公开(公告)号：KR1020140085968A

公开(公告)日：2014-07-08

申请号：KR1020120155896

申请日：2012-12-28

Applicant: (재)한국나노기술원

Inventor： 김창환 ,  황선용 ,  정상현 ,  신현범 ,  강호관 ,  고철기

IPC: H01L21/027

CPC classification number: H01L21/0273 ,  B82B1/001 ,  B82Y40/00

Abstract: The present invention relates to a method of manufacturing a metal film with nanopatterns. The method of manufacturing a metal film with nanopatterns comprises: a first step of forming a sacrificial layer on the upper surface of a substrate; a second step of forming a seed layer for plating on the upper surface of the sacrificial layer; a third step of forming a metal film on the seed layer through electroplating; a fourth step of forming a photosensitive resin layer on the upper surface of the metal film and then forming a nanopattern made of the photosensitive resin layer on the upper surface of the metal film through exposure patterning and developing processes; and a fifth step of removing the sacrificial layer to separate the metal film with the nanopattern formed thereon from the substrate. According to the present invention, fine nanopatterns of equal to or less than 100 nm are uniformly formed while the present invention reduces process costs and time by simplifying processes, and the metal film with the nanopattern is simply manufactured.

Abstract translation: 本发明涉及一种利用纳米图案制造金属膜的方法。 利用纳米图案制造金属膜的方法包括：在基板的上表面上形成牺牲层的第一步骤; 在牺牲层的上表面上形成用于电镀的种子层的第二步骤; 通过电镀在种子层上形成金属膜的第三步骤; 在金属膜的上表面上形成感光性树脂层，然后通过曝光图案化和显影工艺在金属膜的上表面上形成由感光性树脂层制成的纳米图案的第四步骤; 以及除去牺牲层以从金属膜与其上形成的纳米图案分离的第五步骤。 根据本发明，均匀地形成等于或小于100nm的细微纳米图案，而本发明通过简化工艺降低了工艺成本和时间，并且简单地制造了具有纳米图案的金属膜。

公开(公告)号：KR1020120070076A

公开(公告)日：2012-06-29

申请号：KR1020100131479

申请日：2010-12-21

Applicant: (재)한국나노기술원

Inventor： 박형호 ,  신영민 ,  황선용 ,  김창환 ,  강호관 ,  이종근 ,  고철기

IPC: G03F7/20 ,  B82B3/00 ,  H01L21/027

CPC classification number: G03F7/2012 ,  B82B3/0009 ,  G03F7/0002 ,  G03F7/161 ,  G03F7/2004 ,  H01L21/0275

Abstract: PURPOSE: A method for manufacturing a stamp with a micro/nano hybrid pattern is provided to prevent the deformation and the damage of the stamp by forming patterns based on the irradiation of and electron beam and light with respect to a metal-organic precursor composition and washing a developer. CONSTITUTION: A metal-organic precursor composition based on organic ligand is coated on a substrate for a stamp(S1). Electron beam and light are locally irradiated to the composition. A developer is washed to form a micro/nano hybrid patterned metal oxide thin film pattern(S2). The pattern is heated or undergoes microwave, X-ray, gamma-ray, or ultraviolet ray irradiation or plasma treatment in order to change one of the shape, the line width, and the height of the pattern(S3).

Abstract translation: 目的：提供一种用于制造具有微/纳米混合图案的印模的方法，以通过基于相对于金属 - 有机前体组合物的照射和电子束和光的形成图案来防止印模的变形和损坏， 洗一个开发商 构成：将基于有机配体的金属有机前体组合物涂覆在用于印模的基材上（S1）。 对组合物局部照射电子束和光。 洗涤显影剂以形成微/纳米混合图案化金属氧化物薄膜图案（S2）。 将图案加热或进行微波，X射线，γ射线或紫外线照射或等离子体处理，以便改变图案的形状，线宽和图案的高度之一（S3）。