公开(公告)号：KR1020120070076A

公开(公告)日：2012-06-29

申请号：KR1020100131479

申请日：2010-12-21

Applicant: (재)한국나노기술원

Inventor： 박형호 ,  신영민 ,  황선용 ,  김창환 ,  강호관 ,  이종근 ,  고철기

IPC: G03F7/20 ,  B82B3/00 ,  H01L21/027

CPC classification number: G03F7/2012 ,  B82B3/0009 ,  G03F7/0002 ,  G03F7/161 ,  G03F7/2004 ,  H01L21/0275

Abstract: PURPOSE: A method for manufacturing a stamp with a micro/nano hybrid pattern is provided to prevent the deformation and the damage of the stamp by forming patterns based on the irradiation of and electron beam and light with respect to a metal-organic precursor composition and washing a developer. CONSTITUTION: A metal-organic precursor composition based on organic ligand is coated on a substrate for a stamp(S1). Electron beam and light are locally irradiated to the composition. A developer is washed to form a micro/nano hybrid patterned metal oxide thin film pattern(S2). The pattern is heated or undergoes microwave, X-ray, gamma-ray, or ultraviolet ray irradiation or plasma treatment in order to change one of the shape, the line width, and the height of the pattern(S3).

Abstract translation: 目的：提供一种用于制造具有微/纳米混合图案的印模的方法，以通过基于相对于金属 - 有机前体组合物的照射和电子束和光的形成图案来防止印模的变形和损坏， 洗一个开发商 构成：将基于有机配体的金属有机前体组合物涂覆在用于印模的基材上（S1）。 对组合物局部照射电子束和光。 洗涤显影剂以形成微/纳米混合图案化金属氧化物薄膜图案（S2）。 将图案加热或进行微波，X射线，γ射线或紫外线照射或等离子体处理，以便改变图案的形状，线宽和图案的高度之一（S3）。