전사기반의 임프린팅 공정을 이용한 함몰패턴 제작방법
    21.
    发明授权
    전사기반의 임프린팅 공정을 이용한 함몰패턴 제작방법 有权
    使用基于转移的印刷制作嵌入图案的方法

    公开(公告)号:KR101449272B1

    公开(公告)日:2014-10-08

    申请号:KR1020130044343

    申请日:2013-04-22

    Abstract: The present invention relates to an embedded pattern manufacturing method using a transfer-based imprinting process. The embedded pattern manufacturing method using a transfer-based imprinting process comprises: an adhesion layer laminating step of laminating an adhesion layer made up of photo-curable resins on a substrate; a stamp preparing step of preparing a stamp equipped with a protrusion pattern on which a thin film layer is deposited on an external surface; a thin layer transferring step of selectively transferring the thin layer on the protrusion pattern to the adhesion layer by pressurizing the stamp in conditions in which the thin film layer of the protrusion pattern and the adhesion layer are in contact; a hardening step of irradiating ultraviolet light so that the adhesion layer is hardened; and a releasing step of releasing the stamp, and is characterized by arranging the thin film layer transferred to an area embedded by stamp and the adhesion layer which is not pressurized by the stamp in the thin film layer transferring layer on an identical plane. Accordingly, the present invention provides the embedded pattern manufacturing method using a transfer-based imprinting process capable of manufacturing the embedded pattern of a uniform shape.

    Abstract translation: 本发明涉及使用基于转印的印刷方法的嵌入图案制造方法。 使用基于转印的压印方法的嵌入图案制造方法包括:将由光固化树脂构成的粘合层层压在基板上的粘合层层压步骤; 印模准备步骤,准备装有突起图案的印模,在外表面上沉积有薄膜层; 通过在突起图案和粘合层的薄膜层接触的条件下对印模进行加压来选择性地将突起图案上的薄层转移到粘合层的薄层转印步骤; 照射紫外线使得粘附层硬化的硬化步骤; 以及释放印模的释放步骤,其特征在于将薄膜层转印到由印模嵌入的区域和在薄膜层转印层中在同一平面上未被印模加压的粘合层。 因此,本发明提供了使用能够制造均匀形状的嵌入图案的基于转印的印刷工艺的嵌入图案制造方法。

    금속 나노패터닝과 화학적 에칭 공정을 이용한 실리콘 나노튜브 제조방법
    22.
    发明授权
    금속 나노패터닝과 화학적 에칭 공정을 이용한 실리콘 나노튜브 제조방법 有权
    使用金属辅助化学蚀刻制造硅纳米管的方法

    公开(公告)号:KR101421047B1

    公开(公告)日:2014-07-22

    申请号:KR1020130026170

    申请日:2013-03-12

    CPC classification number: C01B33/021 B82B3/00 C01P2004/13

    Abstract: The present invention relates to a method of manufacturing a silicone nanotube using metal nanopatterning and chemical etching. The method of manufacturing a silicone nanotube using metal nanopatterning and chemical etching given in the present invention includes: a preparation step of preparing a silicone layer; a stacking step of stacking a metal layer, on which a tube-shaped intaglio pattern is formed, on the top of the silicone layer; and an etching step of etching the silicone layer through a metal-assisted chemical etching process using the patterned metal to manufacture a tube-shaped silicone nanotube. Therefore, according to the present invention, provided is the method of manufacturing a silicone nanotube using metal nanopatterning and chemical etching which enables a large-area nanotube to be manufactured with reduced costs through a relatively-simple process.

    Abstract translation: 本发明涉及使用金属纳米图案和化学蚀刻制造硅氧烷纳米管的方法。 使用本发明中提供的金属纳米图案和化学蚀刻制造硅氧烷纳米管的方法包括:制备硅氧烷层的制备步骤; 将形成有管状凹版图案的金属层层叠在硅氧烷层的顶部上的层叠工序; 以及通过使用图案化金属的金属辅助化学蚀刻工艺蚀刻硅氧烷层以制造管状硅氧烷纳米管的蚀刻步骤。 因此,根据本发明,提供了使用金属纳米图案和化学蚀刻制造硅氧烷纳米管的方法,其能够通过相对简单的工艺以降低成本制造大面积纳米管。

    미세 패턴 및 투명 도전막의 제조 방법
    23.
    发明公开
    미세 패턴 및 투명 도전막의 제조 방법 有权
    超精细图案和透明导电层的制作方法

    公开(公告)号:KR1020140068721A

    公开(公告)日:2014-06-09

    申请号:KR1020120136561

    申请日:2012-11-28

    Abstract: A method of fabricating for an ultra fine pattern according to the present invention includes a step of forming a metal layer on a substrate, a step of forming an organic-inorganic complex layer on the metal layer, a step of forming a mask pattern by imprinting the organic-inorganic complex, a step of performing a thermal process on the mask pattern, a step of forming an ultra fine pattern by etching the metal layer, and a step of removing the etch mask. The size of the make pattern is reduced by the thermal process.

