Applicant: HOLTRONIC TECHNOLOGIES LTD

Inventor： CLUBE FRANCIS S M

IPC: G03F1/08 ,  G03F9/00 ,  G03H1/00 ,  H01L21/027

Abstract: Apparatus for transverse position measurement in a proximity lithographic system including a prism (10) having a glass plate (14) index matched beneath the prism on which a T.I.R. hologram (13) is pre-recorded. A laser source (12) provides a replay beam. A silicon wafer (16) is situated below the hologram and parallel therewith. A second laser source (17) produces through optics (18) a beam with gaussian intensity profile to generate a collimated strip of light (19) at the hologram plane. Elemental grating structures (20) are provided at different locations over the surface of the wafer. Detectors (22,24) collect parts of the lightfield resulting from the interaction of the laser beam with the grating structures. A piezo device (26) operated from a micro-processor (28) moves the silicon wafer in small increments in a direction substantially parallel to the hologram following measurements made by the two detectors which are processed by the micro-processor to produce an alignment signal for the piezo device.

公开(公告)号：DE69319005D1

公开(公告)日：1998-07-16

申请号：DE69319005

申请日：1993-03-10

Applicant: HOLTRONIC TECHNOLOGIES LTD

Inventor： CLUBE FRANCIS STACE MURRAY

IPC: G03F7/20 ,  G03H1/00 ,  G03H1/26

Abstract: In the manufacture of an array total internal reflection hologram for printing a pattern of high-quality microfeatures over a large area, a mask defining just a part of the pattern is used to record an array of sub-holograms, the holographic recording medium or the mask being moved with respect to each other subsequent to the recordal of each sub-hologram, thereby building up a hologram of the complete pattern to be printed.

公开(公告)号：GB2311144A

公开(公告)日：1997-09-17

申请号：GB9605235

申请日：1996-03-12

Applicant: HOLTRONIC TECHNOLOGIES LTD

Inventor： CLUBE FRANCIS STACE MURRAY

IPC: G02B5/18 ,  G03F7/20 ,  G03H1/00 ,  G03H1/04

Abstract: The present invention relates to a method and an apparatus for holographically recording periodic or quasi-periodic features of a mask (14) in a holographic recording layer (17). In holographic lithography the object beam (11) is directed to the first substrate (19) bearing a holographic recording layer (17) such that it passes the mask substrate (13) and interferes with a reference beam (15) in the recording layer (17) to form a hologram of the mask pattern (14). According to the new method the object beam (11) is directed to the second substrate (13) at an off-axis angle and the wavelength used and/or the angle of incidence of the object beam (11) are selected according to the period of the features to be recorded such that essentially just the zero and one of the first diffraction orders are present for forming the hologram.

公开(公告)号：DE69029777T2

公开(公告)日：1997-07-31

申请号：DE69029777

申请日：1990-09-21

Applicant: HOLTRONIC TECHNOLOGIES LTD

Inventor： DANDLIKER RENE ,  BROOK JOHN EDWARD ,  HAMIDI MASSOUD

IPC: G01B9/021 ,  G01N21/88 ,  G01N21/956 ,  G02B7/28 ,  G03F7/20 ,  G03F9/00 ,  G03H1/00 ,  H01L21/027 ,  G03H1/20 ,  G03F7/207

Abstract: Apparatus for and a method of optical inspection in a total internal reflection holographic imaging system. Multi wavelength laser beams are directed onto a prism supporting a first substrate containing pre-recorded hologram which is to be imaged onto a recording medium of a second substrate, the multi wavelength beams being normal to both substrates. The distance between the two substrates is measured by interferometric techniques. Actuators are provided for adjusting the distance between the two substrates, these actuators being energized to cause minute adjustments of the spacing during a scanning operation whereby the imaging of the pre-recorded hologram is ensured at the correct focus throughout the scanning operation.

公开(公告)号：GB2256475B

公开(公告)日：1995-11-29

申请号：GB9108760

申请日：1991-04-24

Applicant: HOLTRONIC TECHNOLOGIES LTD

Inventor： OMAR BASIL ARTHUR ,  HAMIDI MASSOUD

IPC: G01B11/14

公开(公告)号：GB9205560D0

公开(公告)日：1992-04-29

申请号：GB9205560

申请日：1992-03-13

Applicant: HOLTRONIC TECHNOLOGIES LTD

IPC: G03F7/20 ,  G03H1/00 ,  G03H1/26

Abstract: In the manufacture of an array total internal reflection hologram for printing a pattern of high-quality microfeatures over a large area, a mask defining just a part of the pattern is used to record an array of sub-holograms, the holographic recording medium or the mask being moved with respect to each other subsequent to the recordal of each sub-hologram, thereby building up a hologram of the complete pattern to be printed.

公开(公告)号：IN169623B

公开(公告)日：1991-11-23

申请号：IN462MA1987

申请日：1987-06-24

Applicant: HOLTRONIC TECHNOLOGIES LTD

Inventor： NICHOLAS JOHN PHILLIPS

IPC: G03F7/20 ,  G03H1/00 ,  G03H1/04 ,  H01L21/027 ,  H01L25/00

Abstract: A method of manufacturing integrated circuits using holographic techniques by interference between an input beam (S) and a reference beam (R) generated from laser sources (24,25). A holographic image of the object formed on a mask window (19), is formed on recording emulsion coated on a glass slab (16) by means of interference between the input beam (S) which has passed through the mask (18) and the reference beam (R) which is reflected from the surface (X) of a prism (22) in contact with the glass slab (16). In order to reproduce the holographic image on a silicon slice which replaces the mask (18), the reference beam is replayed in the reverse direction through the prism (22) such that the interference between the input beam (S) and the replayed reference beam (R) causes the holographic image to be created as a real image in the silicon slice.

公开(公告)号：GB2204965B

公开(公告)日：1991-01-02

申请号：GB8811331

申请日：1988-05-13

Applicant: HOLTRONIC TECHNOLOGIES LTD

Inventor： TOMKINS DONALD WILLIAM ,  HOLDEN LAURENCE

IPC: G03H1/22 ,  G02B5/32 ,  G03H1/32

公开(公告)号：GB2193344B

公开(公告)日：1990-08-29

申请号：GB8714761

申请日：1987-06-24

Applicant: HUGLE WILLIAM BELL ,  HOLTRONIC TECHNOLOGIES LTD

Inventor： PHILLIPS NICHOLAS JOHN

IPC: G03H1/04 ,  G03F7/20 ,  G03H1/00 ,  H01L21/027

Abstract: A method of manufacturing integrated circuits using holographic techniques by interference between an input beam (S) and a reference beam (R) generated from laser sources (24,25). A holographic image of the object formed on a mask window (19), is formed on recording emulsion coated on a glass slab (16) by means of interference between the input beam (S) which has passed through the mask (18) and the reference beam (R) which is reflected from the surface (X) of a prism (22) in contact with the glass slab (16). In order to reproduce the holographic image on a silicon slice which replaces the mask (18), the reference beam is replayed in the reverse direction through the prism (22) such that the interference between the input beam (S) and the replayed reference beam (R) causes the holographic image to be created as a real image in the silicon slice.