Abstract:
본 발명은 파우더형 광촉매에 전자빔 가속기를 이용하여 전자빔을 조사하여 상기 광촉매의 표면을 개질하는 단계;를 포함하는 것을 특징으로 하는, 휘발성 유기화합물 제거용 촉매의 제조방법에 관한 것이다. 다른 하나의 양태로서 본 발명은 상술된 휘발성 유기화합물 제거용 촉매의 제조방법에 의해 제조되는 휘발성 유기화합물 제거용 촉매에 관한 것이다. 또다른 하나의 양태로서 본 발명은 (1) 상술된 휘발성 유기화합물 제거용 촉매의 제조방법에 의해 휘발성 유기화합물 제거용 촉매를 제조하는 단계; 및 (2) 상기 휘발성 유기화합물 제거용 촉매를 이용하여 휘발성 유기화합물을 제거하는 단계를 포함하는 것을 특징으로 하는, 휘발성 유기화합물 제거 방법에 관한 것이다.
Abstract:
The present invention relates to a method for manufacturing a high permeable and super water repellent surface on which nanoparticles coated with silicon carbide complex are arranged. The method for manufacturing a high permeable and super water repellent surface on which nanoparticles coated with silicon carbide complex provides water repellency with high permeability to the surface of various materials, relatively reduces costs when compared with an existing technology by simplifying the method and not using expensive equipment, and enlarges the size of the surface by applying the surface to a large substrate.
Abstract:
본 발명은 니켈 표면의 일부분에 금속 산화물이 증착되어 있는 것을 특징으로 하는 이산화탄소 개질 촉매 및 원자층 증착법을 사용하는 이의 제조방법에 관한 것이다. 또한, 본 발명은 밸브의 미세 조절을 통해 표면적이 작은 시료뿐만 아니라 적은 양의 시료에 대해서도 촉매 활성을 평가할 수 있는 본 발명에 따른 이산화탄소 개질 촉매의 촉매 반응성을 평가하는 장치를 더 제공한다. 본 발명에 따른 이산화탄소 개질 촉매는 코크스 침적을 효과적으로 방지하고, 이산화탄소 개질 반응 시에도 거친 표면 구조를 유지함으로써 넓은 표면적을 가진다는 점에서 촉매의 효율을 향상시킬 수 있다.
Abstract:
PURPOSE: A metal oxide deposited nickel-based carbon dioxide reforming catalyst, a manufacturing method of the same, and an apparatus for evaluating carbon dioxide reforming reactivity using the same are provided to improve the efficiency of the catalyst. CONSTITUTION: A carbon dioxide reforming catalyst includes metal oxides deposited on a part of the surface of nickel. The metal oxides are selected from a group including TiO_2, ZrO_2, Al_2O_3, Fe_2O_3, Fe_3O_4, Ga_2O_3, SnO_2, Sb_2O_3, SiO_2, MnO_2, Mn_2O_3, Mn_3O_4, NiO_2, CeO_2, Y_2O_3, La_2O_3, K_2O, MgO, Cr_2O_3, La_2O_3, Ce_(1-x)Zr_xO_2, LaAl_2O_4, and LaNi_2O_4. The deposition thicknesses of the metal oxides are in a range between 1 and 20nm. The metal oxides are deposited in the shapes of particles and deposited on the surface of the nickel by an atomic layer deposition method.
Abstract:
PURPOSE: A method of preparing superhydrophobic materials by depositing silicon oxide and diamond-like carbon using polymer containing silicon as a precursor and superhydrophobic materials prepared by using the same are provided to evaporate a thin and uniform film at powder of nano size. CONSTITUTION: A manufacturing method of preparing superhydrophobic materials is as follows. Polymer(2) including silicone atoms and carbon atoms is prepared as a precursor. The precursor is heated. Silicon oxide and DLC are evaporated in the surface of a target at the same time. The superhydrophobic material is manufactured.
Abstract:
PURPOSE: A method for eliminating a volatile organic compound(VOC) using an atomic layer depositing method is provided to overcome problems related to the generation of secondary pollutant by being implemented without the additional heat or thermal energy supply. CONSTITUTION: A method for eliminating a VOC includes the following: A VOC eliminating agent is prepared by uniformly depositing a TiO_2 thin film on the surface of a support based on an atomic layer deposition method. The VOC is in contact with the VOC eliminating agent. The color of the VOC eliminating agent is changed at room temperature and atmospheric pressure in a dark room. The TiO_2 thin film is formed by successively introducing a titanium precursor and distilled water. The titanium precursor is one of Ti(OC_2H_5)_4, Ti(OCH(CH_3)_2)_4, and TiCl_4.
Abstract:
PURPOSE: A manufacturing method and platinum catalyst thereof are provided to coat gold on platinum catalyst by using a thermal evaporation deposition method. CONSTITUTION: A platinum is deposited on an oxide tantalum substrate at the thickness of 1~2mm by using a thermal evaporation deposition method. When the platinum is grown up at the thickness less than 1nm, the catalyst activation is degraded. Aurum is deposited on the platinum deposit at the thickness of 0.05~0.2nm by using the thermal evaporation deposition method. The efficiency of aurum-platinum catalyst is improved by coating the platinum.