    Abstract translation: 根据本发明的超精细图案的制造方法包括在基板上形成金属层的步骤,在金属层上形成有机 - 无机复合层的步骤,通过压印形成掩模图案的步骤 有机 - 无机络合物,对掩模图案进行热处理的步骤,通过蚀刻金属层形成超细图案的步骤以及去除蚀刻掩模的步骤。 制造图案的尺寸通过热处理而降低。

    금속박막의 선택적 제거에 의한 패턴형성 방법
    25.
    发明授权
    금속박막의 선택적 제거에 의한 패턴형성 방법 有权
    通过选择性去除形成金属薄膜图案的方法

    公开(公告)号:KR101399439B1

    公开(公告)日:2014-05-28

    申请号:KR1020120078893

    申请日:2012-07-19

    Abstract: 본 발명은 기판의 금속박막 패터닝 과정에서 제거해야 할 영역을 선택적으로 제거하여 다양한 기대 효과를 얻을 수 있는 금속박막의 선택적 제거에 의한 패턴형성 방법에 관한 것으로서, 기판에 금속박막층을 증착하는 증착단계, 상기 기판과 상기 금속박막층간의 영역 중 적어도 일부의 접합력이 증가되도록 돌출되는 돌출패턴을 갖는 스탬프를 상기 금속박막층에 접촉하여 가압하는 가압단계, 상기 금속박막층에서 상기 돌출패턴에 의하여 가압 되지 않는 영역을 선택적으로 제거하여 패턴을 형성하는 패턴형성단계를 포함하는 것을 특징으로 한다.

    금속박막의 선택적 제거에 의한 패턴형성 방법
    26.
    发明公开
    금속박막의 선택적 제거에 의한 패턴형성 방법 有权
    通过选择性去除形成金属薄膜图案的方法

    公开(公告)号:KR1020140012331A

    公开(公告)日:2014-02-03

    申请号:KR1020120078893

    申请日:2012-07-19

    Abstract: The present invention relates to a method for forming a pattern of a metal thin film by selective removal capable of obtaining various effects by selectively removing sections to be removed in a metal thin film patterning process of a substrate. The method comprises: a deposition step of depositing a metal thin film layer on the substrate; a compression step of compressing a stamp having a protrusion pattern, which protrudes to partially increase bonding force between the substrate and the metal thin film layer, to the metal thin film layer; and a pattern forming step of forming the pattern by selectively removing the sections of the metal thin film layer which are not compressed by the protrusion pattern. [Reference numerals] (AA) START; (BB) END; (S110) Anti-adhesive treatment step; (S120) Deposition step; (S130) Compression step; (S140) Pattern formation step; (S141) Bonding step; (S142) Removal step

    Abstract translation: 本发明涉及一种用于通过选择性去除形成金属薄膜图案的方法,该方法能够通过在衬底的金属薄膜构图工艺中选择性地除去待除去的部分而获得各种效果。 该方法包括:在衬底上沉积金属薄膜层的沉积步骤; 压缩步骤,压缩具有凸起图案的印模,所述凸起图案突出以部分地增加所述基板和所述金属薄膜层之间的结合力,所述压缩步骤到所述金属薄膜层; 以及图案形成步骤,通过选择性地去除未被突起图案压缩的金属薄膜层的部分来形成图案。 (附图标记)(AA)START; (BB)END; (S110)防粘处理工序; (S120)沉积步骤; (S130)压缩步骤 (S140)图案形成步骤; (S141)接合工序; (S142)去除步骤

    유기 발광 표시 장치 및 그 제조 방법
    28.
    发明公开
    유기 발광 표시 장치 및 그 제조 방법 有权
    有机发光二极管显示器及其制造方法

    公开(公告)号:KR1020130092922A

    公开(公告)日:2013-08-21

    申请号:KR1020120014530

    申请日:2012-02-13

    Abstract: PURPOSE: An organic light emitting diode display and a manufacturing method thereof are provided to simplify manufacturing processes by forming an air layer without an additional process. CONSTITUTION: An air layer (300) including an empty space (30) is formed on a substrate (111). The empty space is an air gap between the filling particles or a plurality of sealed spaces. A first electrode (710) is formed on the air layer. A light emitting layer (720) is formed on the first electrode. A second electrode (730) is formed on the light emitting layer.

