公开(公告)号：KR1020080023120A

公开(公告)日：2008-03-12

申请号：KR1020070086176

申请日：2007-08-27

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 니시무라히데키 ,  나카시마미키오

IPC: H01L21/304

CPC classification number: H01L21/67109 ,  H01L21/02052 ,  H01L21/67034 ,  H01L21/67248

Abstract: A substrate processing method, a substrate processing apparatus, and a program recording medium are provided to supply mixed fluid containing inert gas and processing liquid to a processing chamber where a substrate is accommodated for obtaining the substrate with the reduced number of particles remaining on its surface, and to improve the drying capability by increasing supply amount of the processing liquid. A substrate processing method by drying a substrate by using a fluid heated by a heating device having one or more heating mechanisms for heating the fluid, the method comprises the steps of: supplying inert gas and a processing liquid into the heating device via its inlet for heating a mixed fluid containing the inert gas and processing liquid within the heating device, while supplying the heated mixed fluid that is discharged from an outlet of the heating device, into a processing chamber in which the substrate is disposed, wherein the output of at least one heating mechanism of the heating device maintains a predetermined constant value until a predetermined period of time expires after the processing liquid is supplied to the heating device; and supplying inert gas within the heating device via the inlet for heating the inert gas within the heating device, while supplying the heated inert gas that is discharged from the outlet of the heating device, into the processing chamber, wherein the output of the mechanism of the heating device is determined by a feedback control for setting a temperature of the inert gas during or after heating at a predetermined value.

Abstract translation: 提供基板处理方法，基板处理装置和程序记录介质以将含有惰性气体和处理液体的混合流体供应到容纳基板的处理室中，以获得基板，其表面上剩余的颗粒数量减少 并且通过增加处理液的供给量来提高干燥能力。 一种基板处理方法，通过使用由具有一个或多个用于加热流体的加热机构的加热装置加热的流体来干燥基板，该方法包括以下步骤：将惰性气体和处理液体经由其加热装置的入口 在加热装置内加热含有惰性气体和处理液体的混合流体，同时将从加热装置的出口排出的加热的混合流体供应到其中设置基板的处理室中，其中输出至少 加热装置的一个加热机构保持预定的恒定值，直到处理液体被供应到加热装置之后直到预定的时间段到期; 以及在加热装置内通过用于加热加热装置内的惰性气体的入口在加热装置内供给惰性气体，同时将从加热装置的出口排出的加热的惰性气体供应到处理室中，其中， 加热装置由用于将加热期间或加热后的惰性气体的温度设定为预定值的反馈控制来确定。

公开(公告)号：KR1020070006602A

公开(公告)日：2007-01-11

申请号：KR1020060063794

申请日：2006-07-07

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 가미카와유지 ,  고바야시가쯔히코 ,  구로다노부타카 ,  나카시마미키오 ,  츠다오사무

IPC: H01L21/304

CPC classification number: H01L21/67051 ,  H01L21/67023 ,  H01L21/67028 ,  H01L21/67034 ,  Y10S134/902

Abstract: A vapor dry method is provided to efficiently use inert gas while shortening an interval of dry time and improving dry capabilities by supplying more inert gas in a second dry process than that in a first dry process to the inside of a process chamber and by removing a solvent attached to a processed object. Inert gas from an inert gas supplying pipe and a solvent from a solvent supply pipe are mixed by a mixture liquid generating unit to generate mixture liquid. The mixture liquid is heated by a liquid heating unit to generate vapor. The generated vapor is supplied to the inside of a process chamber to dry a processed object. Inert gas is heated by a gas heating unit. The heated inert gas is supplied to the inside of the process chamber to dry the processed object. While the quantity of inert gas in the first dry process and the quantity of inert gas in the second dry process are set differently, the quantity of inert gas in the second dry process is increased with respect to the first dry process. In the second dry process, inert gas is supplied to the inside of the process chamber through a branch pipe(25) connected to a primary side of the mixture liquid generating unit.

Abstract translation: 提供蒸气干燥方法以有效地使用惰性气体，同时缩短干燥时间间隔并通过在第二干法中向处理室内部提供比在第一干法中更多的惰性气体来提高干性能，并且通过除去 溶剂附着在加工对象上。 来自惰性气体供给管的惰性气体和来自溶剂供给管的溶剂通过混合液体发生单元混合以产生混合液体。 混合液体被液体加热单元加热以产生蒸气。 所产生的蒸汽被供应到处理室的内部以干燥被处理物体。 惰性气体被气体加热装置加热。 将加热的惰性气体供应到处理室的内部以干燥被处理物体。 虽然第一干法中的惰性气体量和第二干法中的惰性气体量设定不同，但是相对于第一干法，第二干法中的惰性气体量增加。 在第二干法中，通过连接到混合液产生单元的初级侧的分支管（25）将惰性气体供应到处理室的内部。