COMPLEX PATTERNING DEVICE AND OPERATION METHOD THEREOF

    公开(公告)号:US20200371433A1

    公开(公告)日:2020-11-26

    申请号:US16515658

    申请日:2019-07-18

    Abstract: Provided is a complex patterning device. The complex patterning device includes a patterning module, on which a master substrate including a master pattern that contacts and is separated from a target substrate and which forms a plurality of target patterns having a reverse image of the master pattern on the target substrate by applying a pressure onto the target substrate, and a punching module including a punching mold that contacts and is separated from the target substrate, in which the plurality of target patterns are formed, and which divides at least any one of the plurality of target patterns by applying a pressure onto the target substrate.

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