    Abstract translation: 目的:提供一种有机发光二极管显示器及其制造方法,通过在没有附加工艺的情况下形成空气层来简化制造工艺。 构成:在基板(111)上形成包括空的空间(30)的空气层(300)。 空的空间是填充颗粒或多个密封空间之间的气隙。 第一电极(710)形成在空气层上。 在第一电极上形成发光层(720)。 在发光层上形成第二电极(730)。

    블록공중합체 정렬을 이용한 나노 구조물 제조방법
    29.
    发明公开
    블록공중합체 정렬을 이용한 나노 구조물 제조방법 有权
    使用嵌段共聚物配对制备纳米结构的方法

    公开(公告)号:KR1020130009448A

    公开(公告)日:2013-01-23

    申请号:KR1020110070576

    申请日:2011-07-15

    CPC classification number: B82B3/0038 B82Y40/00 C08J3/24

    Abstract: PURPOSE: A manufacturing method of nanostructure using block copolymer queue is provided to manufacture nanostructures by a single process. CONSTITUTION: A manufacturing method of nanostructure using block copolymer queue comprises the following steps: laminating a reactive layer(120) on a substrate(110); forming a plurality of convex portions(131) on the reactive layer to be separated from each other; forming a free pattern(140) by etching and redeposition; removing the convex portions; removing the reactive layer remained on a substrate between the neighboring free patterns; and arranging block copolymer pattern(150) between the neighboring free patterns.

    Abstract translation: 目的:提供使用嵌段共聚物排列的纳米结构的制造方法,通过单一工艺制造纳米结构。 构成:使用嵌段共聚物排列的纳米结构的制造方法包括以下步骤:将反应层(120)层压在基材(110)上; 在所述反应层上形成多个待分离的凸部(131); 通过蚀刻和再沉积形成自由图案(140); 去除凸部; 去除残留在相邻自由图案之间的衬底上的反应层; 以及在相邻的自由图案之间布置嵌段共聚物图案(150)。

    미세 패턴을 가지는 세라믹 템플릿의 제조 방법
    30.
    发明公开
    미세 패턴을 가지는 세라믹 템플릿의 제조 방법 有权
    具有精细图案的陶瓷模板的制造方法

    公开(公告)号:KR1020120069292A

    公开(公告)日:2012-06-28

    申请号:KR1020100130785

    申请日:2010-12-20

    CPC classification number: B32B3/30 B82Y10/00 B82Y40/00 G03F7/0002 G03F7/165

    Abstract: PURPOSE: A manufacturing method of ceramics template having micro-pattern is provided to improve accuracy and density of the micro-pattern by eliminating defects due to disorder orientation. CONSTITUTION: A manufacturing method of ceramics template having micro-pattern comprises the following steps: manufacturing compliant mold which includes a protruded unit; forming a coating layer by spreading metal-organic precursor solution on a substrate(31); solidifying the coating layer as pressurizing the coating layer with the compliant mold; forming a metal oxide pattern(33) in which a first concave part is included by eliminating the compliant mold; filling a block copolymer coating layer which includes block copolymer in the first concave part(34); separating recurring units by sintering the block copolymer coating layer; forming a magnetism assembling structure which is composed of a plurality of high-molecule-blocks; and forming micro-patterns(43) which includes a second concave part by eliminating a part of the copolymer.

    Abstract translation: 目的:提供具有微图案的陶瓷模板的制造方法,以通过消除由于无序取向引起的缺陷来提高微图案的精度和密度。 构成:具有微图案的陶瓷模板的制造方法包括以下步骤:制造包括突出单元的柔性模具; 通过将金属 - 有机前体溶液铺展在基材(31)上形成涂层; 使用所述柔性模具使所述涂层固化; 形成金属氧化物图案(33),其中通过消除柔性模具包括第一凹部; 在第一凹部(34)中填充包含嵌段共聚物的嵌段共聚物涂层; 通过烧结嵌段共聚物涂层来分离重复单元; 形成由多个高分子块组成的磁性组装结构; 以及通过消除所述共聚物的一部分而形成包括第二凹部的微图案(43)。

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